Current-in-plane magnetoresistive sensor with longitudinal biasing layer having a nonmagnetic oxide central region and method for fabrication of the sensor
    3.
    发明授权
    Current-in-plane magnetoresistive sensor with longitudinal biasing layer having a nonmagnetic oxide central region and method for fabrication of the sensor 失效
    具有具有非磁性氧化物中心区域的纵向偏置层的电流平面内磁阻传感器和用于制造传感器的方法

    公开(公告)号:US06778364B2

    公开(公告)日:2004-08-17

    申请号:US10230903

    申请日:2002-08-28

    IPC分类号: G11B539

    摘要: A current-in-the-plane (CIP) giant magnetoresistive (GMR) spin valve sensor has its free layer magnetization stabilized by longitudinal biasing through the use of free layer end-region antiferromagnetic exchange coupling. An antiparallel coupling (APC) layer, such as Ru, is formed on the free layer and a ferromagnetic bias layer is formed on the APC layer. The bias layer is a continuous layer that extends across the entire width of the free layer. The central region of the bias layer is formed of nonmagnetic oxides of one or more of the elements making up the bias layer, with the bias layer end regions remaining ferromagnetic. The oxidized central region of the bias layer defines the central active trackwidth region of the underlying free layer. The ferromagnetic end regions of the bias layer are antiferromagnetically coupled across the APC layer to the corresponding underlying free layer end regions to provide the longitudinal biasing.

    摘要翻译: 电流平面(CIP)巨磁阻(GMR)自旋阀传感器通过使用自由层末端反铁磁交换耦合的纵向偏置使其自由层磁化稳定。 在自由层上形成诸如Ru的反平行耦合(APC)层,并且在APC层上形成铁磁偏置层。 偏置层是在自由层的整个宽度上延伸的连续层。 偏置层的中心区域由构成偏置层的一个或多个元件的非磁性氧化物形成,偏置层端部区域保持铁磁性。 偏置层的氧化中心区域定义了下层自由层的中心主动轨道宽度区域。 偏置层的铁磁端区域跨越APC层反铁磁耦合到相应的下游自由层端部区域以提供纵向偏置。

    Supporting membranes on nanometer-scale self-assembled films
    6.
    发明授权
    Supporting membranes on nanometer-scale self-assembled films 有权
    在纳米级自组装膜上支撑膜

    公开(公告)号:US08206601B2

    公开(公告)日:2012-06-26

    申请号:US12641782

    申请日:2009-12-18

    IPC分类号: B44C1/22

    摘要: Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.

    摘要翻译: 已经出现嵌段共聚物光刻作为替代的光刻方法,以在分辨率接近或超过用于形成位图案化介质和离散轨道介质的常规平版印刷技术的极限之下实现大面积,高密度图案。 在一个实施例中,结构包括从衬底向上延伸的多个纳米结构和延伸穿过多个纳米结构的上端的多孔膜。 根据另一个实施方案的方法包括在基材上形成嵌段共聚物层,诱导嵌段共聚物层的自组装,从嵌段共聚物层选择性降解嵌段聚合物,在嵌段共聚物层上形成多孔膜,并除去 所述嵌段共聚物层的一部分用于限定在所述嵌段共聚物层上形成所述多孔膜之后从所述基材向上延伸的多个纳米结构。 还公开了其它系统和方法。

    SUPPORTING MEMBRANES ON NANOMETER-SCALE SELF-ASSEMBLED FILMS
    9.
    发明申请
    SUPPORTING MEMBRANES ON NANOMETER-SCALE SELF-ASSEMBLED FILMS 有权
    在纳米尺寸自组装膜上支撑膜

    公开(公告)号:US20110151236A1

    公开(公告)日:2011-06-23

    申请号:US12641782

    申请日:2009-12-18

    IPC分类号: B32B3/26 B44C1/22

    摘要: Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.

    摘要翻译: 已经出现嵌段共聚物光刻作为替代的光刻方法,以在分辨率接近或超过用于形成位图案化介质和离散轨道介质的常规平版印刷技术的极限之下实现大面积,高密度图案。 在一个实施例中,结构包括从衬底向上延伸的多个纳米结构和延伸穿过多个纳米结构的上端的多孔膜。 根据另一个实施方案的方法包括在基材上形成嵌段共聚物层,诱导嵌段共聚物层的自组装,从嵌段共聚物层选择性降解嵌段聚合物,在嵌段共聚物层上形成多孔膜,并除去 所述嵌段共聚物层的一部分用于限定在所述嵌段共聚物层上形成所述多孔膜之后从所述基材向上延伸的多个纳米结构。 还公开了其它系统和方法。