公开(公告)号：US08618298B2

公开(公告)日：2013-12-31

申请号：US13055939

申请日：2009-07-28

申请人： Ung Chan Yoon ,  Myung Ho Hyun ,  Hong-Seok Kim ,  Sang-Jin Moon ,  Won Suk Shin ,  Young In Kim ,  Ok-Sang Jung

发明人： Ung Chan Yoon ,  Myung Ho Hyun ,  Hong-Seok Kim ,  Sang-Jin Moon ,  Won Suk Shin ,  Young In Kim ,  Ok-Sang Jung

IPC分类号： C07D471/08 ,  H01L51/00

CPC分类号： C07D409/14 ,  H01L51/0053 ,  H01L51/0068 ,  H01L51/42 ,  Y02E10/549

摘要： The compounds of the present invention are represented by the following formula (I): wherein M is represented by the following formula: with R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, X1, X2, X3, L, a, b, c, d, e, x, y, and z defined herein.

摘要翻译： 本发明化合物由下式（I）表示：其中M由下式表示：其中R1，R2，R3，R4，R5，R6，R7，R8，R10，R11，X1，X2， X3，L，a，b，c，d，e，x，y和z。

公开(公告)号：US20090139548A1

公开(公告)日：2009-06-04

申请号：US12378565

申请日：2008-12-18

申请人： Hong-Seok Kim

发明人： Hong-Seok Kim

IPC分类号： B08B3/00

CPC分类号： H01L21/02052 ,  H01L21/67028 ,  H01L21/67754 ,  H01L21/67757

摘要： An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents semiconductor wafers from being exposed to air while being transferred from the rinsing bath to the drying bath. Thus watermarks are prevented from being formed on the semiconductor wafers. A method for rinsing and drying semiconductor wafers includes rinsing the wafers in a rinsing bath, transferring the wafers to a drying bath through a tunnel unit that prevents the semiconductor wafers from the being exposed to air, and after processing the wafers in the drying bath, transferring the wafers to a drying chamber.

摘要翻译： 用于冲洗和干燥半导体晶片的装置包括漂洗槽，干燥槽和干燥室。 冲洗浴和干燥浴通过隧道单元连接，防止半导体晶片暴露于空气，同时从冲洗槽转移到干燥槽。 因此防止在半导体晶片上形成水印。 一种用于冲洗和干燥半导体晶片的方法包括在漂洗槽中漂洗晶片，将晶片通过隧道单元转移到干燥槽中，隧道单元防止半导体晶片暴露于空气中，并且在干燥槽中处理晶片之后， 将晶片转移到干燥室。

公开(公告)号：US07492969B2

公开(公告)日：2009-02-17

申请号：US11305644

申请日：2005-12-15

申请人： Hong-Seok Kim ,  Chang-Joon Park ,  Sung-Eun Kim ,  In-Ho Lee ,  Hyun-Bin Kim

发明人： Hong-Seok Kim ,  Chang-Joon Park ,  Sung-Eun Kim ,  In-Ho Lee ,  Hyun-Bin Kim

IPC分类号： G06K9/32 ,  G06K9/40

CPC分类号： G06T3/403

摘要： Provided is a method for magnifying an image by interpolation. The method including: a) setting m×m local windows and calculating a direction of each m×m local window; b) when a linear direction exists in an m×m local window, considering an edge exists; c) when a linear direction does not exist in the m×m local window, dividing the m×m local window into m/2×m/2 sub windows and calculating directions of the m/2×m/2 sub windows; d) when the directions of the m/2×m/2 sub windows exists toward the center of the m×m local window, considering a corner exists in the m×m local window; and e) selecting pixels located in a virtual line that goes along in the linear direction or in the directions to calculate a new pixel value by using the pixels.

