公开(公告)号：US20070242249A1

公开(公告)日：2007-10-18

申请号：US11712957

申请日：2007-03-02

申请人： Yuichi Shibazaki ,  Hideki Komatsuda

发明人： Yuichi Shibazaki ,  Hideki Komatsuda

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70466

摘要： The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions respectively, and which performs the exposure with high throughput. Upon transferring a pattern of a reticle onto a wafer by the scanning exposure method, first and second pattern areas are formed in advance on the reticle to be adjacent in the scanning direction, and when the first and second pattern areas simultaneously pass across a field of a projection optical system, the first pattern area is illuminated in a first illumination condition by using a first illumination slit of which width in the scanning direction is gradually narrowed, and the second pattern area is illuminated in a second illumination condition by using a second illumination slit of which width in the scanning direction is gradually widened, to thereby expose the wafer.

摘要翻译： 本发明提供了一种曝光方法，其分别在最佳照明条件下照亮其整个表面上的每个图案，进行双重曝光，并以高生产量进行曝光。 在通过扫描曝光方法将掩模版图案转印到晶片上之后，预先在掩模版上形成第一和第二图案区域，以在扫描方向上相邻，并且当第一和第二图案区域同时穿过 投影光学系统，通过使用其中扫描方向宽度逐渐变窄的第一照明狭缝，在第一照明条件下照亮第一图案区域，并且通过使用第二照明在第二照明条件下照亮第二图案区域 在扫描方向上的宽度的狭缝逐渐变宽，从而使晶片露出。

公开(公告)号：US07023523B2

公开(公告)日：2006-04-04

申请号：US11177141

申请日：2005-07-07

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/42

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70283 ,  G03F7/70358

摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.

摘要翻译： 曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。 系统将掩模图案精确地传送到感光基片上。 该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。 投影光学系统在感光基板（W）上形成掩模图案的图像。 掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。 照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。 掩模和场停止之间的间隔满足规定的条件关系。

公开(公告)号：US20050264789A1

公开(公告)日：2005-12-01

申请号：US11177141

申请日：2005-07-07

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70283 ,  G03F7/70358

摘要： Exposure systems are disclosed having a configuration in which a field stop is positioned in proximity to a reflection-type mask, but that satisfactorily minimize adverse effects on the image-forming performance of the projection-optical system. The systems transfer a mask pattern accurately and with high throughput onto a photosensitive substrate. The system comprises an illumination-optical system (1, 2) that illuminates a reflection-type mask (M) on which is formed a prescribed pattern. A projection-optical system forms an image of the mask pattern on the photosensitive substrate (W). The mask and substrate are moved in a prescribed direction relative to the projection-optical system to project the mask pattern onto and expose the photosensitive substrate. The illumination-optical system has a field stop (19), positioned in proximity to the mask, that defines the illumination area on the mask. The interval between the mask and the field stop satisfies a prescribed conditional relation.

摘要翻译： 曝光系统具有这样的结构，其中场挡板位于反射型掩模附近，但令人满意地最小化对投影光学系统的图像形成性能的不利影响。 系统将掩模图案精确地传送到感光基片上。 该系统包括照射形成规定图案的反射型掩模（M）的照明光学系统（1,2）。 投影光学系统在感光基板（W）上形成掩模图案的图像。 掩模和基板相对于投影光学系统在规定的方向上移动，以将掩模图案投射到曝光光敏基片上。 照明光学系统具有位于掩模附近的场停止件（19），其限定掩模上的照明区域。 掩模和场停止之间的间隔满足规定的条件关系。

公开(公告)号：US06665051B2

公开(公告)日：2003-12-16

申请号：US10208033

申请日：2002-07-31

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/70083 ,  G03F7/70108 ,  G03F7/70233 ,  G03F7/70358

摘要： An exposure apparatus that exposes an image of a pattern of a mask onto a photosensitive substrate with EUV radiation, and includes a radiation source unit and an exposure apparatus body unit. The exposure apparatus body unit includes an optical integrator, a mirror arranged in an optical path between the radiation source unit and the optical integrator, a detector arranged in an optical path of the exposure apparatus body unit, and a controller which is connected to the detector and which controls an inclination of the mirror based on an output from the detector. In addition, the radiation source unit and the exposure apparatus body unit are installed independently.

