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公开(公告)号：US20170018076A1
公开(公告)日：2017-01-19
申请号：US14797803
申请日：2015-07-13
CPC分类号： A61B6/502 , A61B6/032 , A61B6/481 , A61B6/5217 , G06K9/52 , G06K9/6262 , G06K9/6267 , G06K9/629 , G06K2009/4666 , G06K2209/05
摘要： The invention provides a method and apparatus for classifying a region of interest in imaging data, the method comprising: calculating a feature vector for at least one region of interest in the imaging data, said feature vector including features of a first modality; projecting the feature vector for the at least one region of interest in the imaging data using a decision function to generate a classification, wherein the decision function is based on classified feature vectors including features of a first modality and features of a second modality; estimating the confidence of the classification if the feature vector is enhanced with features of the second modality.
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12.发明授权Method and apparatus for estimating model parameters of and controlling a lithographic apparatus by measuring a substrate property and using a polynomial model 有权通过测量基板特性和使用多项式模型来估计光刻设备的模型参数和控制光刻设备的方法和装置公开(公告)号：US08947642B2
公开(公告)日：2015-02-03
申请号：US13010402
申请日：2011-01-20
CPC分类号： G03F7/70633 , G03F7/705 , G03F7/70616
摘要： System and methods estimate model parameters of a lithographic apparatus and control lithographic processing by a lithographic apparatus. An exposure is performed using a lithographic apparatus across a wafer. A set of predetermined wafer measurement locations is obtained. Discrete orthonormal polynomials are generated using the predetermined substrate measurement locations. The overlay errors arising from the exposure are measured at the predetermined locations to obtain overlay measurements. The estimated model parameters of the lithographic apparatus are calculated from the overlay measurements by using the discrete orthogonal polynomials as a basis function to model the overlay across the wafer. Finally, the estimated model parameters are used to control the lithographic apparatus in order to provide corrected overlay across the wafer.
摘要翻译： 系统和方法估计光刻设备的模型参数并通过光刻设备控制光刻处理。 使用光刻设备在晶片上进行曝光。 获得一组预定的晶片测量位置。 使用预定的基板测量位置产生离散正交多项式。 在预定位置测量曝光引起的重叠误差，以获得覆盖测量值。 通过使用离散正交多项式作为对跨越晶片的覆盖进行建模的基础函数，从重叠测量计算光刻设备的估计模型参数。 最后，估计的模型参数用于控制光刻设备，以便在晶片上提供校正的覆盖。
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公开(公告)号：US10130323B2
公开(公告)日：2018-11-20
申请号：US14797803
申请日：2015-07-13
摘要： The invention provides a method and apparatus for classifying a region of interest in imaging data, the method comprising: calculating a feature vector for at least one region of interest in the imaging data, said feature vector including features of a first modality; projecting the feature vector for the at least one region of interest in the imaging data using a decision function to generate a classification, wherein the decision function is based on classified feature vectors including features of a first modality and features of a second modality; estimating the confidence of the classification if the feature vector is enhanced with features of the second modality.
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公开(公告)号：US08612045B2
公开(公告)日：2013-12-17
申请号：US12633252
申请日：2009-12-08
申请人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
发明人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
摘要： Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
摘要翻译： 记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特征。 然后对最终特征进行建模，并优化变量的值。
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公开(公告)号：US10706534B2
公开(公告)日：2020-07-07
申请号：US15660568
申请日：2017-07-26
摘要： The invention provides a method and device for creating a model for classifying a data point in imaging data representing measured intensities, the method comprising: training a model using a first labelled set of imaging data points; determining at least one first image part in the first labelled set which the model incorrectly classifies; generating second image parts similar to at least one image part; further training the model using the second image parts. Preferably the imaging data points and the second image parts comprise 3D data points.
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公开(公告)号：US10265040B2
公开(公告)日：2019-04-23
申请号：US14797756
申请日：2015-07-13
摘要： The invention provides a method and apparatus for classifying a region of interest in imaging data, the method comprising: calculating a feature vector for at least one region of interest in the imaging data; projecting the feature vector for the at least one region of interest in the imaging data using a plurality of decision functions to generate a corresponding plurality of classifications; calculating an ensemble classification based on the plurality of classifications. receiving from the user feedback information concerning the ensemble classification; forming an additional classified feature vector from the feature vector and the feedback information; and updating at least one of the plurality of decision functions using the additional classified feature vector.
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公开(公告)号：US20170018075A1
公开(公告)日：2017-01-19
申请号：US14797756
申请日：2015-07-13
CPC分类号： A61B6/502 , A61B6/032 , A61B6/5217 , G06K9/6263 , G06K9/6292 , G06N5/045 , G06N99/005
摘要： The invention provides a method and apparatus for classifying a region of interest in imaging data, the method comprising: calculating a feature vector for at least one region of interest in the imaging data; projecting the feature vector for the at least one region of interest in the imaging data using a plurality of decision functions to generate a corresponding plurality of classifications; calculating an ensemble classification based on the plurality of classifications. receiving from the user feedback information concerning the ensemble classification; forming an additional classified feature vector from the feature vector and the feedback information; and updating at least one of the plurality of decision functions using the additional classified feature vector.
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公开(公告)号：US08947630B2
公开(公告)日：2015-02-03
申请号：US13013333
申请日：2011-01-25
CPC分类号： G03F7/70633 , G03F7/70525 , G03F7/70625 , G03F7/70641
摘要： A method controls scanning function of a lithographic apparatus. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Compensation is performed based on the determination. A different parameterization is used for control of the scanning control module than for communication between the scanning control module and the lithographic apparatus.
摘要翻译： 一种方法控制光刻设备的扫描功能。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片检索基线控制参数。 参数漂移由基线控制参数决定。 基于确定进行补偿。 与扫描控制模块和光刻设备之间的通信相比，使用不同的参数化来控制扫描控制模块。
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公开(公告)号：US20110205511A1
公开(公告)日：2011-08-25
申请号：US13013333
申请日：2011-01-25
IPC分类号： G03B27/42
CPC分类号： G03F7/70633 , G03F7/70525 , G03F7/70625 , G03F7/70641
摘要： A method controls scanning function of a lithographic apparatus. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Compensation is performed based on the determination. A different parameterization is used for control of the scanning control module than for communication between the scanning control module and the lithographic apparatus.
摘要翻译： 一种方法控制光刻设备的扫描功能。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片检索基线控制参数。 参数漂移由基线控制参数决定。 基于确定进行补偿。 与扫描控制模块和光刻设备之间的通信相比，使用不同的参数化来控制扫描控制模块。
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公开(公告)号：US20100161099A1
公开(公告)日：2010-06-24
申请号：US12633252
申请日：2009-12-08
申请人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
发明人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
摘要： Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
摘要翻译： 记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特征。 然后对最终特征进行建模，并优化变量的值。
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