Chemically resistant polythioethers and formation thereof
    11.
    发明授权
    Chemically resistant polythioethers and formation thereof 有权
    耐化学性硫醚及其形成

    公开(公告)号:US06723827B2

    公开(公告)日:2004-04-20

    申请号:US10368135

    申请日:2003-02-20

    IPC分类号: C08G7502

    摘要: A polythioether comprising: wherein R1 is a C1-10 alkyl, —(R3Q)pR3— or C6-C20 aryl where Q is O or S, each R3 is independently C1-6 alkyl, and p is an integer between 0 and 6; R2 is C1-6 alkyloxy or C5-12 cycloalkyloxy, R4 is H, C1-6 alkyl, C1-6 alkyl alcohol and C0-6 alkyl substituted with where X is a halogen, m is an integer between 1 and 4, and n is an integer selected to yield a molecular weight for said polythioether of between 1000 and 10,000 Daltons.

    摘要翻译: 一种聚硫醚,其包含:其中R 1为C 1-10烷基, - (R 3 Q)p R 3 - 或C 6 -C 20芳基,其中Q为O或S,每个R 3独立地为C1- 6烷基,p是0和6之间的整数; R 2是C 1-6烷氧基或C 5-12环烷氧基,R 4是H,C 1-6烷基,C 1-6烷基醇,C 0-6烷基被取代,其中X是卤素,m是1 和4,并且n是选择以产生1000至10,000道尔顿之间的所述聚硫醚的分子量的整数。

    Chemically resistant polythiothers and formation thereof
    14.
    发明授权
    Chemically resistant polythiothers and formation thereof 有权
    化学抗性多硫化物及其形成

    公开(公告)号:US06525168B2

    公开(公告)日:2003-02-25

    申请号:US09802427

    申请日:2001-03-09

    IPC分类号: C08G7502

    摘要: A polythioether comprising: R4—S&Brketopenst;R1—S—CH2CH2—(R2)m—S&Brketclosest;nR1SR4 wherein R1 is a C1-10 alkyl, —(R3Q)pR3— or C6-C20 aryl where Q is O or S, each R3 is independently C1-6 alkyl, and p is an integer between 0 and 6; R2 is C1-6 alkyloxy or C5-12 cycloalkyloxy, R4 is H, C1-6 alkyl, C1-6 alkyl alcohol and C0-6 alkyl substituted with &Brketopenst;CH2CH2(R2)m&Brketclosest;X, where X is a halogen, m is an integer between 1 and 4, and n is an integer selected to yield a molecular weight for said polythioether of between 1000 and 10,000 Daltons.

    摘要翻译: 一种聚硫醚,其包括:其中R 1是C 1-10烷基, - (R 3 Q)pR 3 - 或C 6 -C 20芳基,其中Q是O或S,每个R 3独立地是C 1-6烷基,p是0和6之间的整数; R2是C1-6烷氧基或C5-12环烷氧基,R4是H,C1-6烷基,C1-6烷基醇和被& Brketopenst取代的C0-6烷基; CH2CH2(R2)m&Brketclosest; X,其中X是卤素,m 是1和4之间的整数,n是选择以产生1000至10,000道尔顿之间的所述聚硫醚的分子量的整数。