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11.发明授权Microlithography illumination system and microlithography illumination optical unit 有权微光刻照明系统和微光刻照明光学单元公开(公告)号：US09304405B2
公开(公告)日：2016-04-05
申请号：US12974436
申请日：2010-12-21
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译： 用于微光刻的照明光学单元用照明光照亮物场。 该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。 该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。 至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。
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12.发明申请公开(公告)号：US20110122392A1
公开(公告)日：2011-05-26
申请号：US12974436
申请日：2010-12-21
IPC分类号： G03B27/72
CPC分类号： G03F7/70191 , G03F7/70075 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： An illumination optical unit for microlithography illuminates an object field with illumination light. The unit includes a first facet mirror that has a plurality of first facets, and a second facet mirror that has a plurality of second facets. The unit has facet pairs which include respectively a facet of the first facet mirror and a facet of the second facet mirror which predefine a plurality of illumination channels for illuminating the object field. At least some of the illumination channels have in each case an assigned polarization element for predefining an individual polarization state of the illumination light guided in the respective illumination channel.
摘要翻译： 用于微光刻的照明光学单元用照明光照亮物场。 该单元包括具有多个第一小面的第一小面镜和具有多个第二面的第二小面镜。 该单元具有分面对，其分别包括第一分面反射镜的小平面和第二分面反射镜的小平面，其预定义用于照亮对象场的多个照明通道。 至少一些照明通道在每种情况下都具有分配的偏振元件，用于预定义在各个照明通道中引导的照明光的单独偏振状态。
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公开(公告)号：US20110007293A1
公开(公告)日：2011-01-13
申请号：US12884485
申请日：2010-09-17
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。
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公开(公告)号：US07817250B2
公开(公告)日：2010-10-19
申请号：US12146200
申请日：2008-06-25
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。
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公开(公告)号：US20050243222A1
公开(公告)日：2005-11-03
申请号：US11104101
申请日：2005-04-12
申请人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
发明人： Manfred Maul , Michael Totzeck , Olaf Dittman , Damian Fiolka
IPC分类号： G02B13/24 , G02B5/30 , G02B13/14 , G02F1/1335 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70966 , G02B5/3083 , G02B13/143 , G03F7/70566
摘要： An optical system, for example an illumination system or a projection objective (10), of a microlithographic projection exposure apparatus contains an optical element (L2, L3) which consists of a birefringent material. A projection light beam (14) formed by linearly polarized light rays passes through the optical element (L2, L3). In order to avoid perturbations of the polarization distribution of the light beam, the birefringent material is aligned such that each light ray entering the material is polarized substantially parallel or substantially perpendicularly to a slow birefringent axis for the respective light ray.
摘要翻译： 微光刻投影曝光装置的光学系统例如照明系统或投影物镜（10）包含由双折射材料构成的光学元件（L 2，L 3）。 由线偏振光形成的投影光束（14）通过光学元件（L 2，L 3）。 为了避免光束的偏振分布的扰动，双折射材料被对准，使得进入材料的每个光线基本上平行或基本垂直于相应光线的慢双折射轴线偏振。
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公开(公告)号：US20090021719A1
公开(公告)日：2009-01-22
申请号：US12146200
申请日：2008-06-25
IPC分类号： G03B27/72
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。
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公开(公告)号：US08395753B2
公开(公告)日：2013-03-12
申请号：US12884485
申请日：2010-09-17
CPC分类号： G03F7/70083 , G03F7/70566
摘要： The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.
