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11.发明授权Mask for deposition and method for manufacturing organic light emitting diode display using the same 有权用于沉积的掩模和用于制造使用其的有机发光二极管显示器的方法公开(公告)号：US09172064B2
公开(公告)日：2015-10-27
申请号：US13899531
申请日：2013-05-21
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jung-Min Lee , Choong-Ho Lee
CPC classification number: H01L51/56 , C23C14/042 , H01L51/0011
Abstract: A deposition mask for forming an organic layer pattern of an organic light emitting diode (OLED) display includes a base member having a first surface facing a substrate of the OLED display, and a second surface facing a side opposite to the first surface, and including a plurality of openings passing through the first surface and the second surface for forming the organic layer pattern. The opening has a pair of first side walls and a pair of second side walls. Each side wall of the openings has an inclination surface inclined with respect to a thickness direction of the base member, and when measuring an inclination angle of the inclination surface with reference to the first surface of the base member, the inclination angle of the first side wall and the inclination angle of the second side wall are different from each other.
Abstract translation: 用于形成有机发光二极管（OLED）显示器的有机层图案的沉积掩模包括具有面向OLED显示器的基板的第一表面的基底构件和面向与第一表面相对的一侧的第二表面，并且包括 穿过第一表面和第二表面的多个开口以形成有机层图案。 开口具有一对第一侧壁和一对第二侧壁。 开口的每个侧壁具有相对于基底构件的厚度方向倾斜的倾斜表面，并且当测量相对于基底构件的第一表面的倾斜表面的倾斜角度时，第一侧的倾斜角 壁和第二侧壁的倾斜角度彼此不同。
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公开(公告)号：US11920233B2
公开(公告)日：2024-03-05
申请号：US18173688
申请日：2023-02-23
Applicant: Samsung Display Co., Ltd.
Inventor： Choong-Ho Lee , Jung-Min Lee
CPC classification number: C23C14/04 , C23C14/24 , C23C14/243 , C23C16/042 , C23C16/04 , Y10T29/49826 , Y10T29/49828
Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
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公开(公告)号：US10456859B2
公开(公告)日：2019-10-29
申请号：US15987218
申请日：2018-05-23
Applicant: Samsung Display Co., Ltd. , Fraunhofer Gesellschaft zur Foerderung der angewandten Forschung e.V.
Inventor： Jung-Min Lee , Alexander Olowinsky , Elmar Gehlen , Heidrun Kind , Arnold Gillner
Abstract: A laser beam irradiation apparatus including a laser source configured to emit light; a collimator configured to collimate the emitted light; a scanner configured to adjust the collimated light to change an irradiation direction thereof; a first lens part configured to focus the adjusted light to irradiate a laser beam on a sealing part; a camera configured to receive visible light passing through the scanner; a heat sensing part configured to receive infrared (IR) light passing through the scanner; and a control part configured to control a moving direction and an intensity of the laser beam.
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公开(公告)号：US10010973B2
公开(公告)日：2018-07-03
申请号：US14293495
申请日：2014-06-02
Applicant: Samsung Display Co., Ltd. , Fraunhofer Gesellschaft zur Foerderung der angewandten Forschung e.V.
Inventor： Jung-Min Lee , Alexander Olowinsky , Elmar Gehlen , Heidrun Kind , Arnold Gillner
CPC classification number: B23K26/02 , H01L22/12 , H01L51/5246 , H01L51/56
Abstract: Provided is a laser beam irradiation apparatus. The laser beam irradiation apparatus includes a laser source configured to emit light; a collimator configured to collimate the emitted light; a scanner configured to adjust the collimated light to change an irradiation direction thereof; a first lens part configured to focus the adjusted light to irradiate a laser beam on a sealing part; a camera configured to receive visible light passing through the scanner; a heat sensing part configured to receive infrared (IR) light passing through the scanner; and a control part configured to control a moving direction and an intensity of the laser beam.
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公开(公告)号：US20180119267A1
公开(公告)日：2018-05-03
申请号：US15857365
申请日：2017-12-28
Applicant: Samsung Display Co., Ltd.
