公开(公告)号：US20180254211A1

公开(公告)日：2018-09-06

申请号：US15752863

申请日：2016-08-09

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Mamoru KOSAKAI ,  Shinichi MAETA ,  Keisuke MAEDA

IPC: H01L21/683 ,  H01L21/3065 ,  H02N13/00 ,  B23Q3/15 ,  H01L21/67

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/3065 ,  H01L21/67109 ,  H01L21/67248 ,  H01L21/683 ,  H01L21/6835 ,  H02N13/00

Abstract: An electrostatic chuck device includes an electrostatic chuck member and a temperature controlling base member. The electrostatic chuck member has a ceramic plate having a mounting surface on which a plate-shaped sample is mounted, and an electrode for electrostatic attraction provided on the other surface on the side opposite the mounting surface of the ceramic plate. The temperature controlling base member is disposed on the surface on the side opposite the ceramic plate side of the electrode for electrostatic attraction and cools the electrostatic chuck member. The ceramic plate has a dike portion which extends to the temperature controlling base member side and surrounds the electrode for electrostatic attraction, the temperature controlling base member has a groove portion accommodating an end part of the dike portion, and a space between the groove portion and the dike portion is filled with a filling part formed of a resin material.