摘要:
Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.
摘要:
A measurement and compensation system for thermal errors in a machine tool is disclosed. A module is provided to compensate thermal errors of the machine tool. The module comprises an operating part, a data bank, an analog to digital converter, a counter and a digital input/output part. The data bank stores in all the coefficients applied to a thermal error modeling equation which governs a relation between temperatures and thermal errors at various operating conditions. The operating part determines all the coefficients of the thermal error modeling equation which are stored in the data bank and calculates the thermal errors corresponding to the temperatures of a plurality of the thermocouples by the temperatures of a plurality of thermocouples inputted from the A/D converter and the positional coordinates of the bed inputted from the counter. Then, digital data of the calculated thermal errors are inputted into the digital input/output part and the digital input/output part converts the digital data to digital signal to input the digital signals into the controller. A controller orders the machine tool to compensate the thermal errors at the positional coordinates of the bed and the feed of the spindle. Accordingly, since the machine tool compensates the thermal errors in advance, the machine tool processes precisely workpieces in spite of the occurrence of the thermal errors.
摘要:
The present disclosure relates to a composition for treating anxiety disorder, particularly to a pharmaceutical composition comprising N-acetyl-L-cysteine or its derivatives for treating anxiety disorder such as post traumatic stress disorder or phobia. In accordance with the present disclosure, N-acetyl-L-cysteine can block the renewal of fear memories for a sustained period of time when it was administered during or after an exposure therapy to treat post traumatic stress disorder or phobia.
摘要:
The present disclosure relates to a composition for treating anxiety disorder, particularly to a pharmaceutical composition comprising N-acetyl-L-cysteine or its derivatives for treating anxiety disorder such as post traumatic stress disorder or phobia. In accordance with the present disclosure, N-acetyl-L-cysteine can block the renewal of fear memories for a sustained period of time when it was administered during or after an exposure therapy to treat post traumatic stress disorder or phobia.
摘要:
According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions.
摘要:
Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.
摘要:
In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
摘要:
The present invention relates to a treatment method of the implant abutment surface to increase adhesion between the implant and its surrounding soft tissue, to prevent epithelial down-growth, to prevent bacterial infection, and to extend life-time of the implant and an implant surface-treated by the same. The method for treating surface of the dental implant or implant abutment is characterized by microgroove-formation having greater width and bottom width than the section diameter of a human gingival fibroblast and by additional acid-etching on the whole surface including ridges which used to be left as polished, so that filopodia is actively stretched out to increase adhesion between the implant and its surrounding soft tissues.