公开(公告)号：US5112467A

公开(公告)日：1992-05-12

申请号：US656235

申请日：1991-02-15

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/34 ,  H01J37/34

CPC分类号： H01J37/3435 ,  C23C14/3407

摘要： A cathode sputtering apparatus provided with a quick disconnect mechanism for rapid replacement of a target. The quick disconnect mechanism preferably includes a rotatable sleeve that upon appropriate rotation exerts a clamping force on the target. The clamping force preferably is created by balls caused to cam radially outward from a central axis.

摘要翻译： 一种具有用于快速更换靶的快速断开机构的阴极溅射装置。 快速断开机构优选地包括可旋转的套筒，其在适当的旋转时对目标施加夹紧力。 夹紧力优选地由从中心轴径向向外凸轮的球产生。

公开(公告)号：US4943363A

公开(公告)日：1990-07-24

申请号：US377132

申请日：1989-07-10

申请人： Jaroslav Zejda ,  Manfred Schuhmacher

发明人： Jaroslav Zejda ,  Manfred Schuhmacher

IPC分类号： C23C14/34 ,  B65G49/07 ,  C23C14/56 ,  H01L21/683

CPC分类号： C23C14/56 ,  H01L21/6835

摘要： A cathode sputtering system for coating substrates in a vacuum chamber in which a rotating substrate carrier is accommodated and comprises at least one conveyor spoon. The conveyor spoon comprises a substrate receptacle member and an arm attached between the receptacle member and a rotating disk. The arm preferably comprises two leaf springs arranged parallel to one another. During the sputtering process, a pressure plate presses the substrate receptacle member and the substrate against a mask that is part of the cathode station. As a result, a cathode vacuum space is formed that is isolated from the vacuum space of the system.

摘要翻译： 一种阴极溅射系统，用于在其中容纳转动的基底载体的真空室中涂覆基底，并且包括至少一个输送勺子。 输送勺子包括基座容器构件和安装在容器构件和旋转盘之间的臂。 臂优选地包括彼此平行布置的两个板簧。 在溅射过程中，压板将衬底插座构件和衬底压在作为阴极站的一部分的掩模上。 结果，形成了与系统的真空空间隔离的阴极真空空间。

公开(公告)号：US5913652A

公开(公告)日：1999-06-22

申请号：US936715

申请日：1997-09-24

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： B65G47/80 ,  B65G29/00 ,  B65G49/07 ,  G11B7/26 ,  G11B23/00 ,  H01L21/677 ,  B65H5/12

CPC分类号： B65G29/00 ,  G11B7/265 ,  H01L21/67745 ,  G11B23/0057 ,  Y10S414/139

摘要： The invention relates to a turntable 12, which is driven at a constant timing frequency, which depends on the duration of the longest working time at a process station. The substrate 2 can be delivered by means of the pivoted substrate gripper 13 to one or several process stations or satellite process stations 4 and/or an outlet station 3 or a depositing station 29 or 14 provided outside of the turntable 12.

摘要翻译： 本发明涉及一转台12，其以恒定的定时频率驱动，转台12取决于处理站的最长工作时间的持续时间。 基板2可以通过枢转的基板夹持器13传送到设置在转盘12外部的一个或多个处理站或卫星处理站4和/或出口站3或沉积站29或14。

公开(公告)号：US5822842A

公开(公告)日：1998-10-20

申请号：US541594

申请日：1995-10-10

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/24 ,  C23C14/04 ,  B23P11/02

CPC分类号： C23C14/042 ,  Y10T29/4987

摘要： In a mask (7) for covering the outer marginal area of a disk-shaped substrate surface during a coating process, for example a vacuum sputtering or vapor depositing process, the mask (7) is made of an elastic material in the form of a planar plate with an essentially circular opening. To center and lock it onto the substrate (1) an inwardly extending annular flange is provided which assumes the actual masking function and extends in a plane parallel to the plane of the plate. The substrate (1) is laid on this flange and retained by projections extending radially inward. Prior to positioning the substrate it is bowed axially to spread apart the projections.

摘要翻译： 在用于在涂覆工艺（例如真空溅射或气相沉积工艺）中覆盖盘形基底表面的外部边缘区域的掩模（7）中，掩模（7）由弹性材料制成，形式为 具有基本圆形开口的平板。 为了使其中心并将其锁定到基板（1）上，提供向内延伸的环形凸缘，其呈现实际的遮蔽功能并且在平行于板的平面的平面中延伸。 衬底（1）被放置在该凸缘上并由径向向内延伸的突起保持。 在定位基板之前，它被轴向弯曲以将突起分开。

公开(公告)号：US5290417A

公开(公告)日：1994-03-01

申请号：US862224

申请日：1992-04-02

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/50 ,  C23C14/56 ,  C23C14/34

CPC分类号： C23C14/505 ,  C23C14/568

摘要： A coating machine (1) has a carousel (5) with location seats (18, 19) for substrates (3) that are to be coated. Process chambers (8) are located in a circle coaxially to the carousel (5) outside of the carousel (5). All substrates (3) located in the process chambers (8) can be removed at the same time from the process chambers (8) and put down on the carousel (5) by means of substrate transfer devices (9). After turning the carousel (5) slightly, new substrates (3) can be transported simultaneously into the process chambers (8).

