公开(公告)号：US12080511B2

公开(公告)日：2024-09-03

申请号：US17754069

申请日：2019-09-25

申请人： Hitachi High-Tech Corporation

发明人： Megumi Nakamura ,  Hisayuki Takasu ,  Kento Horinouchi

IPC分类号： H01J37/20 ,  H01J37/09

CPC分类号： H01J37/20 ,  H01J37/09 ,  H01J2237/026 ,  H01J2237/20

摘要： A performance of a sample holder 1 used in a charged particle beam device is improved. A shield plate 2 is connected to a sample stand 7. A sample stand 7 is provided with a pressing member 5 that can move in a direction perpendicular to the shield plate 2 in a state in which the pressing member is attached to the sample stand 7, and has a bar shape. A sample supporting member 4 connected to the pressing member 5 is provided at a position facing the shield plate 2. A spring 6 is provided along an outer circumference of the pressing member 5 and is connected to the sample supporting member 4 and the sample stand 7.

公开(公告)号：US11674226B2

公开(公告)日：2023-06-13

申请号：US16803313

申请日：2020-02-27

申请人： Lam Research Corporation

发明人： Fayaz Shaikh ,  Taide Tan

IPC分类号： C23C16/455 ,  H01J37/32 ,  C23C16/458 ,  C23C16/509

CPC分类号： C23C16/45565 ,  C23C16/4585 ,  C23C16/5096 ,  H01J37/32082 ,  H01J37/32623 ,  H01J37/32642 ,  H01J37/32715 ,  H01J2237/20 ,  H01J2237/332

摘要： A chamber for use in implementing a deposition process includes a pedestal for supporting a semiconductor wafer. A silicon ring is disposed over the pedestal and surrounds the semiconductor wafer. The silicon ring has a ring thickness that approximates a semiconductor wafer thickness. The silicon ring has an annular width that extends a process zone defined over the semiconductor wafer to an extended process zone that is defined over the semiconductor wafer and the silicon ring. A confinement ring defined from a dielectric material is disposed over the pedestal and surrounds the silicon ring. A showerhead having a central showerhead area and an extended showerhead area is also included. The central showerhead area is substantially disposed over the semiconductor wafer and the silicon ring. The extended showerhead area is substantially disposed over the confinement ring. The annular width of the silicon ring enlarges a surface area of the semiconductor wafer that is exposed and shifts non-uniformity effects of deposition materials over the semiconductor wafer from an edge of the semiconductor wafer to an outer edge of the silicon ring.

公开(公告)号：US20180330911A1

公开(公告)日：2018-11-15

申请号：US16036663

申请日：2018-07-16

申请人： Frederick A. Flitsch

发明人： Frederick A. Flitsch

IPC分类号： H01J37/06 ,  H01J37/317 ,  H01J37/20 ,  H01J37/08 ,  H01J37/244 ,  H01J9/02

CPC分类号： H01J37/06 ,  G03F7/0002 ,  G03F9/00 ,  H01J9/022 ,  H01J37/08 ,  H01J37/20 ,  H01J37/244 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

摘要： The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

公开(公告)号：US09952128B2

公开(公告)日：2018-04-24

申请号：US15285070

申请日：2016-10-04

申请人： The Scripps Research Institute

发明人： Bridget Carragher ,  Clinton S. Potter ,  Tilak Jain

IPC分类号： G01N1/28 ,  G01N1/30 ,  G01N1/31 ,  H01J37/20 ,  H01J37/26

CPC分类号： G01N1/28 ,  G01N1/30 ,  G01N1/31 ,  G01N1/312 ,  H01J37/20 ,  H01J37/261 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/2602

摘要： The invention provides systems or apparatuses for dispensing aqueous materials for electron microscopy (EM). The systems allow dispensing of aqueous materials onto an EM sample grid at individual specimen locations in an ordered array of specimen locations, with each individual specimen location in the array of locations. The systems contain a holder for reversibly receiving an EM sample grid, and a dispenser containing one or more dispensing elements that are configured to discretely dispense one or more aqueous solutions from the dispensing elements onto a plurality of individual specimen locations. The dispenser is able to provide an ordered array of discrete specimen locations discontinuous with one another. In the systems, at least one dispensing element is configured to dispense picoliter volumes of one or more of the aqueous solutions. Additionally, the systems contain a drive mechanism to position the EM sample grid relative to the one or more dispensing elements, as well as one or more reservoirs operably linked to the dispenser for holding the one or more aqueous solutions to be discretely dispensed onto each individual specimen location in the array of locations.

公开(公告)号：US20170200627A1

公开(公告)日：2017-07-13

申请号：US14995088

申请日：2016-01-13

申请人： Applied Materials Israel, Ltd.

发明人： Tuvia Biber ,  Efim Kerner ,  Efraim Siman Tov

IPC分类号： H01L21/683 ,  H01L21/66 ,  H01L21/326

CPC分类号： H01L21/6833 ,  H01J2237/0044 ,  H01J2237/20 ,  H01L21/326 ,  H01L21/67288 ,  H01L21/6831 ,  H01L22/14 ,  H01L22/26 ,  H05F3/00

摘要： A system for zapping a wafer, the system includes a pulse generator; a sensor; a first conductive interface; a second conductive interface; a controller; wherein the pulse generator is configured to generate zapping pulses; wherein the first conductive interface is configured to provide the zapping pulses to a first location of a backside insulating layer of a wafer; wherein the sensor is configured to monitor a coupling between the first conductive interface and the second conductive interface to provide a monitoring result; wherein the monitoring occurs while the second conductive interface contacts a second location of the backside insulating layer; and wherein the controller is configured to control a generation of the zapping pulses in response to the monitoring result.

