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公开(公告)号：US20230263166A1
公开(公告)日：2023-08-24
申请号：US18310312
申请日：2023-05-01
CPC分类号： A01N59/00 , A01N25/10 , A01N25/12 , A61K6/76 , A61C13/087 , A61K6/889 , A61C2201/00
摘要： Disclosed herein are antifungal composites, devices, and methods to reduce or prevent a fungus from growing on the antifungal composite. The antifungal composite and devices thereof may include a biocompatible polymer and a Si3N4 powder loaded in at least a portion of the biocompatible polymer. The polymer may be a thermoplastic polymer such as a poly(methyl methacrylate) (PMMA) resin and the Si3N4 powder may be present in a concentration of about 1 vol. % to about 30 vol. % in the thermoplastic polymer.
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公开(公告)号：US20230099133A1
公开(公告)日：2023-03-30
申请号：US18062681
申请日：2022-12-07
IPC分类号： C01B21/068 , A01C1/06 , A01N59/02 , A01N25/32
摘要： Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.
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3.发明申请公开(公告)号：US20220126369A1
公开(公告)日：2022-04-28
申请号：US17509690
申请日：2021-10-25
IPC分类号： B22F10/28 , B22F12/41 , B22F10/66 , B22F10/62 , B22F12/58 , B22F1/00 , B22F10/68 , B33Y10/00 , B33Y40/10 , B33Y40/20 , B33Y70/00 , B33Y80/00
摘要： Methods and systems for manufacturing a component are disclosed. The method for manufacturing a component typically comprises blending a silicon nitride powder and a titanium alloy powder to form a combined powder; receiving the combined powder within a build chamber having a platform and a laser beam source configured to produce a laser beam; spreading a plurality of layers of the combined powder over the platform; fusing at least a portion of the combined powder in each of the plurality of layers using the laser beam, wherein each one of the plurality of layers is spread and the portion of the combined powder fused before another one of the plurality of layers is spread, wherein the laser beam is automatically guided by a 3D model of the component; and removing the combined powder that was not fused.
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公开(公告)号：US20220095624A1
公开(公告)日：2022-03-31
申请号：US17546837
申请日：2021-12-09
摘要： Described herein are antipathogenic compositions comprising a nitride chosen from aluminum nitride, boron nitride, chromium nitride, cerium nitride, hafnium nitride, lanthanum nitride, phosphorous nitride, sulfur nitride, tantalum nitride, titanium nitride, vanadium nitride, yttrium nitride, zirconium nitride, silicon nitride, or combinations thereof, and methods of using said compositions to inactivate viruses, bacteria, and/or fungi.
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公开(公告)号：US20210235791A1
公开(公告)日：2021-08-05
申请号：US17230284
申请日：2021-04-14
摘要： Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.
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公开(公告)号：US11857001B2
公开(公告)日：2024-01-02
申请号：US17230284
申请日：2021-04-14
IPC分类号： D06B13/00 , D06M13/00 , A41D13/11 , D06M11/77 , D06M101/20
CPC分类号： A41D13/1192 , D06B13/00 , D06M11/77 , A41D2500/30 , D06M2101/20 , D10B2501/04
摘要： Described herein is an antiviral face mask and methods of use thereof to inactivate a virus in contact with the face mask. The face mask may include a fibrous material with silicon nitride powder impregnated therein and a layer surrounding the fibrous material. In some embodiments, silicon nitride is present in the fibrous material at a concentration of about 1 wt. % to about 15 wt. %.
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公开(公告)号：US20230093682A1
公开(公告)日：2023-03-23
申请号：US17934402
申请日：2022-09-22
IPC分类号： C04B35/584 , A61L27/10
摘要： The present disclosure relates to the manufacture of silicon nitride implants with increased surface roughness and porosity.
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公开(公告)号：US20220322676A1
公开(公告)日：2022-10-13
申请号：US17715642
申请日：2022-04-07
摘要： Disclosed herein are systems and methods for physical vapor deposition silicon nitride coatings. The methods thereof may include a creating a magnetically confined plasma near a surface of a silicon nitride. The plasma may cause positively charged energetic ions from the plasma to collide with negatively charged silicon nitride atoms, causing the silicon nitride atoms to be sputtered and deposited on a substrate such as titanium. The silicon nitride coating may be nitrogen-rich silicon nitride or silicon-rich silicon nitride.
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公开(公告)号：US20220055899A1
公开(公告)日：2022-02-24
申请号：US17521270
申请日：2021-11-08
IPC分类号： C01B21/068 , A01C1/06 , A01N59/02 , A01N25/32
摘要： Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.
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公开(公告)号：US11192787B2
公开(公告)日：2021-12-07
申请号：US16550605
申请日：2019-08-26
IPC分类号： C01B21/068 , A01N59/02 , A01N25/32 , A01C1/06
摘要： Disclosed herein are compositions, devices and methods for inactivating viruses, bacteria, and fungi. The compositions, methods, and devices may include coatings or slurries such as silicon nitride powder coatings or slurries for the inactivation of viruses, bacteria, and/or fungi.
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