公开(公告)号：US09484188B2

公开(公告)日：2016-11-01

申请号：US14644261

申请日：2015-03-11

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Niels Vergeer

IPC: G03F1/00 ,  G03F9/00 ,  H01J37/317 ,  G01N21/88

CPC classification number: H01J37/3177 ,  G01N21/88 ,  G03F9/7088 ,  H01J37/3045 ,  H01J2237/2482 ,  H01J2237/30433 ,  H01J2237/31798

Abstract: Methods and systems for verification of a mark written on a target surface during a multiple beam lithography process, and for verifying beam position of individual beams on the target surface based on mark verification are disclosed. A mark can be verified by scanning an optical beam over the mark and measuring the reflected optical beam and the position of the target with respect to the optical beam. By comparing the intensity of the reflected light as a function of distance over the mark with reference mark data representing an intended definition of the mark, and any deviation between the measured representation and the reference mark data are determined. If any deviation deviate more than the predetermined limit, incorrectly positioned beams can be verified from the data.

公开(公告)号：US20150268032A1

公开(公告)日：2015-09-24

申请号：US14716801

申请日：2015-05-19

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Guido de Boer ,  Thomas Adrian Ooms ,  Niels Vergeer ,  Godefridus Cornelius Antonius Couweleers

IPC: G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02007 ,  G01B9/02015 ,  G03F7/70833 ,  G03F7/7085 ,  H01J2237/30438

Abstract: The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.

Abstract translation: 本发明涉及一种用于测量参考反射镜和测量镜之间的位移方向的差分干涉仪模块。 在一个实施例中，差分干涉仪模块适于朝向第一反射镜发射三个参考光束，并且三个测量光束朝向第二反射镜发射以确定所述第一和第二反射镜之间的位移。 在优选实施例中，相同的模块也用于测量围绕两个垂直轴的相对旋转。 本发明还涉及包括这种干涉仪模块的光刻系统和用于测量这种位移和旋转的方法。