公开(公告)号：US20180033579A1

公开(公告)日：2018-02-01

申请号：US15717364

申请日：2017-09-27

Applicant: NIKON METROLOGY NV

Inventor： Roger HADLAND

IPC: H01J35/02 ,  H01J29/48 ,  F16C35/04 ,  F16C33/76 ,  F16J15/16 ,  H05G1/12 ,  H02M7/10 ,  H01J35/10 ,  H01J35/04 ,  H01J35/16 ,  H02M1/32

CPC classification number: H01J35/025 ,  F16C33/768 ,  F16C35/042 ,  F16J15/16 ,  H01J29/48 ,  H01J35/04 ,  H01J35/06 ,  H01J35/101 ,  H01J35/106 ,  H01J35/108 ,  H01J35/16 ,  H01J37/065 ,  H01J2235/0236 ,  H01J2235/083 ,  H01J2235/086 ,  H01J2235/087 ,  H01J2235/1046 ,  H01J2235/1204 ,  H01J2235/1262 ,  H01J2235/20 ,  H01J2237/2482 ,  H02M1/32 ,  H02M7/106 ,  H05G1/12

Abstract: Disclosed herein are a high-voltage generator for an x-ray source, an x-ray gun, an electron beam apparatus, a rotary vacuum seal, a target assembly for an x-ray source, a rotary x-ray emission target, and an x-ray source. These various aspects may separately and/or together enable the construction of an x-ray source which can operate at energies of up to 500 kV and beyond, which is suitable for use in commercial and research x-ray applications such as computerised tomography. In particular, the high-voltage generator includes a shield electrode electrically connected intermediate of a first voltage multiplier and a second voltage multiplier. The electron beam apparatus includes control photodetectors and photo emitters having a transparent conductive shield arranged therebetween. The rotary vacuum seal includes a pumpable chamber at a position intermediate between high-pressure and low-pressure ends of a bore for a rotating shaft. The rotary target assembly is configured such that when a torque between a bearing housing and a vacuum housing exceeds a predetermined torque, the bearing housing rotates relative to the vacuum housing. The rotary x-ray emission target has a plurality of target plates supported on a hub, the plates being arranged on the hub to provide an annular target region about an axis rotation of the hub. The x-ray gun is provided with a shield electrode maintained at a potential difference relative to the x-ray target different to the electron beam emission cathode.

公开(公告)号：US20170365446A1

公开(公告)日：2017-12-21

申请号：US15626905

申请日：2017-06-19

Applicant: TOKYO ELECTRON LIMITED ,  National University Corporation Nagoya University

Inventor： Hitoshi ITOH ,  Masaru HORI ,  Hirotaka TOYODA ,  Haruka SUZUKI ,  Makoto SEKINE

IPC: H01J37/32

CPC classification number: H01J37/32311 ,  H01J37/32449 ,  H01J2237/2482

Abstract: A microwave supply apparatus includes a waveguide, a circulator, and a matcher, a first port of the circulator receives a microwave from an input end. First and second ends of the waveguide are coupled to second and third ports of the circulator, respectively. The matcher is provided between the input end and the first port of the circulator. The waveguide includes a rectangular waveguide having first and second walls facing each other, and third and fourth walls facing each other. A slot hole is formed in the first wall, and the slot hole is provided at a region deviated to the third wall side. The waveguide includes a first ridge portion provided therein. The first ridge portion faces the slot hole, is in contact with the second wall and third wall, and is separated from the first wall and fourth wall.

公开(公告)号：US09378921B2

公开(公告)日：2016-06-28

申请号：US14428163

申请日：2013-09-16

Applicant: DELMIC B.V.

Inventor： Jacob Pieter Hoogenboom ,  Aernout Christiaan Zonnevylle ,  Pieter Kruit ,  Angela Carolina Narváez-González

IPC: H01J37/28 ,  H01J37/21 ,  H01J37/02 ,  H01J37/22

CPC classification number: H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

Abstract: The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

Abstract translation: 本发明涉及通过用电子束照射基板来在光显微镜LM的检测光信号中产生变化（61）来相互对准扫描电子显微镜SEM和光学显微镜LM的方法， 扫描电子显微镜SEM的坐标系中的电子束到光显微镜LM的坐标系中检测到的光信号的观察位置的位置，并相对移动扫描电子显微镜SEM和光学显微镜LM，相对于 彼此相对于坐标系（60,62）的期望的相对位置。

