公开(公告)号：US20210227831A1

公开(公告)日：2021-07-29

申请号：US17156188

申请日：2021-01-22

Applicant: SINTX Technologies, Inc.

Inventor： Bhajanjit Singh Bal ,  Bryan J. McEntire ,  Ryan M. Bock

IPC: A01N59/00 ,  A01N25/10 ,  A01N25/12 ,  A61K6/889 ,  A61K6/76 ,  A61C13/087

Abstract: Disclosed herein are antifungal composites, devices, and methods to reduce or prevent a fungus from growing on the antifungal composite. The antifungal composite and devices thereof may include a biocompatible polymer and a Si3N4 powder loaded in at least a portion of the biocompatible polymer. The polymer may be a thermoplastic polymer such as a poly(methyl methacrylate) (PMMA) resin and the Si3N4 powder may be present in a concentration of about 1 vol. % to about 30 vol. % in the thermoplastic polymer.

公开(公告)号：US12162807B2

公开(公告)日：2024-12-10

申请号：US17634141

申请日：2020-06-11

Applicant: SINTX TECHNOLOGIES, INC.

Inventor： Bryan J. McEntire ,  Bhajanjit Singh Bal ,  Ryan M. Bock

IPC: C04B41/00 ,  A61F2/30 ,  B23K26/00 ,  B23K26/0622 ,  B23K26/342 ,  C04B35/10 ,  C04B41/45 ,  C04B41/50 ,  C04B41/53 ,  C04B41/87 ,  C04B41/91 ,  B23K103/00

Abstract: Disclosed herein are methods for functionalizing the surface of a biomedical implant. The biomedical implant may be a zirconia-toughened alumina implant surface functionalized with silicon nitride powder for promoting osteogenesis.

公开(公告)号：US12017912B2

公开(公告)日：2024-06-25

申请号：US18062681

申请日：2022-12-07

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: C01B21/068 ,  A01C1/06 ,  A01N25/32 ,  A01N59/02

CPC classification number: C01B21/068 ,  A01C1/06 ,  A01N25/32 ,  A01N59/02

Abstract: Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.

公开(公告)号：US11591217B2

公开(公告)日：2023-02-28

申请号：US17521270

申请日：2021-11-08

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: C01B21/068 ,  A01C1/06 ,  A01N59/02 ,  A01N25/32

Abstract: Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.

公开(公告)号：US20210227832A1

公开(公告)日：2021-07-29

申请号：US17230395

申请日：2021-04-14

Applicant: SINTX TECHNOLOGIES, INC.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: A01N59/06 ,  A01N59/00 ,  A41D31/30 ,  A61L31/08 ,  A61L31/16

Abstract: Various embodiments related to systems, methods, and articles for rapid inactivation of SARS-CoV-2 by silicon nitride and aluminum nitride are disclosed herein.

公开(公告)号：US20200079651A1

公开(公告)日：2020-03-12

申请号：US16550605

申请日：2019-08-26

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: C01B21/068 ,  A01N25/32 ,  A01N59/02 ,  A01C1/06

Abstract: Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.

公开(公告)号：US20240081442A1

公开(公告)日：2024-03-14

申请号：US18512553

申请日：2023-11-17

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: A41D13/11 ,  D06B13/00 ,  D06M11/77

CPC classification number: A41D13/1192 ,  D06B13/00 ,  D06M11/77 ,  D06M2101/20

Abstract: Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.

公开(公告)号：US20220322768A1

公开(公告)日：2022-10-13

申请号：US17839063

申请日：2022-06-13

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock ,  Bhajanjit Singh Bal

IPC: A41D13/11 ,  A61M16/06 ,  B32B5/02 ,  B32B33/00 ,  B32B17/10

Abstract: Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 30 wt. % to about 50 wt. %.

公开(公告)号：US20220304811A1

公开(公告)日：2022-09-29

申请号：US17839092

申请日：2022-06-13

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Ryan M. Bock

IPC: A61F2/30 ,  A61L27/10 ,  A61F2/34

Abstract: Methods for improving the wear performance of silicon nitride and/or other ceramic materials, particularly to make them more suitable for use in manufacturing biomedical implants.

公开(公告)号：US20220125990A1

公开(公告)日：2022-04-28

申请号：US17509541

申请日：2021-10-25

Applicant: SINTX Technologies, Inc.

Inventor： Bryan J. McEntire ,  Bhajanjit Singh Bal ,  Ryan M. Bock

IPC: A61L27/10 ,  C04B35/593 ,  C04B35/645 ,  A61L27/54

Abstract: Methods and systems for manufacturing a ceramic or glass material component supersaturated in nitrogen are disclosed. The method for manufacturing a component typically comprises receiving the ceramic or glass material within a containment vessel; simultaneously heating and applying isostatic pressure to the ceramic or glass material within the containment vessel to a first temperature and a first pressure using pressurizing nitrogen gas; holding the first temperature and the first pressure for a period of time; cooling the ceramic or glass material within the containment vessel to a second temperature while maintaining the first pressure; and depressurizing the containment vessel to a second pressure.