摘要:
A chromene compound of this invention, as shown in the following formula: characterized by having an indeno(2,1-f)naphtho(1,2-b)pyran structure as a basic structure, and having a substituent which is a substituted or unsubstituted aryl group such as methoxyphenyl group, or a substituted or unsubsterituted heteroaryl group such as thienyl group bonding to a carbon atom at the seventh position of the indeno(2,1-f)naphtho(1,2-b)pyran structure. The photochromic compound exhibits a color tone of a neutral tint when it develops a color, features a high color-developing sensitivity and a high fading rate, and has a good photochromic resistance.
摘要:
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl propionate, n-butyl acetate and 2-heptanone. It can be developed by tetra-methyl ammonium hydroxide in addition to the above mentioned solvent. By exposing this resist by electronic ray, high resolution of 8 nm is attained, and by using this resist as a mask, various materials can be formed into a hyperfine shape. According to such kind of resist, a photosensitive resist material which has high resolution and solvable to solvents having less effect to worsen the working environment and can be developed by the solvents, a exposure method using it, and a hyperfine processing method using it are provided.
摘要:
A laminated product has a multilayer structure comprising an optical base and a cured polyurethane resin layer formed thereon from a moisture-curable polyurethane resin and/or a precursor therefor. The polyurethane resin layer is formed by applying a coating fluid comprising a moisture-curable polyurethane resin and/or precursor therefor and a solvent having a boiling point of 70° C. or higher and a solubility parameter of 8 or larger. Also provided is a coating material comprising a radical-polymerizable monomer ingredient, a silicone or fluorochemical surfactant, and a photochromic compound. In producing a photochromic optical article, excellent adhesion between a base and a photochromic layer is attained.
摘要:
A polymerization curable composition comprising a specific polyfunctional polymerizable monomer having a hard molecular structure with an L-scale Rockwell hardness of its homopolymer of 60 or more, a specific polyfunctional polymerizable monomer and a photochromic compound, a photochromic lens substrate composed of a cured product of the polymerization curable composition, and a lens comprising the photochromic lens substrate. The substrate and lens show excellent photochromic properties such as high color development density and high fading rate, and the cured product has excellent substrate properties such as hardness, heat resistance and impact resistance as well as strength (toughness) that allows for its use in rimless spectacles.
摘要:
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl propionate, n-butyl acetate and 2-heptanone. It can be developed by tetra-methyl ammonium hydroxide in addition to the above mentioned solvent. By exposing this resist by electronic ray, high resolution of 8 nm is attained, and by using this resist as a mask, various materials can be formed into a hyperfine shape. According to such kind of resist, a photosensitive resist material which has high resolution and solvable to solvents having less effect to worsen the working environment and can be developed by the solvents, a exposure method using it, and a hyperfine processing method using it are provided.
摘要:
A photochromic polymerizable composition comprising (a) a polyfunctional (meth)acrylate monomer, (b) at least one kind of chromene compound selected from the group consisting of three kinds of chromene compounds represented by particular structural formulas, and (c) a compound having at least one or more epoxy groups in the molecules. The photochromic polymerizable composition offers a photochromic material that exhibits little initial color and excellent photochromism resistance suited for use as lenses for spectacles.
摘要:
Spiropyrone compounds represented by the general formula ##STR1## wherein ##STR2## is a substituted or an unsubstituted aromatic hydrocarbon group or a substituted or an unsubstituted unsaturated heterocyclic group, and ##STR3## is a substituted or an unsubstituted 2-bicyclo�3,3,1!9-nonenylidene group, that are starting materials of spiropyran compounds which change from a colorless state into a colored or a densely colored state upon irradiation with the light containing ultraviolet rays such as the sunlight or the light of a mercury lamp, the change being reversible, and a process for preparing the spiropyrone compounds. The process comprises reacting a compound represented by the general formula ##STR4## wherein ##STR5## is as defined above, with a compound of the general formula ##STR6## wherein ##STR7## is as defined above.
摘要:
A curable composition which provides a coating layer having high adhesion to a substrate and a hard coat layer and extremely excellent photochromic properties such as high color development intensity, high fading speed and excellent durability. This composition comprises (1) 100 parts by weight of radically polymerizable monomers including a silyl monomer such as γ-methacryloyloxypropyl trimethoxysilane and/or an isocyanate monomer such as 2-isocyanatoethoxy methacrylate, (2) 0.01 to 20 parts by weight of an amine compound and (3) 0.01 to 20 parts by weight of a photochromic compound. A photochromic optical material having excellent adhesion between a photochromic coating layer and a resin substrate and obtained by using this composition as a coating material and a process for producing the photochromic optical material.
摘要:
A process of producing a urethane (meth)acrylate monomer having a low acid value and a low content of a hardly soluble high-molecular weight impurity which is crosslinked high-dimensionally, comprising the steps of: (1) contacting a first solution containing a urethane (meth)acrylate monomer having an acid value of more than 0.2 mgKOH/g and an organic solvent to a water-containing adsorbent capable of adsorbing an acid component to obtain a second solution containing a urethane (meth)acrylate monomer having an acid value of not more than 0.2 mgKOH/g, the organic solvent and more than 5,000 ppm (mass) of water based on the urethane (meth)acrylate monomer; (2) contacting the second solution to a dehydrating agent to obtain a third solution containing not more than 5,000 ppm (mass) of water based on the urethane (meth)acrylate monomer; and (3) removing the organic solvent from the third solution.
摘要:
A photochromic curable composition that contains a (meth)acrylate compound represented by the following formula (1-X1); (wherein Y is an oxygen atom or a divalent group represented by —NH—, R1 and R2 are hydrogen atoms or methyl groups, R3 is an alkylene group having 1 to 6 carbon atoms, R4 is an alkylene group having 1 to 6 carbon atoms, a cycloalkylene group having 3 to 8 carbon atoms and which may include a double bond, or an arylene group having 6 to 10 carbon atoms, and a is a positive number of 1 to 20), other radically polymerizable monomers and a photochromic compound. The invention provides a lens that features excellent durability and high photochromic property free of the problems of turbidity in the surfaces of the lens caused by bleed out or the peeling in the step of production.