公开(公告)号：US20190112264A1

公开(公告)日：2019-04-18

申请号：US16088417

申请日：2017-03-28

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Sultan CHOWDHURY ,  Christoph Martin DEHNHARDT ,  Thilo FOCKEN ,  Michael Edward GRIMWOOD ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Daniel SUTHERLIN

IPC: C07C381/10 ,  C07D205/04 ,  C07D213/69 ,  C07D211/42 ,  C07D211/22 ,  C07D401/12 ,  A61P25/04

CPC classification number: C07C381/10 ,  A61P25/04 ,  C07D205/04 ,  C07D211/22 ,  C07D211/42 ,  C07D213/69 ,  C07D401/12

Abstract: The invention provides compounds having the general formula I: (i) and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, ring B, R1, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20180291014A1

公开(公告)日：2018-10-11

申请号：US15939112

申请日：2018-03-28

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Phillipe BERGERON ,  Kristen BURFORD ,  Sultan CHOWDHURY ,  Christoph Martin DEHNHARDT ,  Thilo FOCKEN ,  Michael Edward GRIMWOOD ,  Abid HASAN ,  Kwong Wah LAI ,  Zhiguo LIU ,  Steven MCKERRALL ,  Teresa Phuongtram NGUYEN ,  Brian SAFINA ,  Daniel SUTHERLIN ,  Tao WANG

IPC: C07D417/12 ,  C07D417/14 ,  C07D401/12 ,  C07D405/14 ,  C07D491/107 ,  A61P17/04

Abstract: The invention provides a compound of formula: or a salt thereof, wherein the variables RAA, n, ring A, ring B, R1a, R1b, R2, R3, R4, R5, R6, R7, R8, and R9 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210171516A1

公开(公告)日：2021-06-10

申请号：US17031348

申请日：2020-09-24

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Philippe BERGERON ,  Kristen BURFORD ,  Sultan CHOWDHURY ,  Christoph Martin DEHNHARDT ,  Thilo FOCKEN ,  Michael Edward GRIMWOOD ,  Abid HASAN ,  Kwong Wah LAI ,  Zhiguo LIU ,  Steven MCKERRALL ,  Teresa Phuongtram NGUYEN ,  Brian Salvatore SAFINA ,  Daniel SUTHERLIN ,  Tao WANG

IPC: C07D417/12 ,  C07D417/14 ,  A61P17/04 ,  C07D401/12 ,  C07D405/14 ,  C07D491/107

Abstract: The invention provides a compound of formula: or a salt thereof, wherein the variables RAA, n, ring A, ring B, R1a, R1b, R2, R3, R4, R5, R6, R7, R8, and R9 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20180105504A1

公开(公告)日：2018-04-19

申请号：US15799771

申请日：2017-10-31

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Daniel SUTHERLIN ,  Steven MCKERRALL ,  Michael Scott WILSON ,  Kwong Wah LAI ,  Philippe BERGERON ,  Birong ZHANG

IPC: C07D277/52 ,  C07D239/69 ,  C07D285/08 ,  C07D417/12 ,  C07D213/76 ,  C07D401/12 ,  C07D403/12 ,  C07D261/16

CPC classification number: C07D277/52 ,  A61K31/427 ,  A61P19/02 ,  A61P29/00 ,  C07D213/76 ,  C07D239/69 ,  C07D261/16 ,  C07D285/08 ,  C07D401/12 ,  C07D403/12 ,  C07D417/12

Abstract: The invention provides a compound of formula I: or a pharmaceutically acceptable salt thereof, wherein the variables X, Y1-Y5, R1, R2, R3, R4, and Het have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210253548A1

公开(公告)日：2021-08-19

申请号：US17152185

申请日：2021-01-19

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Chien-an CHEN ,  Sultan CHOWDHURY ,  Shannon Marie DECKER ,  Christoph Martin DEHNHARDT ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Brian SAFINA ,  Tao SHENG ,  Dan SUTHERLIN

IPC: C07D401/04 ,  C07D401/14 ,  C07D405/14 ,  C07D231/56 ,  C07D403/04 ,  C07D405/04 ,  C07D403/06 ,  C07D403/12 ,  A61P29/00

