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公开(公告)号：US06017658A
公开(公告)日：2000-01-25
申请号：US882226
申请日：1992-05-13
CPC分类号： G03F1/78 , G03F1/22 , G03F7/2061 , G03F7/2063 , H01J2237/31794
摘要： Improvement in resolution in terms of minimum feature sizes and proximity fects in an electronic mask is attained by making the mask using a high voltage electron beam which deflects or blocks backscattered electrons. The novel mask structure comprises a transparent support, an absorber layer disposed on said support, a dielectric layer disposed on said absorber layer, and a resist layer disposed on said dielectric layer. It is the dielectric layer which is credited for improving resolution in said mask which can be used a multiple number of times in printing a pattern for various applications, including electronic devices and integrated circuits.
摘要翻译： 通过使用偏转或阻挡反向散射电子的高电压电子束来制造掩模来实现电子掩模中的最小特征尺寸和邻近效应的分辨率的改善。 新颖的掩模结构包括透明支撑体，设置在所述支撑体上的吸收层，设置在所述吸收层上的电介质层和设置在所述介电层上的抗蚀剂层。 介电层被认为用于提高所述掩模中的分辨率，其可以多次打印用于各种应用的图案，包括电子器件和集成电路。
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12.发明授权Apparatus and method using low-voltage and/or low-current scanning probe lithography 失效使用低电压和/或低电流扫描探针光刻的装置和方法
公开(公告)号：US5504338A
公开(公告)日：1996-04-02
申请号：US83578
申请日：1993-06-30
CPC分类号： G03F7/2049 , B82Y10/00 , G01Q80/00 , G11B9/14 , Y10S977/855
摘要： An apparatus and method lithographically patterns an imaging layer using a predetermined pattern. The apparatus includes a cantilever having a tip attached thereto, which tip includes a conductive or semiconductive material. The apparatus also includes a scanning probe controller connected to the cantilever, which maintains the tip in contact with the imaging layer to be patterned. Substantially while the scanning probe controller maintains the tip in contact with the imaging layer, a voltage and/or current generator coupled to the tip selectively generates a voltage and/or current between the tip and the imaging layer to affect a physical change in the imaging layer based on the predetermined pattern. The physical change in the imaging layer can be exploited to fabricate integrated circuits, lithographic masks or micromechanical devices, for example. The scanning probe controller can also measure the topographical change in the imaging layer caused by the physical change using the same cantilever and tip.
摘要翻译： 一种使用预定图案光刻地成像层的设备和方法。 该装置包括具有连接到其上的尖端的悬臂，该尖端包括导电或半导体材料。 该装置还包括连接到悬臂的扫描探针控制器，其保持尖端与待图案化的成像层接触。 基本上当扫描探针控制器保持尖端与成像层接触时，耦合到尖端的电压和/或电流发生器选择性地在尖端和成像层之间产生电压和/或电流，以影响成像的物理变化 基于预定图案。 例如，可以利用成像层中的物理变化来制造集成电路，光刻掩模或微机械器件。 扫描探针控制器还可以测量由使用相同悬臂和尖端的物理变化引起的成像层的地形变化。
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公开(公告)号：US5336892A
公开(公告)日：1994-08-09
申请号：US882230
申请日：1992-05-13
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/2061 , H01J2237/31769 , H01J2237/31796
摘要： Improvement of resolution in terms of reducing minimum feature sizes and ximity effects on bulk substrates in high voltage electron beam lithography as applied to manufacture of electronic circuits from coated semiconductors involves the use of a dielectric layer interposed between an electrically semiconducting substrate and a resist layer. The dielectric layer functions to reduce the resist exposure resulting from the backscattered electrons coming from the substrate into the resist layer.
摘要翻译： 在应用于从涂覆的半导体制造电子电路的高电压电子束光刻中减小最小特征尺寸和邻近效应方面的分辨率的改进涉及使用介于电半导体衬底和抗蚀剂层之间的电介质层。 介电层起到减少从衬底进入抗蚀剂层的后向散射电子产生的抗蚀剂曝光。
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