公开(公告)号：US09760012B2

公开(公告)日：2017-09-12

申请号：US14236742

申请日：2012-07-31

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70091

摘要： An illumination optical system that illuminates a target surface includes a first deflector, a second deflector, and an optical integrator. The first deflector is arranged on a first face crossing an optical path of light from a light source and has a period in a first direction defined on the first face. The second deflector is arranged on a second face crossing an optical path of light from the first deflector and has a period in a second direction defined on the second face. The optical integrator has a plurality of wavefront division facets arrayed on a third face crossing an optical axis of light from the second deflector. At least one of the first and second deflectors rotates about an optical axis of the illumination optical system or about an axis parallel to the optical axis in order to adjust a pattern of an illumination distribution.

公开(公告)号：US08780328B2

公开(公告)日：2014-07-15

申请号：US12703270

申请日：2010-02-10

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70233

摘要： There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of a illumination region which is to be formed on the second surface, in order to limit a light beam traveling toward the first surface; and a second partial field stop arranged to define a second outer edge of the illumination region, in order to limit a light beam reflecting from the reflection type original plate which can be arranged on the first surface, wherein a first distance between the first partial field stop and the first surface is set to be larger than a second distance between the second partial field stop and the first surface.

摘要翻译： 公开了一种照明光学装置，用于通过能够布置在第一表面上的反射型原版照射与第一表面光学共轭的第二表面，该照明光学装置包括：第一局部场停止件，其被布置为限定第一外部 要形成在第二表面上的照明区域的边缘，以便限制朝向第一表面行进的光束; 以及第二局部场阻挡器，其布置成限定所述照明区域的第二外边缘，以便限制从可布置在所述第一表面上的所述反射型原版反射的光束，其中所述第一部分场 并且所述第一表面被设定为大于所述第二局部位置挡块与所述第一表面之间的第二距离。

公开(公告)号：US08023103B2

公开(公告)日：2011-09-20

申请号：US11712957

申请日：2007-03-02

申请人： Yuichi Shibazaki ,  Hideki Komatsuda

发明人： Yuichi Shibazaki ,  Hideki Komatsuda

IPC分类号： G03B27/42

CPC分类号： G03B27/52 ,  G03F7/70466

摘要： The present invention provides an exposure method which illuminates each of patterns, to be subjected to double exposure, on entire surfaces thereof in optimal illumination conditions respectively, and which performs the exposure with high throughput. Upon transferring a pattern of a reticle onto a wafer by the scanning exposure method, first and second pattern areas are formed in advance on the reticle to be adjacent in the scanning direction, and when the first and second pattern areas simultaneously pass across a field of a projection optical system, the first pattern area is illuminated in a first illumination condition by using a first illumination slit of which width in the scanning direction is gradually narrowed, and the second pattern area is illuminated in a second illumination condition by using a second illumination slit of which width in the scanning direction is gradually widened, to thereby expose the wafer.

摘要翻译： 本发明提供了一种曝光方法，其分别在最佳照明条件下照亮其整个表面上的每个图案，进行双重曝光，并以高生产量进行曝光。 在通过扫描曝光方法将掩模版图案转印到晶片上之后，预先在掩模版上形成第一和第二图案区域，以在扫描方向上相邻，并且当第一和第二图案区域同时穿过 投影光学系统，通过使用其中扫描方向宽度逐渐变窄的第一照明狭缝，在第一照明条件下照亮第一图案区域，并且通过使用第二照明在第二照明条件下照亮第二图案区域 在扫描方向上的宽度的狭缝逐渐变宽，从而使晶片露出。

公开(公告)号：US20090257042A1

公开(公告)日：2009-10-15

申请号：US12320942

申请日：2009-02-09

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/72 ,  G03B27/32

CPC分类号： G03F7/70216 ,  G03F7/70066

摘要： An exposure apparatus including a field stop is provided. The exposure apparatus includes an illumination optical system that guides light from a light source to a pattern forming section, a projection optical system that projects, onto an exposed surface, a pattern image formed by the pattern forming section with light from the illumination optical system, a driving section that moves, in a scanning direction, a substrate arranged on the exposed surface, and a block section that is disposed between the projection optical system and the exposed surface, where the block section has a scanning window that determines a width, in the scanning direction, of an exposure region exposed to light projected by the projection optical system.