摘要翻译： 本公开涉及微光刻投影曝光装置，以及相关的部件和方法。 在一些实施例中，微光刻投影曝光装置包括照明系统和投影物镜，其中照明系统可照亮投影物镜的物平面，并且投影物镜可以在像平面上产生物平面的图像。 可以在照明系统中产生偏振相关的透射，使得对于相对于物体平面上的光的至少一个偏振分布，获得物平面中的非均匀强度分布。 非均匀强度分布可以通过投影物镜的偏振依赖透射特性在图像平面中提供均匀的强度分布。
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18.发明授权Illumination system of a microlithographic projection exposure apparatus with a birefringent element 有权具有双折射元件的微光刻投影曝光装置的照明系统公开(公告)号：US09316920B2
公开(公告)日：2016-04-19
申请号：US12717696
申请日：2010-03-04
申请人： Damian Fiolka , Daniel Walldorf , Ingo Saenger
发明人： Damian Fiolka , Daniel Walldorf , Ingo Saenger
CPC分类号： G03F7/702 , G03F7/70116 , G03F7/70566
摘要： The disclosure concerns an illumination system of a microlithographic projection exposure apparatus. The illumination system includes a mirror arrangement which has a plurality of mirror units and at least one element arranged in front of the mirror arrangement in the light propagation direction to produce at least two different states of polarization incident on different mirror units. The mirror units are displaceable independently of each other for altering an angle distribution of the light reflected by the mirror arrangement.
摘要翻译： 本公开涉及微光刻投影曝光装置的照明系统。 照明系统包括具有多个镜单元和在光传播方向上布置在镜装置前面的至少一个元件以产生入射在不同镜单元上的至少两种不同偏振态的反射镜装置。 反射镜单元彼此独立地移位，以改变由反射镜装置反射的光的角度分布。
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公开(公告)号：US09235137B2
公开(公告)日：2016-01-12
申请号：US13370829
申请日：2012-02-10
申请人： Damian Fiolka , Ralf Stuetzle
发明人： Damian Fiolka , Ralf Stuetzle
CPC分类号： G03F7/70233 , G02B27/0905 , G02B27/0977 , G03F7/70075 , G03F7/70116 , G03F7/70175 , G03F7/702 , G03F7/70566 , G21K1/06 , G21K1/16 , G21K2201/06 , G21K2201/064 , G21K2201/067
摘要： An illumination optical unit includes a collector mirror which produces a polarization distribution that is applied to the first faceted optical element during the operation of the illumination optical unit. There are at least two first facet elements to which radiation having a differing polarization is applied. The first faceted optical element has at least one first state in which the normal vectors of the reflective surfaces of the first facet elements are selected so that a first predetermined polarization distribution results at the location of the object field during the operation of the illumination optical unit.
摘要翻译： 照明光学单元包括集光镜，其在照明光学单元的操作期间产生施加到第一刻面光学元件的偏振分布。 存在施加具有不同极化的辐射的至少两个第一小面元件。 第一刻面光学元件具有至少一个第一状态，其中第一面元件的反射表面的法向矢量被选择为使得在照明光学单元的操作期间在物场的位置处产生第一预定偏振分布 。
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20.发明授权Method for modifying a polarization distribution in microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus 有权用于修改微光刻投影曝光装置中的偏光分布的方法，以及微光刻投影曝光装置公开(公告)号：US09128389B2
公开(公告)日：2015-09-08
申请号：US13010145
申请日：2011-01-20
申请人： Damian Fiolka
发明人： Damian Fiolka
CPC分类号： G03F7/70566
摘要： The disclosure relates to a method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and to a microlithographic projection exposure apparatus. The projection exposure apparatus has an illumination device and a projection objective. The illumination device has an optical axis and a correction arrangement having a lambda/4 plate arranged rotatably about the optical axis and/or a lambda/2 plate arranged rotatably about the optical axis. The method includes determining a polarization distribution in a predetermined plane of the projection exposure apparatus, and rotating the lambda/4 plate and/or the lambda/2 plate about the optical axis so that a local variation of the polarization distribution is reduced after rotation in comparison with the state before the rotating.
摘要翻译： 本公开涉及一种用于修改微光刻投影曝光装置中的偏振分布的方法，以及微光刻投影曝光装置。 投影曝光装置具有照明装置和投影物镜。 照明装置具有光轴和具有围绕光轴可旋转地设置的λ/ 4板和/或围绕光轴可旋转地设置的λ/ 2板的校正装置。 该方法包括确定投影曝光设备的预定平面中的偏振分布，以及围绕光轴旋转λ/ 4板和/或λ/ 2板，使得在旋转之后偏振分布的局部变化减小 与旋转前的状态进行比较。
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