摘要翻译： 提供了一种通过插值来放大图像的方法。 该方法包括：a）设置mxm局部窗口并计算每个mxm局部窗口的方向; b）当在mxm局部窗口中存在线性方向时，考虑到边缘存在; c）当mxm局部窗口中不存在线性方向时，将mxm本地窗口划分为m / 2xm / 2子窗口并计算m / 2xm / 2子窗口的方向; d）当m / 2xm / 2子窗口的方向存在于mxm局部窗口的中心时，考虑到mxm局部窗口中存在一个角; 以及e）选择位于沿着线性方向或方向的虚拟线中的像素，以通过使用像素来计算新的像素值。

公开(公告)号：US20050224102A1

公开(公告)日：2005-10-13

申请号：US11101799

申请日：2005-04-07

申请人： Hong-Seok Kim

发明人： Hong-Seok Kim

IPC分类号： H01L21/304 ,  B08B3/00 ,  C23G1/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/302

CPC分类号： H01L21/02052 ,  H01L21/67028 ,  H01L21/67754 ,  H01L21/67757

摘要： An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents semiconductor wafers from being exposed to air while being transferred from the rinsing bath to the drying bath. Thus watermarks are prevented from being formed on the semiconductor wafers. A method for rinsing and drying semiconductor wafers includes rinsing the wafers in a rinsing bath, transferring the wafers to a drying bath through a tunnel unit that prevents the semiconductor wafers from the being exposed to air, and after processing the wafers in the drying bath, transferring the wafers to a drying chamber.

摘要翻译： 用于冲洗和干燥半导体晶片的装置包括漂洗槽，干燥槽和干燥室。 冲洗浴和干燥浴通过隧道单元连接，防止半导体晶片暴露于空气，同时从冲洗槽转移到干燥槽。 因此防止在半导体晶片上形成水印。 一种用于冲洗和干燥半导体晶片的方法包括在漂洗槽中漂洗晶片，将晶片通过隧道单元转移到干燥槽中，隧道单元防止半导体晶片暴露于空气中，并且在干燥槽中处理晶片之后， 将晶片转移到干燥室。

公开(公告)号：US20110130566A1

公开(公告)日：2011-06-02

申请号：US13055939

申请日：2009-07-28

申请人： Ung Chan Yoon ,  Myung Ho Hyun ,  Hong-Seok Kim ,  Sang-Jin Moon ,  Won Suk Shin ,  Young In Kim ,  Ok-Sang Jung

发明人： Ung Chan Yoon ,  Myung Ho Hyun ,  Hong-Seok Kim ,  Sang-Jin Moon ,  Won Suk Shin ,  Young In Kim ,  Ok-Sang Jung

IPC分类号： C07D471/06

CPC分类号： C07D409/14 ,  H01L51/0053 ,  H01L51/0068 ,  H01L51/42 ,  Y02E10/549

摘要： The compounds of the present invention are represented by the following formula (I): wherein M is represented by the following formula: with R1, R2, R3, R4, R5, R6, R7, R8, R10, R11, X1, X2, X3, L, a, b, c, d, e, x, y, and z defined herein.

摘要翻译： 本发明化合物由下式（I）表示：其中M由下式表示：其中R1，R2，R3，R4，R5，R6，R7，R8，R10，R11，X1，X2， X3，L，a，b，c，d，e，x，y和z。

公开(公告)号：US20080141220A1

公开(公告)日：2008-06-12

申请号：US11596311

申请日：2005-05-12

申请人： Hong-Ryeol Kim ,  Dae-Won Kim ,  Hong-Seong Park ,  Hong-Seok Kim ,  Ho-Gil Lee

发明人： Hong-Ryeol Kim ,  Dae-Won Kim ,  Hong-Seong Park ,  Hong-Seok Kim ,  Ho-Gil Lee

IPC分类号： G06F9/44

CPC分类号： B25J9/1661 ,  G05B2219/32142 ,  G05B2219/39252 ,  G05B2219/40304

摘要： An open distributed processing structured robot control software architecture is enclosed, which makes it possible to manufacture a user-oriented robot through combination of independent heterogeneous functional modules. The invention involves an open software framework for integrated operation and production of distributed software of the modules, and an autonomous robot control architecture suitable for distributed environments. The software framework indicates underlying software components for robot control and service creation. The invention makes it possible to mass-produce autonomous robots in units of interoperable functional modules. It is also possible to meet various demands of consumers, achieve specialization, and accelerate technology development since the development procedures are specialized in an independent manner and are suitable for manufacturing a wide variety of robot products in small quantities.