公开(公告)号：US20160005566A1

公开(公告)日：2016-01-07

申请号：US14745122

申请日：2015-06-19

Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

Inventor： Ahmed H. Zewail ,  John Spencer Baskin ,  Haihua Liu

IPC: H01J37/073 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26

CPC classification number: G01N23/2055 ,  G01N21/00 ,  G01N23/04 ,  G01N23/20058 ,  G01N23/20083 ,  H01J37/228 ,  H01J37/26 ,  H01J2237/06333 ,  H01J2237/0635 ,  H01J2237/2482 ,  H01J2237/2617 ,  H01J2237/2626

Abstract: An electron microscope system includes a laser system operable to generate an optical pulse and a pump pulse and a microscope column. The microscope column includes a multiple cathode structure having a plurality of spatially separated cathode regions. Each of the cathode regions are operable to generate an electron pulse. The microscope column also includes an electron acceleration region adjacent the multiple cathode structure, a specimen region operable to support a specimen, and a detector.

Abstract translation: 电子显微镜系统包括可操作以产生光脉冲和泵脉冲和显微镜柱的激光系统。 显微镜柱包括具有多个空间分离的阴极区域的多阴极结构。 每个阴极区域可操作以产生电子脉冲。 显微镜柱还包括与多个阴极结构相邻的电子加速区域，可操作以支撑样本的样本区域和检测器。

公开(公告)号：US20150262784A1

公开(公告)日：2015-09-17

申请号：US14428163

申请日：2013-09-16

Applicant: DELMIC B.V.

Inventor： Jacob Pieter Hoogenboom ,  Aernout Christiaan Zonnevylle ,  Pieter Kruit ,  Angela Carolina Narváez-González

IPC: H01J37/02 ,  H01J37/28 ,  H01J37/22

CPC classification number: H01J37/023 ,  H01J37/222 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2482 ,  H01J2237/2801 ,  H01J2237/2808

Abstract: The present invention relates to a method for mutually aligning a scanning electron microscope SEM and a light microscope LM by creating a change (61) in the detected light signal of the light microscope LM by illuminating a substrate with an electron beam, correlating the position of the electron beam in the coordinate system of the scanning electron microscope SEM to the position of the observed change in the detected light signal in the coordinate system of the light microscope LM, and relatively shifting the scanning electron microscope SEM and the light microscope LM with respect to one another to a desired relative position of the coordinate systems (60, 62).

Abstract translation: 本发明涉及通过用电子束照射基板来在光显微镜LM的检测光信号中产生变化（61）来相互对准扫描电子显微镜SEM和光学显微镜LM的方法， 扫描电子显微镜SEM的坐标系中的电子束到光显微镜LM的坐标系中检测到的光信号的观察位置的位置，并相对移动扫描电子显微镜SEM和光学显微镜LM，相对于 彼此相对于坐标系（60,62）的期望的相对位置。

公开(公告)号：US20140297205A1

公开(公告)日：2014-10-02

申请号：US14153262

申请日：2014-01-13

Applicant: Max-Planck-Gesellschaft zur Foerderung der Wissenschaften e.V.

Inventor： Nahid Talebi SARVARI ,  Ralf VOGELGESANG ,  Peter VAN AKEN

IPC: G01R29/08

CPC classification number: G01N23/2251 ,  H01J2237/24485 ,  H01J2237/2482

Abstract: Determining electromagnetic response of sample structure having predetermined bulk permittivity and permeability, to electron and radiation pulses, includes calculating electron pulse response of sample structure to electron pulse excitation, using finite-difference time-domain method. Electron pulse excitation is represented by non-singular current source driven by relativistic moving non-Coulombian electron charges, electron pulse response is calculated based on interaction of electron pulse excitation with electromagnetic modes of sample structure at laboratory frame, and electron pulse response depends on bulk permittivity and permeability of sample structure, calculating radiation response of sample structure to electromagnetic radiation excitation, using finite-difference time-domain method. Radiation response depends on bulk permittivity and permeability of sample structure, and providing electromagnetic response of sample structure by superimposing electron pulse response and radiation response. Electromagnetic response comprises electron-energy-loss spectra and/or experienced phase of electron wave functions after interacting with photons of electromagnetic radiation excitation. Method and measuring apparatus are also described.

