Abstract:
There is provided by the present invention aromatic polyester-siloxane block copolymers which can be made by effecting the condensation between tetramethyldisiloxane bisbenzoic acid or acid chloride with a dihydric phenol such as bisphenol A or in combination with a mixture of such tetramethyldisiloxane bisbenzoic acid and aromatic acids, such as terephthalic acid or isophthalic acid. The aromatic polyester-siloxane block copolymers can be used as molding compounds, extruded films, in making composite matrix materials and as flame retardants for aromatic polycarbonates.
Abstract:
Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also water-soluble and is also removed simultaneously with development.
Abstract:
Disclosed herein is a polycarbonate copolymer comprising A) a structure derived from a dihydroxy alkylene oxide compound selected from the group consisting of formula (1a) and formula (1b): H-(E-X)l—OH (1a) H-(E-X-E)l-OH (1b) wherein E and X are different and each and independently are selected from the group consisting of formula (2a) and formula (2b): —(OCH2CH2)m— (2a) —(OCHRCH2)n— (2b) wherein R is a C1-8 alkyl group; l, m, and n are integers greater than or equal to 1; and wherein the weight average molecular weight of the total amount of the structures corresponding to formula (2b) in the copolymer is between 100 and 2,000 g/mol; and B) a structure derived from a dihydroxy aromatic compound, wherein the weight percentages are based on the total weight of the structures of A) and B).
Abstract:
There is provided herein an optical storage media which has low VBR. In a preferred embodiment, there is provided an optical disk comprising a genus of copolycarbonates, including copolyestercarbonates, which have excellent physical and optical properties. Said copolycarbonates have proportions of structural units which fall within a specific composition range, and said range defines certain materials, a large percentage of which can be molded into optical disks having the desired optical properties, including low VBR.
Abstract:
A method is provided for making silicone polycarbonate block copolymers and polycarbonate blends thereof having reduced haze. Silicone polycarbonate block copolymer formation is effected by using a phase transfer catalyst to generate polycarbonate oligomers having at least one terminal haloformate group followed by the late addition of hydroxyaryl terminated polydiorganosiloxane.
Abstract:
Spin castable mixtures are provided which are useful for applying onto photoresist surfaces to produce a contrast enhancement layer employing .alpha.-alkyl-N-alkyl nitrones in combination with an inert organic binder and solvent. The .alpha.-alkyl-N-alkyl nitrones can be used with 200-300 nanometers UV light.
Abstract:
Contrast enhancement compositions are provided which can be used to make contrast enhancement layer photoresist composites. The composites can be used to make patterned photoresists under mid-UV light and utilize photobleachable alkylnitrones.
Abstract:
A method for preparing nitrones from mixtures of arylhydroxylamines and alkylhydroxylamines containing zinc oxide solids is provided which does not require filtration of the mixture prior to reaction. This is accomplished by introducing a dilute acid solution to the mixture so as to solubilize the zinc oxide powder. The hydroxylamines within solution may be reacted with an aldehyde to produce a nitrone where the dilute acid dissolves the zinc oxide.
Abstract:
High molecular weight siloxane polyamic acids and polyimides are prepared by the reaction of dianhydrides with diamines in a polar aprotic solvent, all of the reagents and solvent being highly purified and substantially anhydrous. The polyamic acids may be coated on substrates and baked to form polyimide dielectric layers. When so used, they are free from certain disadvantages of lower molecular weight polymers, especially undercutting and scum formation during photolithography and etching procedures.
Abstract:
Nitric oxide, an odd-electron molecule, has been found to react with m-phosphoric acid to displace hydrogen and form nitrosyl m-phosphate. The addition of water to the nitrosyl salt regenerates the m-phosphoric acid, half the nitric oxide and the other half as nitrogen dioxide which can then be converted to nitric oxide in an oxidation process. These reactions thus form a cyclic process for obtaining hydrogen from water with low level energy.