摘要翻译： 封闭开放的分布式处理结构化机器人控制软件架构，通过独立的异构功能模块的组合，可以制造面向用户的机器人。 本发明涉及用于模块的分布式软件的集成操作和生产的开放软件框架，以及适用于分布式环境的自主机器人控制架构。 软件框架指示用于机器人控制和服务创建的底层软件组件。 本发明使得可以以可互操作的功能模块为单位批量生产自主机器人。 开发过程独立自主，适合少量生产各种机器人产品，也可满足消费者的各种需求，实现专业化，加快技术开发。

公开(公告)号：US20060120592A1

公开(公告)日：2006-06-08

申请号：US11283118

申请日：2005-11-18

申请人： Chang-Joon Park ,  Hong-Seok Kim ,  Sung-Eun Kim ,  In-Ho Lee ,  Hyun-Bin Kim

发明人： Chang-Joon Park ,  Hong-Seok Kim ,  Sung-Eun Kim ,  In-Ho Lee ,  Hyun-Bin Kim

IPC分类号： G06K9/00 ,  G06K9/34

CPC分类号： G06T15/20 ,  G06T11/60

摘要： Provided is a background recovering apparatus for deleting an object of an arbitrary region and recovering a background covered with the object. The apparatus includes a storing block for storing the input image sequence, and storing the three dimensional (3D) position and posture information, and focal length information; a geometric information extracting block for extracting 3D with respect to the background; a background image generating block for generating the background image; and a background image inserting block for recovering the background by inserting the background image into an arbitrary region of a first view point.

公开(公告)号：US08117001B2

公开(公告)日：2012-02-14

申请号：US13021463

申请日：2011-02-04

申请人： Moon-Sang Lee ,  Bong-Jin Yum ,  Hong-Seok Kim ,  Kwan-Woo Kim ,  Seung-Hyun Kim ,  Chan-Hoon Park

发明人： Moon-Sang Lee ,  Bong-Jin Yum ,  Hong-Seok Kim ,  Kwan-Woo Kim ,  Seung-Hyun Kim ,  Chan-Hoon Park

IPC分类号： G06F11/00

CPC分类号： G03F7/70633 ,  G03F7/705 ,  G03F7/70508

摘要： A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method. A dynamic sampling method is used for dynamically changing the number and positions of shots to be measured according to a change in process features by combining the above two methods. And, when erroneous data is detected, or when measured data is missing, a robust regression analysis method and a technique for filtering the erroneous data and the missing data are used.

摘要翻译： 考虑到根据高阶回归分析模型的覆盖测量误差，测量系统和测量方法可以获得接近真实值的测量值。 测量系统和测量方法提供了一种用于使用最佳实验设计确定要测量的拍摄的最佳位置的技术。 当回归分析模型和要测量的拍摄数量预先确定时，使用一种方法根据回归分析模型和使用置信区间估计方法的处理色散来确定要测量的最佳拍摄张数。 动态采样方法用于通过组合上述两种方法，根据过程特征的变化动态地改变要测量的拍摄张数和位置。 并且，当检测到错误数据时，或者当测量数据丢失时，使用鲁棒的回归分析方法和用于过滤错误数据和丢失数据的技术。

公开(公告)号：US20110125440A1

公开(公告)日：2011-05-26

申请号：US13021463

申请日：2011-02-04

申请人： Moon-Sang Lee ,  Bong-Jin Yum ,  Hong-Seok Kim ,  Kwan-Woo Kim ,  Seung-Hyun Kim ,  Chan-Hoon Park

