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公开(公告)号：US4050342A
公开(公告)日：1977-09-27
申请号：US702023
申请日：1976-07-02
申请人： Ikuo Suzuki , Shuji Nishiyama
发明人： Ikuo Suzuki , Shuji Nishiyama
CPC分类号： G10F1/06
摘要： A music box toy comprises a music box contained within the toy, a movable appendage partially projecting externally of the toy, means for driving the appendage, and a connecting member for operationally connecting the appendage with the drive means. During playing time of the music box, the appendage is moved by the drive means. On the other hand, when the appendage is externally moved, the connecting member is adapted to move away from the drive means.
摘要翻译： 音乐盒玩具包括玩具内包含的音乐盒，部分地从玩具外部突出的可动附件，用于驱动附肢的装置，以及用于将附件与驱动装置操作连接的连接构件。 在音乐盒的播放时间，附件由驱动装置移动。 另一方面，当附件被外部移动时，连接构件适于远离驱动装置移动。
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公开(公告)号：US09474195B2
公开(公告)日：2016-10-18
申请号：US13334656
申请日：2011-12-22
申请人： Mitsutaka Inagaki , Ikuo Suzuki , Hiroshi Oike
发明人： Mitsutaka Inagaki , Ikuo Suzuki , Hiroshi Oike
CPC分类号： H05K13/08
摘要： An image generating apparatus includes: a lighting apparatus that emits illumination light to an imaging area where at least a part of an electronic component is located; an imaging apparatus that images the imaging area irradiated with the illumination light; and an image processing apparatus that processes a captured image obtained by the imaging. The image processing apparatus generates a before-adjustment image based on the captured image, generates an adjusted image by adjusting luminance of the before-adjustment image, and generates an optimal image by setting a difference in average luminance between a designated area and a comparison area in the adjusted image largest.
摘要翻译： 一种图像产生装置包括：照明装置，其向至少一部分电子部件所在的成像区域发射照明光; 成像装置，对照射有照明光的成像区域进行成像; 以及处理通过成像获得的拍摄图像的图像处理装置。 图像处理装置基于拍摄图像生成调整前图像，通过调整调整前图像的亮度来生成调整后的图像，并通过设定指定区域和比较区域之间的平均亮度差来生成最佳图像 在调整图像最大。
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公开(公告)号：US20120013731A1
公开(公告)日：2012-01-19
申请号：US13179745
申请日：2011-07-11
申请人： Hiroshi OIKE , Ikuo Suzuki
发明人： Hiroshi OIKE , Ikuo Suzuki
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , H05K13/08
摘要： A component presence/absence judging apparatus judges the presence/absence of a component through a registration step and an inspection step. The registration step comprises an ante-mounting color information acquisition step, a post-mounting color information acquisition step and an inspection area determination step. Ante-mounting color information is acquired from an ante-mounting image taken at a predetermined portion on an ante-mounting board. Post-mounting color information is acquired from a post-mounting image taken at the predetermined portion on a post-mounting board. Then, a section having a large difference between both color information of the ante-mounting image and the post-mounting image is identified and is determined as an inspection area. At the inspection step, the presence/absence of the component at a predetermined place on each inspection board to be inspected is judged in dependence on the color information on the determined inspection area.
摘要翻译： 部件存在/不存在判断装置通过登记步骤和检查步骤来判断部件的存在/不存在。 登记步骤包括前置颜色信息获取步骤，后安装颜色信息获取步骤和检查区域确定步骤。 从安装在前端板上的预定部分的安装图像获取安装的颜色信息。 从在后安装板上的预定部分拍摄的后置安装图像获取安装后颜色信息。 然后，识别出安装前图像的两个颜色信息和后置图像之间的差异较大的部分，并将其确定为检查区域。 在检查步骤中，根据所确定的检查区域上的颜色信息判断要检查的每个检查板上的预定位置处的部件的存在/不存在。
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公开(公告)号：US20090232985A1
公开(公告)日：2009-09-17
申请号：US11908707
申请日：2006-03-17
IPC分类号： C23C16/40 , C23C16/455
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02219 , H01L21/02222 , H01L21/0228 , H01L21/31612
摘要： A method of forming a silicon oxide film, comprising the steps of: —providing a treatment substrate within a reaction chamber; —purging the gas within the reaction chamber by feeding an inert gas into the chamber under reduced pressure at a substrate temperature of 50 to 4000 C, —adsorbing, at the same temperatures and under reduced pressure, a silicon compound on the treatment substrate by pulsewise introduction of a gaseous silicon compound into the reaction chamber, —purging, at the same temperatures and under reduced pressure, the unadsorbed silicon compound in the reaction chamber with an inert gas, —at the same temperatures and under reduced pressure, introducing a pulse of ozone-containing mixed gas into the reaction chamber and producing silicon oxide by an oxidation reaction with the silicon compound adsorbed on the treatment substrate; and—repeating steps 1) to 4) if necessary to obtain the desired thickness on the substrate.
