摘要:
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl propionate, n-butyl acetate and 2-heptanone. It can be developed by tetra-methyl ammonium hydroxide in addition to the above mentioned solvent. By exposing this resist by electronic ray, high resolution of 8 nm is attained, and by using this resist as a mask, various materials can be formed into a hyperfine shape. According to such kind of resist, a photosensitive resist material which has high resolution and solvable to solvents having less effect to worsen the working environment and can be developed by the solvents, a exposure method using it, and a hyperfine processing method using it are provided.
摘要:
The resist according to the present invention includes any one of tetrachloromethyl tetramethoxycalix [4] arene and trichloromethyl tetramethoxycalix [4] arene. The resist including such kind of components is soluble in the solvent having less effect to worsen a working environment, namely, ethyl lactate (EL), propylene glycol monomethyl ether (PGME), propylene glycol monomethyl ether acetate (PGMEA), ethyl propionate, n-butyl acetate and 2-heptanone. It can be developed by tetra-methyl ammonium hydroxide in addition to the above mentioned solvent. By exposing this resist by electronic ray, high resolution of 8 nm is attained, and by using this resist as a mask, various materials can be formed into a hyperfine shape. According to such kind of resist, a photosensitive resist material which has high resolution and solvable to solvents having less effect to worsen the working environment and can be developed by the solvents, a exposure method using it, and a hyperfine processing method using it are provided.
摘要:
A polymerization curable composition prepared by blending specific amounts of a photochromic compound and a specific light stabilizer such as bis(1,2,2,6,6-pentamethyl-4-piperidyl)sebacate with monomer components including a specific bifunctional monomer having a structure that two phenylene groups are bonded together by a specific group, such as 2,2-bis(4-methacryloyloxypolyethoxyphenyl)propane, a polyfunctional polymerizable monomer having a functionality of 3 or more such as trimethylolpropane trimethacrylate, and a monomer other than these in a specific ratio.The polymerization curable composition provides a cured product having excellent photochromic properties such as fast fading rate and sufficiently high drilling strength that allows for its use in rimless spectacles and has high long-term storage stability.
摘要:
A photochromic curable composition comprising 100 parts by mass of polymerizable monomers which include 70 to 100 mass % of polymerizable monomers having two to four (meth)acrylic groups and 0 to 30 mass % of a polymerizable monomer having one (meth)acrylic group and 0.01 to 20 parts by mass of a photochromic compound, wherein the number of moles of the methacrylic group existent in the polymerizable monomer composition is 3 to 7 times the number of moles of the acrylic group. This composition can provide a lens having a photochromic coating which exhibits excellent photochromic properties, comprises a hard coat layer having sufficiently high adhesion and scratch resistance and has no delay in fading and has excellent storage stability.
摘要:
A chromene compound which develops a color of a neutral tint and has little initial coloration, high double peak characteristic and high color development sensitivity, rarely experiences the reduction of color optical density though it has high fading speed, is excellent in the durability of photochromic properties and can dissolve in a monomer composition which will become a substrate for optical articles in a high concentration, and a photochromic curable composition comprising the chromene compound and polymerizable monomers.The chromene compound is represented by the following formula (1). (wherein R3 at the 11-position is a second sulfur-containing substituent selected from the group consisting of thiol group, alkylthio group, alkoxyalkylthio group, haloalkylthio group, cycloalkylthio group, arylthio group, heteroarylthio group, sulfonyl group and sulfinyl group, R1 and R2 at the 6-position and the 7-position are a combination of an aryl group or a heteroaryl group and an electron donating group having a Hammett constant σp of −0.1 or less, or R1 and/or R2 is a first sulfur-containing substituent selected from thiol group, alkylthio group, alkoxyalkylthio group, haloalkylthio group, cycloalkylthio group, arylthio group and heteroarylthio group.).
摘要:
A photochromic curable composition comprising 100 parts by mass of polymerizable monomers which include 70 to 100 mass % of polymerizable monomers having two to four (meth)acrylic groups and 0 to 30 mass % of a polymerizable monomer having one (meth)acrylic group and 0.01 to 20 parts by mass of a photochromic compound, wherein the number of moles of the methacrylic group existent in the polymerizable monomer composition is 3 to 7 times the number of moles of the acrylic group. This composition can provide a lens having a photochromic coating which exhibits excellent photochromic properties, comprises a hard coat layer having sufficiently high adhesion and scratch resistance and has no delay in fading and has excellent storage stability.
摘要:
A photochromic chromene compound which develops a color of a neutral tint, has high color optical density, a high fading speed and high durability, and has an indeno(2,1-f)naphtho(1,2-b)pyran structure represented by the following formula as the basic skeleton, wherein a sulfur-containing substituent selected from thiol group, alkylthio group, alkoxyalkylthio group, haloalkylthio group, cycloalkylthio group, arylthio group and heteroarylthio group is bonded to the 6-position and/or 7-position carbon atom(s).
摘要:
A chromene compound of this invention, as shown in the following formula: characterized by having an indeno(2,1-f)naphtho(1,2-b)pyran structure as a basic structure, and having a substituent which is a substituted or unsubstituted aryl group such as methoxyphenyl group, or a substituted or unsubsterituted heteroaryl group such as thienyl group bonding to a carbon atom at the seventh position of the indeno(2,1-f)naphtho(1,2-b)pyran structure. The photochromic compound exhibits a color tone of a neutral tint when it develops a color, features a high color-developing sensitivity and a high fading rate, and has a good photochromic resistance.
摘要:
A laminated product has a multilayer structure comprising an optical base and a cured polyurethane resin layer formed thereon from a moisture-curable polyurethane resin and/or a precursor therefor. The polyurethane resin layer is formed by applying a coating fluid comprising a moisture-curable polyurethane resin and/or precursor therefor and a solvent having a boiling point of 70° C. or higher and a solubility parameter of 8 or larger. Also provided is a coating material comprising a radical-polymerizable monomer ingredient, a silicone or fluorochemical surfactant, and a photochromic compound. In producing a photochromic optical article, excellent adhesion between a base and a photochromic layer is attained.
摘要:
A polymerization curable composition comprising a specific polyfunctional polymerizable monomer having a hard molecular structure with an L-scale Rockwell hardness of its homopolymer of 60 or more, a specific polyfunctional polymerizable monomer and a photochromic compound, a photochromic lens substrate composed of a cured product of the polymerization curable composition, and a lens comprising the photochromic lens substrate. The substrate and lens show excellent photochromic properties such as high color development density and high fading rate, and the cured product has excellent substrate properties such as hardness, heat resistance and impact resistance as well as strength (toughness) that allows for its use in rimless spectacles.