公开(公告)号：US20050030502A1

公开(公告)日：2005-02-10

申请号：US10874192

申请日：2004-06-24

申请人： Tadahito Fujisawa ,  Soichi Inoue ,  Satoshi Tanaka ,  Masafumi Asano

发明人： Tadahito Fujisawa ,  Soichi Inoue ,  Satoshi Tanaka ,  Masafumi Asano

IPC分类号： G03B27/42 ,  G03F1/26 ,  G03F1/38 ,  G03F1/44 ,  G03F1/68 ,  G03F1/70 ,  G03F7/20 ,  H01L21/027 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/52 ,  H01L23/522

CPC分类号： G03F1/44

摘要： A photomask transferring a light shield film pattern formed on a transparent substrate by a projection exposure apparatus, comprising a circuit pattern for transferring a predetermined pattern to a resist film, and an exposure monitor mark, the exposure monitor mark being formed in a manner that blocks having a predetermined width p, which are not resolved by the projection exposure apparatus, are intermittently or continuously arrayed along one direction, light shield and transmission portions are arrayed along one direction in each of the blocks, the blocks are arrayed so that a dimension ratio of the light shield and transmission portions of the blocks simply changes and the phase difference of exposure light passing through adjacent light transmission portions is approximately 180°.

摘要翻译： 一种光掩模，其通过投影曝光装置将形成在透明基板上的遮光膜图案转印，所述投影曝光装置包括用于将预定图案转印到抗蚀剂膜的电路图案，以及曝光监视标记，所述曝光监视标记以块 具有未被投影曝光装置解析的预定宽度p沿着一个方向间歇地或连续地排列，在每个块中沿着一个方向排列有光屏蔽和透射部分，块被排列成使得尺寸比 的光屏蔽和透射部分简单地改变，并且穿过相邻光传输部分的曝光光的相位差大约为180°。

公开(公告)号：US07655369B2

公开(公告)日：2010-02-02

申请号：US11646480

申请日：2006-12-28

申请人： Masafumi Asano ,  Tadahito Fujisawa ,  Satoshi Tanaka

发明人： Masafumi Asano ,  Tadahito Fujisawa ,  Satoshi Tanaka

IPC分类号： G03C5/00 ,  G03F9/00 ,  G03F1/00

CPC分类号： G03F7/70466 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70625

摘要： A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.

公开(公告)号：US20070105028A1

公开(公告)日：2007-05-10

申请号：US11646480

申请日：2006-12-28

申请人： Masafumi Asano ,  Tadahito Fujisawa ,  Satoshi Tanaka

发明人： Masafumi Asano ,  Tadahito Fujisawa ,  Satoshi Tanaka

IPC分类号： G03C5/00 ,  G03F1/00

CPC分类号： G03F7/70466 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70625

摘要： A reticle set, includes a first photomask having a circuit pattern provided with first and second openings provided adjacent to each other sandwiching a first opaque portion, and a monitor mark provided adjacent to the circuit pattern; and a second photomask having a trim pattern provided with a second opaque portion covering the first opaque portion in an area occupied by the circuit pattern and an extending portion connected to one end of the first opaque portion and extending outside the area when the second photomask is aligned with a pattern delineated on a substrate by the first photomask.

摘要翻译： 标线组包括具有电路图案的第一光掩模，该电路图案设置有彼此相邻设置的夹着第一不透明部分的第一和第二开口以及邻近电路图案设置的监视标记; 以及第二光掩模，其具有装饰图案，其具有覆盖所述电路图案占据的区域中的所述第一不透明部分的第二不透明部分和连接到所述第一不透明部分的一端的延伸部分，并且当所述第二光掩模为 与通过第一光掩模在衬底上描绘的图案对准。

公开(公告)号：US07396621B2

公开(公告)日：2008-07-08

申请号：US11819375

申请日：2007-06-27

申请人： Tadahito Fujisawa ,  Soichi Inoue ,  Satoshi Tanaka ,  Masafumi Asano

发明人： Tadahito Fujisawa ,  Soichi Inoue ,  Satoshi Tanaka ,  Masafumi Asano

IPC分类号： G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F1/14

CPC分类号： G03F1/44

摘要： A method of manufacturing a semiconductor device includes preparing a projection exposure apparatus and a photomask, the photomask having a transparent substrate and a light shield film arranged in patterns to be transferred to a resist film on a wafer. The patterns include a circuit mask pattern, and first and second mark mask patterns having dimensions which change in accordance with exposure of the resist film. The method further includes forming first and second exposure monitor marks by causing phasing differences of 180 degrees and zero degrees, respectively, of light passing through the corresponding first and second mark mask patterns; measuring the first and second exposure monitor marks; calculating first and second effective exposures based on measured dimensions of the first and second exposure monitor marks; comparing variations of the first and second effective exposures; and changing at least one of a deposit condition of a front-end film formed under the resist film or a resist film coating condition if a variation of the first effective exposure differs from a variation of the second effective exposure.