摘要翻译： 一种形成氧化硅膜的方法，包括以下步骤： - 在反应室内提供处理衬底; 通过在50至4000℃的基板温度下在减压下将惰性气体进料到反应室中，在相同的温度和减压下，通过脉冲式在处理基板上吸收硅化合物 将气态硅化合物引入反应室中，在相同的温度和减压下，用惰性气体在相同的温度和减压下，将反应室中的未吸附的硅化合物， 含臭氧的混合气体进入反应室，并与吸附在处理基板上的硅化合物进行氧化反应而生成氧化硅; 并重复步骤1）至4），如果需要在基底上获得所需的厚度。
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公开(公告)号：US06680583B2
公开(公告)日：2004-01-20
申请号：US10092606
申请日：2002-03-08
申请人： Makoto Noda , Yoshihiro Nakamura , Hideki Shimizu , Ikuo Suzuki , Daiki Goshima , Yoshihiro Matsui , Tadayoshi Samura , Ryoichi Uda , Takahiro Takizuka
发明人： Makoto Noda , Yoshihiro Nakamura , Hideki Shimizu , Ikuo Suzuki , Daiki Goshima , Yoshihiro Matsui , Tadayoshi Samura , Ryoichi Uda , Takahiro Takizuka
IPC分类号： H05B3702
CPC分类号： H05B41/2851
摘要： An abnormality detection circuit detects abnormality relating to ground fault in secondary winding circuitry of transformer, non-grounding fault of transformer assembly casing or false connection of the AC power source to the transformer assembly in reverse polarity. An interrupter circuit turns a switch off in response to detection of the abnormality by the abnormality detection circuit to interrupt the supply of the AC power to the transformer. When the supply of the AC power is interrupted, the switch is connected to a restart circuit, whereupon the circuit is activated to allow a charging current to flow to a capacitor, which is connected in series in a drive current path of a drive circuit with a time delay on the order of 0.5 to 1.0 second which is determined by a delay circuit thereof. The charging current drives a restoring circuit, which controls the interrupter circuit to its restoring condition temporally so that the switch is turned to its “on” condition only once.
摘要翻译： 异常检测电路检测变压器次级绕组电路中的接地故障，变压器总成壳体的非接地故障或交流电源与变压器组件的极性相反的异常。 断续电路响应于异常检测电路的异常检测而断开，以中断向变压器供电的交流电。 当交流电源的供应中断时，开关连接到重启电路，由此电路被激活以允许充电电流流向电容器，电容器串联连接在驱动电路的驱动电流路径中， 由延迟电路确定的0.5至1.0秒的时间延迟。 充电电流驱动恢复电路，其将断续器电路在时间上控制到其恢复状态，使得开关仅转换到其“接通”状态一次。
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16.发明授权Method of grinding a workpiece having a cylindrical portion and shoulder portions 失效研磨具有圆筒部和台肩部的工件的方法
公开(公告)号：US4603514A
公开(公告)日：1986-08-05
申请号：US697441
申请日：1985-02-01
申请人： Ikuo Suzuki , Yukio Oda
发明人： Ikuo Suzuki , Yukio Oda
摘要： A method for grinding a work having a cylindrical portion and a couple of shoulder portions extending at right angles from the opposite ends of the cylindrical portion, the method comprising the steps of:(a) rotating the work about the axis of the cylindrical portion;(b) rotating a cylindrical grinding wheel with a width smaller than the space between the shoulder portions of the work about an axis parallel with the axis of the cylindrical portion;(c) feeding the grinding wheel relative to the work along an oblique path inclined to one direction with respect to the rotational axis of the grinding wheel, thereby simultaneously grinding one of the shoulders and a contiguous cylindrical portion; and(d) feeding the grinding wheel relative to the work along an oblique parth inclined to the other direction with respect to the rotational axis of the grinding wheel, thereby simultaneously grinding the other one of the shoulders and the remainder of the cylindrical portion.
摘要翻译： 一种用于研磨具有圆柱形部分和从圆柱形部分的相对端部以直角延伸的一对肩部的工件的方法，所述方法包括以下步骤：（a）使所述工件绕所述圆柱形部分的轴线旋转; （b）旋转一个圆柱形磨轮，该圆柱形磨轮的宽度小于作业的肩部之间的空间，该平行于与圆柱形部分的轴线平行的轴线; （c）沿着相对于砂轮的旋转轴线倾斜到一个方向的倾斜路径相对于工件进给砂轮，从而同时研磨一个肩部和连续的圆柱形部分; 以及（d）相对于砂轮的旋转轴线沿相对于另一方向倾斜的倾斜部分相对于工件进给砂轮，从而同时研磨另一个肩部和圆柱部分的其余部分。
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公开(公告)号：US4446657A
公开(公告)日：1984-05-08
申请号：US271997
申请日：1981-06-09
申请人： Toshio Asaeda , Ikuo Suzuki , Tomoyasu Imai , Masato Kitajima
发明人： Toshio Asaeda , Ikuo Suzuki , Tomoyasu Imai , Masato Kitajima
摘要： A resinoid-bonded grinding wheel employing hard abrasives such as cubic boron nitride or diamond is formed with a support member made of a vitrified grinding wheel. The support member has sealing layers on the surfaces thereof for avoiding the penetration of coolant into the support member. A method for forming the wheel includes mounting a grinding element on a radial peripheral surface portion of the support member and applying a sealing layer to the remaining surface portions of the grinding element for preventing penetration of the coolant into the support member and generation of vibrations in the grinding wheel during operation due to rotational imbalance caused by the presence of coolant within the support member.
