Laser crystallization system and laser crystallization method

    公开(公告)号:US11171000B2

    公开(公告)日:2021-11-09

    申请号:US16864812

    申请日:2020-05-01

    Abstract: A laser crystallization system includes a transfer part that transfers a substrate on which an amorphous silicon thin film is deposited into a chamber, a laser irradiation part that irradiates an excimer laser to the substrate for crystallization of the amorphous silicon thin film in the chamber, a stage that supports the substrate in the chamber, a measuring part that measures a light transmittance value of the substrate, and a controller that controls the laser irradiation part to irradiate the excimer laser to the substrate when the light transmittance value is equal to or lower than a reference transmittance value and controls the laser irradiation part not to irradiate the excimer laser to the substrate when the light transmittance value is higher than the reference transmittance value.

    Display device and method of manufacturing the same

    公开(公告)号:US11145703B2

    公开(公告)日:2021-10-12

    申请号:US16677042

    申请日:2019-11-07

    Abstract: A display device may include a substrate, a first layer on the substrate, the first layer including a first portion having a first thickness and a second portion having a second thickness greater than the first thickness, a second layer on the first layer, an active pattern on the second layer, the active pattern overlapping only the first portion of the first layer, a gate electrode on the active pattern, a source electrode and a drain electrode on the gate electrode and connected to the active pattern, a first electrode connected to one of the source electrode and the drain electrode, a pixel defining layer on the first electrode, the pixel defining layer having an opening portion exposing at least a portion of the first electrode, an emission layer in the opening portion on the first electrode, and a second electrode on the emission layer.

    DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240099078A1

    公开(公告)日:2024-03-21

    申请号:US18243004

    申请日:2023-09-06

    CPC classification number: H10K59/124 H10K59/1201

    Abstract: A display apparatus includes: a substrate; a buffer layer on the substrate; a first semiconductor layer on the buffer layer; a first gate insulating layer on the first semiconductor layer; a first metal layer on the first gate insulating layer; a second gate insulating layer on the first metal layer; a second metal layer on the second gate insulating layer; a first interlayer insulating layer on the second metal layer; and a first dopant doped in at least one of the second gate insulating layer or the first interlayer insulating layer.

    Display device and method of manufacturing the same

    公开(公告)号:US11610919B2

    公开(公告)日:2023-03-21

    申请号:US17240847

    申请日:2021-04-26

    Abstract: A display device may include a substrate, a buffer layer on the substrate, a first active pattern on the buffer layer, the first active pattern having a first thickness, a second active pattern on the buffer layer spaced from the first active pattern and having a second thickness smaller than the first thickness, a first gate insulating layer on the first active pattern and the second active pattern, a first gate electrode on the first gate insulating layer, the first gate electrode overlapping the first active pattern, and a second gate electrode on the first gate insulating layer, the second gate electrode overlapping the second active pattern.

Patent Agency Ranking