Abstract: The invention provides compounds having the general formula (I): and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, n, ring A, X2, L, m, R1, R2, R3, R4, R5, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210155588A1

公开(公告)日：2021-05-27

申请号：US17011355

申请日：2020-09-03

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Sultan CHOWDHURY ,  Christoph Martin DEHNHARDT ,  Thilo FOCKEN ,  Michael Edward GRIMWOOD ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Daniel SUTHERLIN

IPC: C07C381/10 ,  C07D401/12 ,  C07D205/04 ,  C07D211/22 ,  C07D211/42 ,  C07D213/69 ,  A61P25/04

Abstract: The invention provides compounds having the general formula I: and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, ring B, R1, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20180346441A1

公开(公告)日：2018-12-06

申请号：US15779065

申请日：2016-11-22

Applicant: GENENTECH, INC. ,  XENON PHARMACEUTICALS INC.

Inventor： Chien-an CHEN ,  Sultan CHOWDHURY ,  Shannon Marie DECKER ,  Christoph Martin DEHNHARDT ,  Ivan William HEMEON ,  Steven MCKERRALL ,  Brian SAFINA ,  Tao SHENG ,  Dan SUTHERLIN

IPC: C07D401/04 ,  C07D403/04 ,  C07D401/14 ,  C07D231/56 ,  C07D405/14 ,  C07D405/04 ,  A61P29/00

CPC classification number: C07D401/04 ,  A61P29/00 ,  C07D231/56 ,  C07D401/14 ,  C07D403/04 ,  C07D403/06 ,  C07D403/12 ,  C07D405/04 ,  C07D405/14

Abstract: The invention provides compounds having the general formula (I): and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, n, ring A, X2, L, m, R1, R2, R3, R4, R5, and RN have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20250042917A1

公开(公告)日：2025-02-06

申请号：US18912279

申请日：2024-10-10

Applicant: Genentech, Inc.

Inventor： Steven MCKERRALL ,  Brian Salvatore SAFINA ,  Aleksandr KOLESNIKOV ,  Birong ZHANG ,  Wenfeng LIU ,  Kwong Wah LAI

IPC: C07D498/04 ,  A61K31/4375 ,  A61K31/5365 ,  A61P9/00 ,  A61P11/00 ,  A61P25/00 ,  A61P25/24 ,  A61P29/00 ,  C07D471/04

Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20190263786A1

公开(公告)日：2019-08-29

申请号：US16283451

申请日：2019-02-22

Applicant: GENENTECH, INC.

Inventor： Daniel SUTHERLIN ,  Steven MCKERRALL ,  Kwong Wah LAI ,  Zhiguo LIU ,  Wenfeng LIU ,  Ramsay BEVERIDGE ,  Jean-Philippe LECLERC ,  Alexandre LEMIRE ,  Liang ZHAO ,  Claudio STURINO

IPC: C07D403/12 ,  C07D233/96 ,  C07D401/12 ,  C07D401/14 ,  C07D263/52 ,  C07D305/06 ,  A61P17/04

Abstract: The invention provides a compound as described herein or a pharmaceutically acceptable salt thereof, and compositions containing such compounds and methods for using such compounds and compositions.

公开(公告)号：US20210253597A1

公开(公告)日：2021-08-19

申请号：US17153536

申请日：2021-01-20

Applicant: GENENTECH, INC.

Inventor： Steven MCKERRALL ,  Brian Salvatore SAFINA ,  Aleksandr KOLESNIKOV ,  Birong ZHANG ,  Wenfeng LIU ,  Kwong Wah LAI

IPC: C07D498/04 ,  C07D471/04 ,  A61P11/00 ,  A61P9/00 ,  A61P25/24 ,  A61P25/00 ,  A61P29/00

Abstract: The invention provides a compound of formula (I): or a pharmaceutically acceptable salt thereof; wherein, A, B, ring C, R3, R4, R5, R6, and R7 have the meaning as described herein, and compositions containing such compounds and methods for using such compounds and compositions.