摘要翻译： 提供包括场停止的曝光装置。 曝光装置包括：将光从光源引导到图案形成部的照明光学系统;投射光学系统，其利用来自照明光学系统的光将由图案形成部形成的图案图像投影到曝光面上; 驱动部，其沿扫描方向移动布置在所述暴露表面上的基板;以及块部，其设置在所述投影光学系统和所述暴露表面之间，其中所述块部具有确定宽度的扫描窗， 曝光于由投影光学系统投影的光的曝光区域的扫描方向。

公开(公告)号：US07446856B2

公开(公告)日：2008-11-04

申请号：US11281785

申请日：2005-11-16

申请人： Hideki Komatsuda

发明人： Hideki Komatsuda

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/702 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70075

摘要： Illumination systems are disclosed that illuminate a surface (M) for irradiation with illumination light emitted from a light source (5). An exemplary illumination system includes an incidence-side reflection-type fly-eye optical system (12) having multiple reflection-type partial optical systems arranged in rows, an emission-side reflection-type fly-eye optical system (14) having multiple reflection-type partial optical systems arranged in rows and corresponding to respective reflection-type partial optical systems of the incidence-side reflection-type fly-eye optical system (12), and a condensing optical system including two reflecting mirrors (18, 20) that guide illumination light, reflected by the emission-side reflection-type fly-eye optical system (14), to the surface (M). The center of curvature of at least one of the reflecting mirrors is optically eccentric with respect to a normal to the surface for irradiation at the center of the illuminated region.

摘要翻译： 公开了照明系统，其照射用于照射从光源（5）发出的照明光的表面（M）。 示例性照明系统包括具有排列成行的多个反射型部分光学系统的入射侧反射型飞眼光学系统（12），具有多个反射的发射侧反射型飞行光学系统（14） 对应于入射侧反射型飞行光学系统（12）的各反射型部分光学系统排列成行的偏光型部分光学系统，以及包括两个反射镜（18,20）的聚光光学系统， 引导照明光，由发射侧反射型飞眼光学系统（14）反射到表面（M）。 至少一个反射镜的曲率中心相对于用于照射区域中心的照射的表面的法线是光学偏心的。

公开(公告)号：US07312851B2

公开(公告)日：2007-12-25

申请号：US11158096

申请日：2005-06-22

申请人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

发明人： Hideki Komatsuda ,  Tomowaki Takahashi ,  Masayuki Suzuki

IPC分类号： G03B27/54 ,  G03B27/68

CPC分类号： G03F7/7025 ,  G02B17/0657 ,  G03F7/70233

摘要： A projection optical system is a catoptric system in which a field of view region and an imaging region are located spaced from an optical axis, in which a numerical aperture of light reaching each point on an image plane is substantially uniform regardless of an image height and a direction. An aperture stop for defining the numerical aperture of the projection optical system is provided, and the aperture stop is provided with an aperture portion in a predetermined shape in which the numerical aperture of light reaching each point within a predetermined region is substantially uniform over the predetermined region, that is, in a shape in which dimensions concerning two directions perpendicular to each other are different from each other. A predetermined shape of the aperture portion is defined so as to compensate for the effect of non-uniformity of the numerical aperture of light reaching each point within a predetermined region due to a partial optical system arranged between the aperture stop and an image plane not satisfying a desired projective relationship.

摘要翻译： 投影光学系统是其中视野区域和成像区域与光轴间隔开的反射系统，其中到达图像平面上的每个点的光的数值孔径与图像高度无关，并且 一个方向 提供用于限定投影光学系统的数值孔径的孔径光阑，并且孔径光阑设置有预定形状的开口部分，其中到达预定区域内的各点的光的数值孔径在预定的范围内基本均匀 即相对于彼此垂直的两个方向的尺寸彼此不同的形状。 限定孔径部分的预定形状，以补偿由于设置在孔径光阑和不能满足的光阑的图像之间的局部光学系统而在预定区域内到达各点的光的数值孔径的不均匀性的影响 期望的投射关系。