公开(公告)号：US10916435B2

公开(公告)日：2021-02-09

申请号：US16084196

申请日：2017-03-06

Applicant: FUJIMI INCORPORATED

Inventor： Yasuto Ishida

IPC: H01L21/304 ,  C09G1/02 ,  C11D1/04 ,  C11D1/12 ,  C11D7/34 ,  C11D11/00 ,  H01L21/02

Abstract: The present invention provides a means for sufficiently removing organic residues remaining on the surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished. The present invention relates to a surface treatment composition including a polymer compound having a sulfonic acid (salt) group and water, wherein the surface treatment composition has a pH value of less than 7 and the surface treatment composition is used for decreasing an organic residue on a surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished.

公开(公告)号：US10781410B2

公开(公告)日：2020-09-22

申请号：US16127536

申请日：2018-09-11

Applicant: FUJIMI INCORPORATED

Inventor： Yasuto Ishida ,  Tsutomu Yoshino ,  Shogo Onishi

IPC: C11D3/60 ,  C11D7/32 ,  C11D11/00 ,  C11D7/34 ,  C11D7/26 ,  H01L21/02 ,  C11D3/37 ,  H01L21/3105

Abstract: The composition for surface treatment according to the present invention includes a carboxylic acid compound having two or more nitrogen atoms, an ionic dispersing agent, and water, has a pH of less than 6, and is used for treating a surface of a polished object having a tungsten-containing layer.

公开(公告)号：US20200294808A1

公开(公告)日：2020-09-17

申请号：US16084196

申请日：2017-03-06

Applicant: Fujimi Incorporated

Inventor： Yasuto Ishida

IPC: H01L21/304 ,  H01L21/02 ,  C11D7/34 ,  C11D1/04 ,  C11D1/12 ,  C11D11/00

Abstract: The present invention provides a means for sufficiently removing organic residues remaining on the surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished. The present invention relates to a surface treatment composition including a polymer compound having a sulfonic acid (salt) group and water, wherein the surface treatment composition has a pH value of less than 7 and the surface treatment composition is used for decreasing an organic residue on a surface of an object to be polished which contains silicon nitride, silicon oxide, or polysilicon and has been polished.