BACK-END-OF-LINE (BEOL) SIDEWALL METAL-INSULATOR-METAL (MIM) CAPACITOR

    公开(公告)号:US20210242127A1

    公开(公告)日:2021-08-05

    申请号:US16779192

    申请日:2020-01-31

    Abstract: An integrated circuit (IC) is described. The IC includes a substrate and a plurality of back-end-of-line (BEOL) layers on the substrate. The IC also includes a trench having tapered sidewalls and a base in a BEOL layer of the plurality of BEOL layers on the substrate. The IC further includes a metal-insulator-metal (MIM) capacitor on the tapered sidewalls and the base of the trench in the BEOL layer. The MIM capacitor includes a first conductive layer to line the tapered sidewalls and the base of the trench. The MIM capacitor also includes a dielectric layer to line the first conductive layer on the tapered sidewalls and the base of the trench. The MIM capacitor further includes a second conductive layer on the dielectric layer and filling the trench in the BEOL layer.

    BODY CURRENT BYPASS RESISTOR
    12.
    发明申请

    公开(公告)号:US20190109152A1

    公开(公告)日:2019-04-11

    申请号:US16000501

    申请日:2018-06-05

    Abstract: A radio frequency integrated circuit (RFIC) is described. The RFIC includes a switch field effect transistor (FET), including a source region, a drain region, a body region, and a gate. The RFIC also includes a body bypass resistor coupled between the gate and the body region. The RFIC further includes a gate isolation resistor coupled between the gate and the body region. The RFIC also includes a diode coupled between the body bypass resistor and the gate isolation resistor.

    ENHANCED BODY TIED TO SOURCE LOW NOISE AMPLIFIER DEVICE

    公开(公告)号:US20250072059A1

    公开(公告)日:2025-02-27

    申请号:US18455500

    申请日:2023-08-24

    Abstract: A radio frequency (RF) device is described. The RF device includes a semiconductor-on-insulator (SOI) substrate having a first-type diffusion region. The RF device also includes a transistor including a source region and a drain region in the first-type diffusion region, a gate region between the source region and the drain region, and a body region. The RF device further includes a second-type diffusion region, comprising a gate overlap region partially overlapped by the gate region to define the body region and a second-type diffusion encroachment region in the source region and adjoining the gate overlap region to form a body terminal region, in which a silicidation layer shorts the body terminal region to the source region.

    DYNAMIC BODY BIASING FOR RADIO FREQUENCY (RF) SWITCH

    公开(公告)号:US20240063790A1

    公开(公告)日:2024-02-22

    申请号:US18104409

    申请日:2023-02-01

    CPC classification number: H03K17/6872 H03K17/6874 H03K2217/0036

    Abstract: A radio frequency (RF) device is described. The RF device includes a switch field effect transistor (FET), having a source region, a drain region, a body region, and a gate region. The RF device also includes a dynamic bias control circuit. The dynamic bias control circuit includes a first transistor coupled to the gate region of the switch FET by a gate resistor. The dynamic bias control circuit also includes a second transistor coupled to the first transistor and coupled to the body region of the switch FET by a body resistor. The dynamic bias control circuit further includes a capacitor coupled to the body region of the switch FET by the body resistor, and the gate region of the switch FET, by the gate resistor.

    CAPACITIVE TUNING USING BACKSIDE GATE
    17.
    发明申请

    公开(公告)号:US20190189801A1

    公开(公告)日:2019-06-20

    申请号:US15988987

    申请日:2018-05-24

    Abstract: A radio frequency (RF) integrated circuit (RFIC) switch multi-finger transistor includes a first dual gate transistor having a first gate with a first gate length on a first side of a substrate, and a second gate with a second gate length on a second side of the substrate. The RFIC also includes a second dual gate transistor having a third gate with a third gate length on the first side of the substrate, and a fourth gate with a fourth gate length on the second side of the substrate. The second gate length is different than the fourth gate length, and the second dual gate transistor is coupled in series with the first dual gate transistor in the RFIC switch multi-finger transistor.

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