公开(公告)号：US20140374884A1

公开(公告)日：2014-12-25

申请号：US14483860

申请日：2014-09-11

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Masafumi YOSHIDA

IPC: C09D11/101 ,  B05D5/00 ,  H01L21/308 ,  B29C59/16 ,  H01L21/027 ,  C08F220/18 ,  B29C59/00

CPC classification number: C09D11/101 ,  B05D5/00 ,  B29C59/005 ,  B29C59/16 ,  B29K2033/12 ,  C08F2/48 ,  C08F220/18 ,  C08F220/58 ,  C08F236/20 ,  C08F2220/325 ,  G03F7/0002 ,  G03F7/0046 ,  G03F7/027 ,  H01L21/0274 ,  H01L21/3086 ,  H01L21/31138 ,  H01L21/31144 ,  Y10T428/24802 ,  C08F2220/185 ,  C08F2222/1013 ,  C08F2220/1858

Abstract: To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger; Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

Abstract translation: 为了提供可以确保模具填充的高比例和脱模时的低缺陷密度的用于印痕的光固化性组合物，并且可以提供具有高蚀刻耐久性的抗蚀剂材料。 在25℃下的粘度为15mPa·s以下，Ohnishi参数为3.0以下的单官能单体，多官能单体和光聚合引发剂的印模用光固化性组合物和交联密度 由（式1）计算为0.6mmol / cm 3以上; 交联密度= {＆Sgr（多官能单体的混合比例（质量份）*多官能单体的官能团数/多官能单体的分子量）} /比重。