摘要翻译： 制造半导体器件的方法包括制备投影曝光设备和光掩模，所述光掩模具有透明基板和以图案排列的光屏蔽膜，以转印到晶片上的抗蚀剂膜。 图案包括电路掩模图案，以及具有根据抗蚀剂膜的曝光而变化的尺寸的第一和第二标记掩模图案。 该方法还包括通过分别通过相应的第一和第二标记掩模图案的光180度和零度的相位差来形成第一和第二曝光监视标记; 测量第一和第二曝光监视标记; 基于第一和第二曝光监视标记的测量尺寸来计算第一和第二有效曝光; 比较第一和第二有效曝光的变化; 以及如果第一有效曝光的变化与第二有效曝光的变化不同，则改变形成在抗蚀剂膜下方的前端膜的沉积条件或抗蚀剂膜涂覆条件中的至少一个。

公开(公告)号：US08122385B2

公开(公告)日：2012-02-21

申请号：US12129167

申请日：2008-05-29

申请人： Kazuya Fukuhara ,  Tatsuhiko Higashiki ,  Toshiya Kotani ,  Satoshi Tanaka ,  Takashi Sato ,  Akiko Mimotogi ,  Masaki Satake

发明人： Kazuya Fukuhara ,  Tatsuhiko Higashiki ,  Toshiya Kotani ,  Satoshi Tanaka ,  Takashi Sato ,  Akiko Mimotogi ,  Masaki Satake

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： In a model-based OPC which makes a suitable mask correction for each mask pattern using an optical image intensity simulator, a mask pattern is divided into subregions and the model of optical image intensity simulation is changed according to the contents of the pattern in each subregion. When the minimum dimensions of the mask pattern are smaller than a specific threshold value set near the exposure wavelength, the region is calculated using a high-accuracy model and the other regions are calculated using a high-speed model.

摘要翻译： 在基于模型的OPC中，使用光学图像强度模拟器对每个掩模图案进行适当的掩模校正，将掩模图案划分为子区域，并且根据每个子区域中的图案的内容来改变光学图像强度模拟模型 。 当掩模图案的最小尺寸小于在曝光波长附近设置的特定阈值时，使用高精度模型计算该区域，并且使用高速模型来计算其它区域。

公开(公告)号：US07901853B2

公开(公告)日：2011-03-08

申请号：US12395398

申请日：2009-02-27

申请人： Satoshi Tanaka ,  Masaki Satake

发明人： Satoshi Tanaka ,  Masaki Satake

IPC分类号： G03F9/00 ,  G06F17/50

CPC分类号： G03F1/36 ,  G03F1/80

摘要： A pattern prediction method according to an embodiment includes: predicting a second pattern shape from a first pattern shape by using a conversion function and a conversion difference residual error amount function, wherein; the conversion function makes the connection between the first pattern formed by a first step and the second pattern formed by a second step following the first step based on contour shapes of the first pattern and the second pattern, and the conversion difference residual error amount function makes the connection between a residual error amount between a predicted shape of the second pattern obtained from the conversion function and the second pattern shape obtained by actually using the second step, and factors other than the contour shapes of the first pattern and the second pattern.

摘要翻译： 根据实施例的图案预测方法包括：通过使用转换函数和转换差残差误差量函数从第一图案形状预测第二图案形状，其中： 转换功能使得基于第一步骤形成的第一图案与第一步骤之后的第二步骤形成的第二图案之间的连接基于第一图案和第二图案的轮廓形状，以及转换差残差误差量函数 从转换功能获得的第二图案的预测形状与通过实际使用第二步骤获得的第二图案形状之间的残留误差量与除了第一图案和第二图案的轮廓形状之外的因素之间的连接。

公开(公告)号：US07831953B2

公开(公告)日：2010-11-09

申请号：US11802615

申请日：2007-05-24

申请人： Masaki Satake ,  Hiromitsu Mashita ,  Satoshi Tanaka

发明人： Masaki Satake ,  Hiromitsu Mashita ,  Satoshi Tanaka

IPC分类号： G06F17/50

CPC分类号： G06F17/5009 ,  G03F1/36 ,  G03F7/705 ,  G03F7/70666

摘要： A lithography simulation method which predicts the result that a pattern formed on a mask is transferred onto a sample by use of a simulation based on pattern data of the mask includes subjecting a mask layout containing a pattern whose periodicity is disturbed to the simulation. At this time, a calculation area of pattern data used for the simulation is set to an integral multiple of minimum periodic length of the mask layout.