公开(公告)号：US09318332B2

公开(公告)日：2016-04-19

申请号：US14135519

申请日：2013-12-19

申请人： Intevac, Inc.

发明人： Vinay Prabhakar ,  Babak Adibi

IPC分类号： H01L21/425 ,  C23C16/00 ,  H01L21/266 ,  H01L31/068 ,  H01L31/18 ,  H01L21/426 ,  H01J37/32

CPC分类号： H01L31/0516 ,  H01J37/32412 ,  H01J37/32422 ,  H01J37/32623 ,  H01J2237/20 ,  H01J2237/3365 ,  H01L21/266 ,  H01L21/426 ,  H01L31/0682 ,  H01L31/1804 ,  H01L31/188 ,  Y02E10/50 ,  Y02E10/547 ,  Y02P70/521

摘要： A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.

摘要翻译： 用于最小化离子发散在等离子体离子注入中的网格。 等离子体格栅由具有多个孔的平板制成，其中孔布置成多行和多个列，从而形成沿一个方向发散的离子束。 掩模用于在晶片上形成植入的形状，其中掩模中的孔与子束发散的方向垂直。

公开(公告)号：US20150340193A1

公开(公告)日：2015-11-26

申请号：US14813768

申请日：2015-07-30

申请人： EBARA CORPORATION

发明人： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO ,  Takeshi MURAKAMI ,  Masahiro HATAKEYAMA ,  Tsutomu KARIMATA

IPC分类号： H01J37/02 ,  H01J37/20 ,  H01J37/285

CPC分类号： H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

摘要翻译： 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20150243470A1

公开(公告)日：2015-08-27

申请号：US14186678

申请日：2014-02-21

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Roger B. Fish ,  Steven Anella ,  Todd Lewis MacEachern

IPC分类号： H01J37/20 ,  H01J37/317

CPC分类号： H01J37/20 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2001 ,  H01J2237/31701 ,  H01L21/6833

摘要： A platen support structure adapted to thermally insulate a heated platen portion from a cold base plate while providing substantially leak-free gas transport therebetween and while allowing thermal expansion and contraction of the platen portion. Various examples provide of the support structure provide a tubular flexure having an internal gas conduit, a platen portion mounting tab connected to the flexure and having an internal gas input slot that is in fluid communication with the internal gas conduit of the flexure, the platen portion mounting tab being adapted for connection to a platen portion of a platen, and a base plate mounting tab connected to the flexure and having an internal gas output slot that is in fluid communication with the internal gas conduit of the flexure, the base plate mounting tab being adapted for connection to a base plate of the platen.

摘要翻译： 压板支撑结构，其适于将加热的压板部分与冷底板热绝缘，同时在其间提供基本上无泄漏的气体输送，同时允许压板部分的热膨胀和收缩。 支撑结构的各种示例提供了具有内部气体导管的管状挠曲件，连接到挠曲件的压板部分安装凸片，并且具有与挠曲件的内部气体导管流体连通的内部气体输入槽，压板部分 安装翼片适于连接到台板的压板部分，以及底板安装翼片，其连接到弯曲部并具有与挠曲件的内部气体导管流体连通的内部气体输出槽，底板安装翼片 适于连接到压板的基板。

公开(公告)号：US20150136977A1

公开(公告)日：2015-05-21

申请号：US14526971

申请日：2014-10-29

申请人： FEI Company

发明人： Alexander Buxbaum

IPC分类号： H01J37/304 ,  H01J37/305 ,  G01N1/44 ,  H01J37/26 ,  G01N1/32

CPC分类号： H01J37/222 ,  G01N1/286 ,  G01N1/32 ,  G01N1/44 ,  H01J37/261 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/08 ,  H01J2237/20 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/262 ,  H01J2237/30466 ,  H01J2237/31745

摘要： A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices.

摘要翻译： 一种在涉及TEM样品的应用中使用差分成像的方法，允许操作者在涉及聚焦离子束过程的过程中拍摄多个图像，并覆盖多个图像以产生清晰地显示铣削步骤之间的差异的差分图像。 该方法还涉及生成正在研磨的区域的实时图像并使用差分图像的叠加来显示每个图像中的小变化，并且因此突出显示离子束研磨位置。 这些方法还涉及自动化创建差分图像的过程，并使用它们来自动研磨随后的切片。

公开(公告)号：US20150021495A1

公开(公告)日：2015-01-22

申请号：US14326997

申请日：2014-07-09

申请人： NuFlare Technology, Inc

发明人： Hiroyasu SAITO ,  Yoshinori NAKAGAWA ,  Seiichi NAKAZAWA

IPC分类号： H01J37/20 ,  H01J37/317

CPC分类号： H01J37/3174 ,  H01J37/16 ,  H01J2237/20

摘要： A charged particle beam drawing apparatus includes: a stage configured to support a specimen as a drawing target; and an airtight drawing chamber formed into a box shape provided with a side wall and a bottom plate, and configured to house the stage. The bottom plate includes: multiple support portions connected to the side wall and configured to support the stage; and a curved portion connected to the support portions and having a convex shape curved outward.

摘要翻译： 带电粒子束描绘装置包括：被配置为支撑作为绘图目标的样本的平台; 以及形成为具有侧壁和底板的箱形的气密拉拔室，并且构造成容纳所述台。 底板包括：多个支撑部分，其连接到侧壁并且被配置为支撑台架; 以及与支撑部连接并具有向外弯曲的凸形的弯曲部。