摘要翻译： 涂布机（1）具有带有待涂覆的基板（3）的位置座（18,19）的转盘（5）。 处理室（8）位于圆盘传送带（5）外面与转盘（5）同轴的圆中。 位于处理室（8）中的所有基板（3）可以从处理室（8）同时移除，并通过基板传送装置（9）放在转盘（5）上。 稍微转动转盘（5）后，新的基板（3）可以同时输送到处理室（8）中。

公开(公告)号：US5205919A

公开(公告)日：1993-04-27

申请号：US731857

申请日：1991-06-20

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/34 ,  C23C14/50 ,  C23C14/56 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  C23C14/50 ,  C23C14/568 ,  H01J37/34 ,  H01L21/67017 ,  H01L21/68707 ,  H01L21/68764 ,  H01L21/68771 ,  H01J2237/20

摘要： A cathode sputtering apparatus for the coating of substrates in a vacuum chamber is presented which accommodates a rotating substrate carrier, and which comprises at least one gripper which includes a hub and at least one arm with a gripper with the hub rotating around a horizontal axis; during the sputtering, two annular closing elements separate a segment in front of the station from the remaining portion of the vacuum chamber and a cathode vacuum chamber is thus formed which is separate from the vacuum chamber of the apparatus.

摘要翻译： 提供一种用于在真空室中涂覆基板的阴极溅射装置，其容纳旋转的基板载体，并且其包括至少一个夹持器，该夹持器包括轮毂和至少一个具有夹持器的臂，轮毂围绕水平轴旋转; 在溅射期间，两个环形闭合元件将工作站前面的部分与真空室的剩余部分分开，并且因此形成与设备的真空室分离的阴极真空室。

公开(公告)号：US4984531A

公开(公告)日：1991-01-15

申请号：US419706

申请日：1989-10-11

申请人： Jaroslav Zejda ,  Manfred Schuhmacher

发明人： Jaroslav Zejda ,  Manfred Schuhmacher

IPC分类号： C23C14/50 ,  C23C14/56 ,  H01L21/683

CPC分类号： H01L21/6838 ,  C23C14/50

摘要： A vacuum coating device having a workpiece carrier rotatably positioned within the process chamber including a device for positioning and releasably securing the workpiece on the carrier comprising a crank-lever mechanism positioned at a transfer station and a clamping mechanism positioned on the carrier. The crank lever mechanism operatively engages the clamping mechanism to release or secure a workpiece on the carrier.

摘要翻译： 一种真空涂覆装置，其具有可旋转地定位在处理室内的工件载体，包括用于将工件定位和可释放地固定在载体上的装置，该装置包括位于传送站处的曲柄杆机构和位于载体上的夹紧机构。 曲柄杆机构可操作地接合夹紧机构以将工件释放或固定在载体上。

公开(公告)号：US4938858A

公开(公告)日：1990-07-03

申请号：US386975

申请日：1989-07-31

申请人： Jaroslav Zejda

发明人： Jaroslav Zejda

IPC分类号： C23C14/34 ,  C23C14/35 ,  C23C14/56

CPC分类号： C23C14/56 ,  C23C14/352

摘要： A cathode sputtering system comprising an annularly-shaped process chamber and a correspondingly annularly-shaped substrate carrier accommodated therein. The chamber and carrier are positioned vertically. A cathode station and a loading and unloading station are positioned on vertical walls of the chamber.

摘要翻译： 一种阴极溅射系统，包括环形的处理室和容纳在其中的相应的环形衬底载体。 腔室和载体垂直定位。 阴极站和装卸站位于室的垂直壁上。

公开(公告)号：US4820106A

公开(公告)日：1989-04-11

申请号：US92171

申请日：1987-09-02

申请人： Michael Walde ,  Jaroslav Zejda

发明人： Michael Walde ,  Jaroslav Zejda

IPC分类号： C23C14/56 ,  B65G49/07 ,  H01L21/00 ,  C23C14/22

CPC分类号： H01L21/6715 ,  Y10S414/139

摘要： In an apparatus for passing a discoidal workpiece into and out of a coating chamber through a lock and for shifting the workpiece into and out of the range of a coating source, a swivelling arm is journaled for movement about a vertical axis on the top of the coating chamber. The ends of the swiveling arm have jacks bearing workpiece holding plates which transport the workpiece to an opening in the coating chamber. The workpiece holders are adapted to close off the opening from above. A turntable which can swivel about a vertical axis in the interior of the coating chamber has recesses on its top side for accommodating the workpieces. Lifting plates are journaled in these recesses and can be raised and lowered by lifting means in the bottom plate. The lifting plates are constructed such that, with the turntable in a first position, they pick up the workpieces in the area of the opening and at the same time close off the bottom of the opening, and in a second position they raise the workpieces into the range of action of a cathode.

摘要翻译： 在用于通过锁将片状工件通入和移出涂覆室的装置中，并且用于将工件移入和移出涂覆源的范围的装置中，旋转臂被轴颈围绕在顶部的垂直轴线上运动 涂层室。 旋转臂的端部具有承载工件保持板的千斤顶，其将工件运送到涂覆室中的开口。 工件保持器适于从上方关闭开口。 可以在涂覆室的内部围绕垂直轴线旋转的转盘在其顶侧上具有用于容纳工件的凹部。 提升板安装在这些凹槽中，并可通过底板中的提升装置升高和降低。 提升板构造成使得在转盘处于第一位置时，它们在开口区域中拾取工件，同时将开关的底部关闭，并且在第二位置，它们将工件升高成 阴极的作用范围。