摘要翻译： 使用硬质研磨剂如立方氮化硼或金刚石的树脂粘合砂轮与由陶瓷砂轮制成的支撑构件形成。 支撑构件在其表面上具有密封层，以避免冷却剂渗透到支撑构件中。 用于形成车轮的方法包括将研磨元件安装在支撑构件的径向周向表面部分上，并且将密封层施加到研磨元件的其余表面部分，以防止冷却剂渗透到支撑构件中并产生振动 在由于在支撑构件内存在冷却剂而引起的旋转不平衡的操作期间的砂轮。
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18.发明授权Manufacturing process for a metal bonded grinding tool and the metal bonded grinding tool produced thereby 失效金属粘合研磨工具的制造工艺和由此生产的金属粘合研磨工具
公开(公告)号：US3973925A
公开(公告)日：1976-08-10
申请号：US453061
申请日：1974-03-20
申请人： Toshio Asaeda , Ikuo Suzuki , Tomoyasu Imai
发明人： Toshio Asaeda , Ikuo Suzuki , Tomoyasu Imai
CPC分类号： B24D18/0027 , B24D7/00
摘要： A manufacturing process for a metal bonded grinding tool includes the steps of; (a) preparing a rim of porous material, (b) press-forming the abrasive grains in contact with the rim to a specified structural dimension, and (c) forcibly passing a chemical plating liquid through a contacting body of the abrasive grains and the rim obtained in step (b) for continuously making the metal precipitate on the surfaces of the abrasive grains and in the pores of the rim so as to uniformly and continuously bond therebetween in any grinding tool of desired dimension.
摘要翻译： 金属结合研磨工具的制造方法包括以下步骤： （a）制备多孔材料的边缘，（b）将与边缘接触的磨粒压制成特定的结构尺寸，和（c）强制地将化学镀液通过磨粒的接触体和 在步骤（b）中获得的用于连续地使金属沉淀在磨粒的表面和轮缘的孔中的边缘，以便在任何所需尺寸的研磨工具中均匀且连续地结合。
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公开(公告)号：US08613976B2
公开(公告)日：2013-12-24
申请号：US13547876
申请日：2012-07-12
IPC分类号： C23C16/40 , C23C16/455
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02219 , H01L21/02222 , H01L21/0228 , H01L21/31612
摘要： A method of forming a silicon oxide film, comprising the steps of: providing a substrate into a reaction chamber; injecting into the reaction chamber at least one silicon containing compound where the at least one silicon containing compound is bis(diethylamino)silane; injecting Oxygen into the reaction chamber and at least one other O-containing gas selected from ozone and water; reacting in the reaction chamber by chemical vapor deposition at a temperature below 400 C the at least one silicon containing compound and the at least one oxygen containing gas in order to obtain the silicon oxide film deposited onto the substrate.
摘要翻译： 一种形成氧化硅膜的方法，包括以下步骤：将基底提供到反应室中; 向所述反应室中注入至少一种含硅化合物，其中所述至少一种含硅化合物是双（二乙基氨基）硅烷; 将氧气注入反应室和至少一种其它选自臭氧和水的含O气体; 在反应室内通过化学气相沉积在低于400℃的温度下使至少一种含硅化合物和至少一种含氧气体反应，以获得沉积在基底上的氧化硅膜。
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公开(公告)号：US20120276292A1
公开(公告)日：2012-11-01
申请号：US13547876
申请日：2012-07-12
IPC分类号： C23C16/40
CPC分类号： H01L21/02164 , C23C16/402 , H01L21/02219 , H01L21/02222 , H01L21/0228 , H01L21/31612
摘要： A method of forming a silicon oxide film, comprising the steps of: providing a substrate into a reaction chamber; injecting into the reaction chamber at least one silicon containing compound where the at least one silicon containing compound is bis(diethylamino)silane; injecting Oxygen into the reaction chamber and at least one other O-containing gas selected from ozone and water; reacting in the reaction chamber by chemical vapor deposition at a temperature below 400 C the at least one silicon containing compound and the at least one oxygen containing gas in order to obtain the silicon oxide film deposited onto the substrate.
摘要翻译： 一种形成氧化硅膜的方法，包括以下步骤：将基底提供到反应室中; 向所述反应室中注入至少一种含硅化合物，其中所述至少一种含硅化合物是双（二乙基氨基）硅烷; 将氧气注入反应室和至少一种其它选自臭氧和水的含O气体; 在反应室内通过化学气相沉积在低于400℃的温度下使至少一种含硅化合物和至少一种含氧气体反应，以获得沉积在基底上的氧化硅膜。
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