摘要翻译： 通过使用基于掩模的图案数据的模拟将掩模上形成的图案转移到样本上的结果的光刻仿真方法包括对包含周期性被扰乱的图案的掩模布局进行模拟。 此时，将用于模拟的图案数据的计算区域设置为掩模布局的最小周期长度的整数倍。

公开(公告)号：US09678561B2

公开(公告)日：2017-06-13

申请号：US14036395

申请日：2013-09-25

申请人： Satoshi Tanaka

发明人： Satoshi Tanaka

IPC分类号： G06F1/32

CPC分类号： G06F1/3234 ,  G06F1/3284 ,  G06F1/3293 ,  Y02D10/122 ,  Y02D10/159

摘要： In the invention, a first processor that controls operation of a predetermined controlled unit and a second processor are operated in a first mode, a second mode, and a third mode, in the first mode the first processor and second processor are operable respectively, in the second mode respective amounts of power supplied to the first and second processors are lower than that in the first mode, in the third mode respective amounts of power supplied to the first and second processors are an amount between that in the first mode and that in the second mode and at least the predetermined controlled unit is operable, and in the second mode, the first processor puts a process related to the first processor before a process related to the second processor until the second mode is transited to the third mode.

公开(公告)号：US09151470B2

公开(公告)日：2015-10-06

申请号：US13982636

申请日：2011-12-28

申请人： Fumimasa Amemiya ,  Toru Ochiai ,  Fumihide Sakamoto ,  Junya Ozawa ,  Satoshi Tanaka ,  Yuichi Kagami ,  Hiroyuki Hirokawa ,  Shinnosuke Enomoto ,  Koji Ogino

发明人： Fumimasa Amemiya ,  Toru Ochiai ,  Fumihide Sakamoto ,  Junya Ozawa ,  Satoshi Tanaka ,  Yuichi Kagami ,  Hiroyuki Hirokawa ,  Shinnosuke Enomoto ,  Koji Ogino

IPC分类号： H04N1/04 ,  F21V13/04 ,  H04N1/028 ,  F21V8/00 ,  H04N1/10

CPC分类号： F21V13/04 ,  G02B6/0045 ,  H04N1/02835 ,  H04N1/0289 ,  H04N1/1017

摘要： To provide an illumination device in which there is no variation in light intensity distribution of the illumination device, and in which illumination spots, particularly light intensity spots, are not prone to occur in a read image in an image reading device, by maintaining a constant gap between a light source and an end face of a light guide. The illumination device includes: a light guide having an end face for taking in light, a diffuse reflecting surface for diffusely reflecting the light taken in from the end face, and a light exit surface for emitting the light that is diffusely reflected at the diffuse reflecting surface towards an irradiation surface. The illumination device further include a reflector having a diffuse reflecting surface that reflects light from the light source toward the one end face of the light guide. The light guide has, at the one end, a flange portion that abuts the reflector, the light source is mounted to a circuit board, and the reflector is held between the flange portion of the light guide and circuit board so as to maintain a predetermined gap between the light source and light guide.

摘要翻译： 为了提供一种照明装置，其中照明装置的光强度分布没有变化，并且其中在图像读取装置中的读取图像中不容易发生照明点，特别是光强度点，通过保持恒定 光源与光导的端面之间的间隙。 照明装置包括：具有用于吸收光的端面的光导，用于漫反射从端面吸收的光的漫反射面，以及用于发射在漫反射处漫反射的光的光出射面 表面朝向照射表面。 照明装置还包括具有将来自光源的光朝向光导的一个端面反射的漫反射面的反射体。 导光体的一端具有与反射体抵接的凸缘部，光源安装在电路基板上，反射体保持在导光板的凸缘部与电路基板之间， 光源与光导之间的间隙。

公开(公告)号：US08970686B2

公开(公告)日：2015-03-03

申请号：US13547711

申请日：2012-07-12

申请人： Naruyasu Kobayashi ,  Kaoru Kotoda ,  Hisashi Nishimura ,  Motoo Azuma ,  Kazuhiro Takizawa ,  Takayuki Sato ,  Satoshi Tanaka

发明人： Naruyasu Kobayashi ,  Kaoru Kotoda ,  Hisashi Nishimura ,  Motoo Azuma ,  Kazuhiro Takizawa ,  Takayuki Sato ,  Satoshi Tanaka

IPC分类号： H04N7/18 ,  H04N5/06 ,  A61B1/00 ,  A61B1/045 ,  G09G5/12 ,  G09G5/00

CPC分类号： A61B1/00006 ,  A61B1/045 ,  G09G5/005 ,  G09G5/12 ,  G09G2340/0435 ,  G09G2380/08

摘要： An electronic endoscopic apparatus includes an endoscopic scope and an image processing processor. The endoscopic scope includes a solid-state imaging device, an imaging-side multiplying unit, and an imaging synchronization signal generating unit. The image processing processor includes a display clock generating unit, a monitor synchronization signal generating unit, a master imaging clock generating unit, a processor-side multiplying/dividing unit, a phase-comparison oscillation control unit, and a display timing adjustment unit.

摘要翻译： 电子内窥镜装置包括内窥镜镜片和图像处理处理器。 内窥镜检查范围包括固态成像装置，成像侧乘法单元和成像同步信号生成单元。 图像处理处理器包括显示时钟生成单元，监视同步信号生成单元，主成像时钟生成单元，处理器侧乘法/分割单元，相位比较振荡控制单元和显示定时调整单元。