公开(公告)号：US10944011B2

公开(公告)日：2021-03-09

申请号：US16594284

申请日：2019-10-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Tae Hoon Yang ,  Kibum Kim ,  Jongjun Baek ,  Byung Soo So ,  Jong chan Lee ,  Woong Hee Jeong ,  Jaewoo Jeong

IPC: H01L27/12 ,  H01L29/786

Abstract: A display apparatus includes a base substrate, an active pattern on the base substrate including a source region, a drain region, and a channel region that is doped between the source region and the drain region, the channel region including polycrystalline silicon, and a gate electrode overlapping the channel region of the active pattern. The channel region may include a lower portion, an upper portion, and an intermediate portion between the upper portion and the lower portion, and a dopant density of the lower portion may be 80% or more of a dopant density of the upper portion.

公开(公告)号：US10692954B2

公开(公告)日：2020-06-23

申请号：US15715495

申请日：2017-09-26

Applicant: Samsung Display Co., Ltd.

Inventor： Jaewoo Jeong ,  Hyungue Kim ,  Jongjun Baek

IPC: H01L27/32 ,  H01L27/12 ,  H01L21/3213 ,  H01L21/311 ,  H01L51/00 ,  H01L51/52 ,  H01L21/027

Abstract: A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.

公开(公告)号：US12040186B2

公开(公告)日：2024-07-16

申请号：US17404231

申请日：2021-08-17

Applicant: Samsung Display Co., Ltd.

Inventor： Hiroshi Okumura ,  Jongjun Baek ,  Byung Soo So

IPC: B23K26/06 ,  G02B5/04 ,  G02B26/10 ,  H01L21/02

CPC classification number: H01L21/02691 ,  G02B5/045 ,  G02B26/101 ,  H01L21/02678

Abstract: A laser irradiation apparatus includes a laser light source which emits a laser beam, a first lens through which the laser beam emitted from the laser light source passes, a first scanner which reflects the laser beam passing through the first lens and changes a direction of the laser beam, a second scanner which reflects the laser beam deflected by the first scanner and changes a direction of the laser beam, a plurality of second lenses through which the laser beam deflected by the second scanner passes, where at least one of the plurality of second lenses is configured to vibrate in one direction, and an optical element through which the laser beam passing through the plurality of second lenses passes, where the optical element is configured to correct an incident angle of the laser beam incident a substrate.

公开(公告)号：US20230395728A1

公开(公告)日：2023-12-07

申请号：US17845301

申请日：2022-06-21

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jongoh Seo ,  Janghyun Kim ,  Jongjun Baek ,  Dongmin Lee

IPC: H01L29/786 ,  H01L29/66 ,  H10K59/121 ,  H10K59/80

CPC classification number: H01L29/78696 ,  H01L29/6675 ,  H10K59/1213 ,  H10K59/1216 ,  H10K59/873

Abstract: Provided are a thin-film transistor substrate, a manufacturing method thereof, and a display apparatus. The thin-film transistor substrate includes: a substrate; a buffer layer on the substrate; a semiconductor layer arranged on the buffer layer and including a first conductive area, a second conductive area, and a channel area between the first conductive area and the second conductive area; a first dopant doped in an upper portion of the channel area at a first concentration; a second dopant doped in a lower portion of the channel area at a second concentration and being of a different type from a type of the first dopant; a gate insulating layer covering the semiconductor layer; and a gate electrode overlapping the channel area in a plan view and disposed on the gate insulating layer.

公开(公告)号：US11672164B2

公开(公告)日：2023-06-06

申请号：US17077648

申请日：2020-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Minkyung Kang ,  Byungsoo So ,  Jaewoo Jeong ,  Jongjun Baek ,  Hiroshi Okumura

IPC: H01L51/00 ,  H01L27/32 ,  H01L51/56

CPC classification number: H01L51/0097 ,  H01L27/3244 ,  H01L51/56 ,  H01L2251/5338

Abstract: A method of manufacturing a display apparatus includes forming a first substrate on a support substrate; forming a first barrier layer on the first substrate; and forming a conductive layer by implanting n-type impurities or p-type impurities in the first barrier layer and at least a portion of the first substrate. A display apparatus includes a conductive layer arranged on a substrate and a barrier layer arranged on the conductive layer. The conductive layer is doped with n-type impurities when the first barrier layer is doped with n-type impurities, and the conductive layer is doped with p-type impurities when the first barrier layer is doped with p-type impurities.

公开(公告)号：US11430839B2

公开(公告)日：2022-08-30

申请号：US16843368

申请日：2020-04-08

Applicant: Samsung Display Co., Ltd.

Inventor： Jongjun Baek ,  Jaewoo Jeong ,  Byungsoo So

IPC: H01L27/32 ,  H01L29/66 ,  H01L51/00 ,  H01L21/02 ,  H01L21/225

Abstract: A display panel includes: a base substrate; a circuit layer on the base substrate; and a display element layer on the circuit layer, wherein the circuit layer includes an active layer on the base substrate and containing boron and fluorine; a control electrode on the active layer; and a control electrode insulation layer between the active layer and the control electrode, wherein the active layer includes: a core layer in which a concentration of the boron is greater than a concentration of the fluorine; and a surface layer on the core layer and in which a concentration of the fluorine is greater than a concentration of the boron.

公开(公告)号：US11227764B2

公开(公告)日：2022-01-18

申请号：US16592087

申请日：2019-10-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hiroshi Okumura ,  Jongjun Baek ,  Dong-Sung Lee

IPC: H01L21/02 ,  H01L21/67

Abstract: A laser irradiation method includes a first scanning wherein a laser beam is scanned in a first region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using a spot laser beam, and a second scanning wherein laser beam is scanned in a second region having a width in the X direction and a length in the Y direction by moving a laser irradiation area on the surface of the substrate along the Y direction using the spot laser beam. A center of the second region is spaced apart from a center of the first region in the X direction.

公开(公告)号：US11164932B2

公开(公告)日：2021-11-02

申请号：US16871185

申请日：2020-05-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jaewoo Jeong ,  Hyungue Kim ,  Jongjun Baek

IPC: H01L27/32 ,  H01L27/12 ,  H01L21/3213 ,  H01L21/311 ,  H01L51/00 ,  H01L51/52 ,  H01L21/027

Abstract: A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.