公开(公告)号：US20190300544A1

公开(公告)日：2019-10-03

申请号：US16370756

申请日：2019-03-29

Applicant: GENENTECH, INC.

Inventor： Steven MCKERRALL ,  Brian Salvatore SAFINA ,  Aleksandr KOLESNIKOV ,  Birong ZHANG ,  Wenfeng LIU ,  Kwong Wah LAI

IPC: C07D498/04 ,  C07D471/04 ,  A61P25/24 ,  A61P9/00 ,  A61P11/00

Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20180105504A1

公开(公告)日：2018-04-19

申请号：US15799771

申请日：2017-10-31

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Daniel SUTHERLIN ,  Steven MCKERRALL ,  Michael Scott WILSON ,  Kwong Wah LAI ,  Philippe BERGERON ,  Birong ZHANG

IPC: C07D277/52 ,  C07D239/69 ,  C07D285/08 ,  C07D417/12 ,  C07D213/76 ,  C07D401/12 ,  C07D403/12 ,  C07D261/16

CPC classification number: C07D277/52 ,  A61K31/427 ,  A61P19/02 ,  A61P29/00 ,  C07D213/76 ,  C07D239/69 ,  C07D261/16 ,  C07D285/08 ,  C07D401/12 ,  C07D403/12 ,  C07D417/12

Abstract: The invention provides a compound of formula I: or a pharmaceutically acceptable salt thereof, wherein the variables X, Y1-Y5, R1, R2, R3, R4, and Het have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210253548A1

公开(公告)日：2021-08-19

申请号：US17152185

申请日：2021-01-19

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Chien-an CHEN ,  Sultan CHOWDHURY ,  Shannon Marie DECKER ,  Christoph Martin DEHNHARDT ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Brian SAFINA ,  Tao SHENG ,  Dan SUTHERLIN

IPC: C07D401/04 ,  C07D401/14 ,  C07D405/14 ,  C07D231/56 ,  C07D403/04 ,  C07D405/04 ,  C07D403/06 ,  C07D403/12 ,  A61P29/00

Abstract: The invention provides compounds having the general formula (I): and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, n, ring A, X2, L, m, R1, R2, R3, R4, R5, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210155588A1

公开(公告)日：2021-05-27

申请号：US17011355

申请日：2020-09-03

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Sultan CHOWDHURY ,  Christoph Martin DEHNHARDT ,  Thilo FOCKEN ,  Michael Edward GRIMWOOD ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Daniel SUTHERLIN

IPC: C07C381/10 ,  C07D401/12 ,  C07D205/04 ,  C07D211/22 ,  C07D211/42 ,  C07D213/69 ,  A61P25/04

Abstract: The invention provides compounds having the general formula I: and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, ring B, R1, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20200017469A1

公开(公告)日：2020-01-16

申请号：US16495802

申请日：2018-03-22

Applicant: GENENTECH, INC.

Inventor： Daniel SUTHERLIN ,  Steven MCKERRALL ,  Kwong Wah LAI

IPC: C07D401/14

Abstract: The invention provides 4-piperidin-chroman-7-sulfonamide derivatives and salts thereof that are sodium channel modulators, as well as compositions containing such a compound or salt and therapeutic methods for using such a compound, salt, or composition.

公开(公告)号：US20180346441A1

公开(公告)日：2018-12-06

申请号：US15779065

申请日：2016-11-22

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Chien-an CHEN ,  Sultan CHOWDHURY ,  Shannon Marie DECKER ,  Christoph Martin DEHNHARDT ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Brian SAFINA ,  Tao SHENG ,  Dan SUTHERLIN

IPC: C07D401/04 ,  C07D403/04 ,  C07D401/14 ,  C07D231/56 ,  C07D405/14 ,  C07D405/04 ,  A61P29/00

CPC classification number: C07D401/04 ,  A61P29/00 ,  C07D231/56 ,  C07D401/14 ,  C07D403/04 ,  C07D403/06 ,  C07D403/12 ,  C07D405/04 ,  C07D405/14

Abstract: The invention provides compounds having the general formula (I): and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, n, ring A, X2, L, m, R1, R2, R3, R4, R5, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.