发明人： Moon-Sang Lee ,  Bong-Jin Yum ,  Hong-Seok Kim ,  Kwan-Woo Kim ,  Seung-Hyun Kim ,  Chan-Hoon Park

IPC分类号： G06F17/18 ,  G06F11/00

CPC分类号： G03F7/70633 ,  G03F7/705 ,  G03F7/70508

摘要： A measurement system and a measurement method, which can obtain a measurement value close to a true value considering an overlay measurement error according to a higher order regression analysis model. The measurement system and the measurement method provide a technique for determining optimal positions of shots to be measured using an optimal experimental design. When the regression analysis model and the number of shots to be measured are determined in advance, a method is used for determining an optimal number of shots to be measured according to the regression analysis model and process dispersion using a confidence interval estimating method. A dynamic sampling method is used for dynamically changing the number and positions of shots to be measured according to a change in process features by combining the above two methods. And, when erroneous data is detected, or when measured data is missing, a robust regression analysis method and a technique for filtering the erroneous data and the missing data are used.

摘要翻译： 考虑到根据高阶回归分析模型的覆盖测量误差，测量系统和测量方法可以获得接近真实值的测量值。 测量系统和测量方法提供了一种用于使用最佳实验设计确定要测量的拍摄的最佳位置的技术。 当回归分析模型和要测量的拍摄数量预先确定时，使用一种方法根据回归分析模型和使用置信区间估计方法的处理色散来确定要测量的最佳拍摄张数。 动态采样方法用于通过组合上述两种方法，根据过程特征的变化动态地改变要测量的拍摄张数和位置。 并且，当检测到错误数据时，或者当测量数据丢失时，使用鲁棒的回归分析方法和用于过滤错误数据和丢失数据的技术。

公开(公告)号：US07869646B2

公开(公告)日：2011-01-11

申请号：US11605612

申请日：2006-11-29

申请人： Chang-Joon Park ,  Hong-Seok Kim ,  In-Ho Lee ,  Jae-Kwang Lee ,  Hyun-Bin Kim

发明人： Chang-Joon Park ,  Hong-Seok Kim ,  In-Ho Lee ,  Jae-Kwang Lee ,  Hyun-Bin Kim

IPC分类号： G06K9/00

CPC分类号： G06F3/011 ,  A63F2300/1093 ,  G06F3/0304 ,  G06T7/74 ,  G06T2207/30196

摘要： A method for estimating three-dimensional positions of human joints includes the steps of: a) marker-free motion capturing a moving figure for obtaining a multiview 2D image of the moving figure, and extracting a 2D feature point corresponding to a bodily end-effector; b) three-dimensionally matching the 2D feature point corresponding to the bodily end-effector, and recovering the 3D coordinates of the bodily end-effector; c) generating a 3D blob of the bodily end-effector, generating a virtual sphere with a radius that is a distance from a center of the 3D blob to a joint, and projecting the virtual sphere onto the obtained multiview 2D image of the moving figure; and d) detecting a coinciding point of a surface of the projected virtual sphere and the multiview 2D image of the moving figure, and estimating a 3D position corresponding to the coinciding point as a 3D position of the joint.

摘要翻译： 一种用于估计人体关节的三维位置的方法包括以下步骤：a）无标记运动，捕捉运动图形以获得运动图形的多视图2D图像，以及提取对应于身体末端执行器的2D特征点 ; b）三维匹配对应于身体末端执行器的2D特征点，以及恢复身体末端执行器的3D坐标; c）产生身体末端执行器的3D斑块，产生具有距离3D斑点的中心到关节的距离的半径的虚拟球体，以及将虚拟球体投影到获得的运动图形的多视图2D图像上 ; 以及d）检测所述投影虚拟球体的表面和所述运动图形的多视图2D图像的一致点，并且将与所述重合点对应的3D位置估计为所述关节的3D位置。