Inventor： Choong-Ho Lee , Jung-Min Lee
CPC classification number: C23C14/04 , C23C14/24 , C23C14/243 , C23C16/04 , C23C16/042 , Y10T29/49826 , Y10T29/49828
Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
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Patent Agency Ranking
公开(公告)号：US09660191B2
公开(公告)日：2017-05-23
申请号：US14617861
申请日：2015-02-09
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choong-Ho Lee , Jung-Min Lee , Jun-Sik Oh
IPC: C23C14/24 , C23C14/26 , C23C16/455 , H01L51/00 , C23C14/04 , C23C14/12 , H01L51/56 , H05B33/10 , C23C16/46 , H01L51/50
CPC classification number: H01L51/001 , C23C14/042 , C23C14/12 , C23C14/24 , C23C14/243 , C23C14/246 , C23C14/26 , C23C16/455 , C23C16/46 , H01L51/0008 , H01L51/5012 , H01L51/56 , H05B33/10
Abstract: A thin film deposition apparatus including a deposition source having a crucible to contain a deposition material and a heater to heat and vaporize the deposition material; a nozzle unit disposed at a side of the deposition source along a first direction and having a plurality of nozzle slits to discharge the deposition material that was vaporized; a plurality of emission coefficient increasing units disposed toward the nozzle unit within the deposition source and increasing a quantity of motion of the deposition material that is discharged toward the nozzle unit; a patterning slit sheet disposed opposite to the nozzle unit and having a plurality of patterning slits arranged along the first direction; and a barrier plate assembly disposed between the nozzle unit and the patterning slit sheet along the first direction, and having a plurality of barrier plates that partition a space between the nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.
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公开(公告)号：US20150368784A1
公开(公告)日：2015-12-24
申请号：US14838219
申请日：2015-08-27
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choong-Ho Lee , Jung-Min Lee
CPC classification number: C23C14/04 , C23C14/24 , C23C14/243 , C23C16/04 , C23C16/042 , Y10T29/49826 , Y10T29/49828
Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
Abstract translation: 一种薄膜沉积装置，用于大规模生产大型基板并提高制造产量。 薄膜沉积设备包括沉积源; 第一喷嘴，其设置在所述沉积源的一侧，并且包括沿第一方向布置的多个第一狭缝; 第二喷嘴，与所述第一喷嘴相对设置并且包括沿所述第一方向布置的多个第二狭缝; 以及阻挡壁组件，其包括沿所述第一方向布置的多个阻挡壁，以便分隔所述第一喷嘴和所述第二喷嘴之间的空间。
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公开(公告)号：US20140290847A1
公开(公告)日：2014-10-02
申请号：US13953661
申请日：2013-07-29
Applicant: LTS Co., Ltd. , Samsung Display Co., Ltd.
Inventor： Jung-Min Lee , Young-Kwan Kim
CPC classification number: G02B27/0905 , G02B27/0927 , G02B27/0944 , H01L51/5246 , H01L51/56 , H01L2933/0008
Abstract: An optical system includes an optical path, a first lens unit that changes light emitted from an end of the optical path to parallel light, a second lens unit that allows the parallel light to be focused, and a diffractive optical element (DOE) that changes light passing through the second lens unit to light having a cross-section with a predetermined shape.
Abstract translation: 光学系统包括光路，将从光路的端部发射的光改变为平行光的第一透镜单元，允许平行光聚焦的第二透镜单元和改变的衍射光学元件（DOE） 通过第二透镜单元的光线具有具有预定形状的横截面的光。
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公开(公告)号：US20240200181A1
公开(公告)日：2024-06-20
申请号：US18595053
申请日：2024-03-04
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Choong-Ho Lee , Jung-Min Lee
CPC classification number: C23C14/04 , C23C14/24 , C23C14/243 , C23C16/042 , C23C16/04 , Y10T29/49826 , Y10T29/49828
Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
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公开(公告)号：US11624107B2
公开(公告)日：2023-04-11
申请号：US16907695
申请日：2020-06-22
Applicant: Samsung Display Co., Ltd.
Inventor： Choong-Ho Lee , Jung-Min Lee
Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.
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