公开(公告)号：US07541115B1

公开(公告)日：2009-06-02

申请号：US11075993

申请日：2005-03-09

申请人： William Volk ,  Laurence Wagner

发明人： William Volk ,  Laurence Wagner

IPC分类号： G03F1/00 ,  G03C5/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/30 ,  G03F1/34 ,  G03F1/60 ,  G03F1/62

摘要： Photolithographic masks and nano-imprint lithography masks with calcium fluoride substrates are disclosed. A photolithographic mask has a calcium fluoride substrate having a surface, a patterned layer disposed on the surface, and a polymer layer forming a pellicle that covers the patterned layer. A mask for nano-imprint lithography has a calcium fluoride substrate with a surface and a nano-imprint lithography pattern formed on the surface. Such masks can be used in a method for reducing the effects of hydration during lithography. In the method a layer of photoresist is formed on a substrate. A mask having a substrate made of calcium fluoride with a patterned surface is disposed proximate the layer of photoresist. The photoresist is exposed to radiation that passes through the mask. The radiation is characterized by a vacuum wavelength between about 190 nm and about 450 nm. Calcium fluoride masks can also be used to reduce the effects of hydration nano-imprint lithography.

摘要翻译： 公开了具有氟化钙衬底的光刻掩模和纳米压印光刻掩模。 光刻掩模具有具有表面的氟化钙衬底，设置在表面上的图案层，以及形成覆盖图案层的防护薄膜的聚合物层。 用于纳米压印光刻的掩模具有形成在表面上的表面和纳米压印光刻图案的氟化钙衬底。 这样的掩模可用于降低光刻期间水合作用的方法。 在该方法中，在衬底上形成一层光致抗蚀剂。 具有由具有图案化表面的氟化钙制成的衬底的掩模设置在光致抗蚀剂层附近。 光致抗蚀剂暴露于通过掩模的辐射。 辐射的特征在于约190nm至约450nm之间的真空波长。 氟化钙面膜也可用于降低水合纳米压印光刻的影响。

公开(公告)号：US20090060317A1

公开(公告)日：2009-03-05

申请号：US11849228

申请日：2007-08-31

申请人： William Volk

发明人： William Volk

IPC分类号： G06K9/00

CPC分类号： G06K9/00 ,  G01N21/956 ,  G03F1/84 ,  G03F7/7065 ,  G06K2209/19 ,  G06T7/0006 ,  G06T7/12 ,  G06T2207/10061 ,  G06T2207/30148

摘要： Methods and apparatus relating to repair of mask defects through wafer plane modeling are described. In an embodiment, an updated edge location for a photomask is determined based on an image of the photomask and a comparison of contour of a corresponding wafer to physical design data of a corresponding device design. Other embodiments are also described.

摘要翻译： 描述了通过晶片平面建模修复掩模缺陷的方法和装置。 在一个实施例中，基于光掩模的图像和相应晶片的轮廓与对应的设备设计的物理设计数据的比较来确定用于光掩模的更新的边缘位置。 还描述了其它实施例。

公开(公告)号：US06812825B1

公开(公告)日：2004-11-02

申请号：US10267228

申请日：2002-10-09

申请人： William Volk

发明人： William Volk

IPC分类号： G08B100

CPC分类号： G04F1/005 ,  G07C5/006

摘要： A timed alert device for vehicles having an electronic timer that counts down a specified time period. An audible alert coupled to the electronic timer projects a sound when the electronic timer has reached a prescribed time. A first actuating element is coupled to the electronic timer which deactivates the audible alert when depressed. A power source is coupled to and supplies power to the electronic timer. A visual alert illuminates when the electronic timer has reached a prescribed time. Depressing a second actuating element deactivates the visual alert.

摘要翻译： 一种具有电子计时器的车辆的定时警报装置，其中计时器在指定的时间段内倒计时。 当电子计时器达到规定时间时，耦合到电子定时器的声音警报器发出声音。 第一致动元件耦合到电子计时器，其在按下时停用可听见的警报。 电源耦合到电子定时器并向其供电。 当电子计时器达到规定时间时，视觉警报将亮起。 按下第二个启动元件使视觉警报失效。