Abstract translation: 确定具有预定体积电容率和磁导率，电子和辐射脉冲的样品结构的电磁响应包括使用有限差分时域法计算样品结构对电子脉冲激发的电子脉冲响应。 电子脉冲激励由相对论运动的非库仑电子电子驱动的非奇异电流源表示，电子脉冲响应是基于电子脉冲激励与实验室框架的样品结构的电磁模式的相互作用计算的，电子脉冲响应取决于体积 采样结构的介电常数和磁导率，采用有限差分时域法计算样品结构对电磁辐射激发的辐射响应。 辐射响应取决于样品结构的体积介电常数和磁导率，并且通过叠加电子脉冲响应和辐射响应来提供样品结构的电磁响应。 电磁响应包括与电磁辐射激发光子相互作用后的电子能量损失谱和/或经历电子波函数相位。 还描述了方法和测量装置。

公开(公告)号：US08766181B2

公开(公告)日：2014-07-01

申请号：US13893054

申请日：2013-05-13

Applicant: California Institute of Technology

Inventor： Ahmed H. Zewail ,  John Spencer Baskin

IPC: H01J37/26 ,  H01J37/22 ,  G01N23/00

CPC classification number: H01J37/26 ,  G01N23/00 ,  H01J37/073 ,  H01J37/22 ,  H01J37/226 ,  H01J2237/2455 ,  H01J2237/2482 ,  H01J2237/25 ,  H01J2237/2555

Abstract: An optical system includes a beam splitter disposed along an optical axis and a set of mirrors optically coupled to the beam splitter. The set of mirrors are oriented perpendicular to each other. The optical system also includes a turning mirror optically coupled to a second mirror of the set of mirrors and a detector optically coupled to the turning mirror.

Abstract translation: 光学系统包括沿着光轴布置的分束器和一组光束耦合到分束器的反射镜。 这组镜子相互垂直取向。 光学系统还包括光学耦合到该组反射镜的第二反射镜的旋转镜和与镜子相耦合的检测器。

公开(公告)号：US08618515B2

公开(公告)日：2013-12-31

申请号：US13162979

申请日：2011-06-17

Applicant: Koichi Sentoku

Inventor： Koichi Sentoku

IPC: G21G1/10 ,  H01J37/08 ,  G02B27/42 ,  H01J37/317 ,  G03F9/00 ,  G03F7/20

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7053 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/24528 ,  H01J2237/2482

Abstract: A lithography apparatus includes a first measurement device which measures a position of a mark on a substrate with light, a second measurement device which measures a position of a reference mark on a stage with a charged-particle, a detector which detects the position of the stage in a first direction parallel to the axis of a projection system and a second direction perpendicular to this axis, and a controller. The controller determines a charged-particle beam, in which the angle, with respect to the first direction, at which it is incident on the reference mark falls within a tolerance, and obtains a baseline for the first measurement device from the position of the reference mark measured by the second measurement device using the determined charged-particle beam and the position of the reference mark measured by the first measurement device.

Abstract translation: 光刻设备包括：用光测量基板上的标记位置的第一测量装置，测量带有带电粒子的台上的参考标记的位置的第二测量装置;检测所述基板的位置的检测器; 在平行于投影系统的轴线的第一方向和垂直于该轴线的第二方向的第一方向上的台阶，以及控制器。 控制器确定带电粒子束，其中相对于其入射到参考标记上的第一方向的角度落在公差内，并从参考点的位置获得第一测量装置的基线 由第二测量装置使用确定的带电粒子束测量的标记和由第一测量装置测量的参考标记的位置。

公开(公告)号：US20130265575A1

公开(公告)日：2013-10-10

申请号：US13853843

申请日：2013-03-29

Applicant: CANON KABUSHIKI KAISHA

Inventor： Wataru Yamaguchi ,  Hideki Ina

IPC: G01N21/23 ,  G01B11/26

CPC classification number: G01N21/23 ,  G01B11/26 ,  G01N21/21 ,  G03F9/7096 ,  H01J2237/2482 ,  H01J2237/30438 ,  H01J2237/3175

Abstract: A detection apparatus includes an optical system including a polarization beam splitter and a quarter-wave plate. The optical system illuminates a mark via the polarization beam splitter and the quarter-wave plate in sequence, and directs light reflected from the mark via the quarter-wave plate and the polarization beam splitter in sequence towards a light-receiving element An airtight container configured to enclose therein at least part of the optical system includes, as a partition wall thereof, a light transmitting member arranged in an optical path between the polarization beam splitter and the quarter-wave plate.

Abstract translation: 检测装置包括具有偏振分束器和四分之一波片的光学系统。 光学系统依次通过偏振分束器和四分之一波片照亮标记，并且将经过四分之一波片和偏振分束器的标记反射的光引导到光接收元件。配置的气密容器 为了封装在其中，光学系统的至少一部分包括作为其隔壁的布置在偏振分束器和四分之一波片之间的光路中的透光构件。

公开(公告)号：US08497476B2

公开(公告)日：2013-07-30

申请号：US13420731

申请日：2012-03-15

Applicant: Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/225

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。