Clothes care apparatus
    12.
    发明授权

    公开(公告)号:US11371183B2

    公开(公告)日:2022-06-28

    申请号:US17009274

    申请日:2020-09-01

    Abstract: A clothes care apparatus including a main body including a clothes care room, a support device arranged inside the clothes care room and configured to support clothes, and a steam generating device configured to supply steam into the clothes care room, wherein the support device includes a first support member, and a second support member and a third support member that are arranged in a first direction with respect to the first support member, the first support member and each of the second support member and the third support member are separated by a first separation distance, the second support member and the third support member are separated by a second separation distance in a second direction which is perpendicular to the first direction, wherein each of the first separation distances, and the second separation distance are variable to, when the clothes are supported on the support device and steam is supplied by the steam generating device, prevent wrinkles.

    SEMICONDUCTOR DEVICE
    14.
    发明公开

    公开(公告)号:US20240153851A1

    公开(公告)日:2024-05-09

    申请号:US18406602

    申请日:2024-01-08

    CPC classification number: H01L23/485 H01L23/481 H01L23/535 H01L24/29 H01L24/45

    Abstract: A semiconductor device includes a semiconductor substrate having a first surface adjacent to an active layer; a first insulating layer disposed on the first surface of the semiconductor substrate; a second insulating layer disposed on the first insulating layer; an etch stop structure interposed between the first insulating layer and the second insulating layer and including a plurality of etch stop layers; a contact wiring pattern disposed inside the second insulating layer and surrounded by at least one etch stop layer of the plurality of etch stop layers; and a through electrode structure configured to pass through the semiconductor substrate, the first insulating layer, and at least one etch stop layer of the plurality of etch stop layers in a vertical direction and contact the contact wiring pattern.

    INTEGRATED CIRCUIT DEVICE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME

    公开(公告)号:US20220367320A1

    公开(公告)日:2022-11-17

    申请号:US17560495

    申请日:2021-12-23

    Abstract: An integrated circuit device includes a semiconductor substrate having a first surface and a second surface opposite to the first surface, a first insulating layer on the first surface of the semiconductor substrate, an electrode landing pad positioned on the first surface of the semiconductor substrate and having a sidewall surrounded by the first insulating layer, a top surface apart from the first surface of the semiconductor substrate, and a bottom surface opposite to the top surface, and a through-electrode configured to penetrate through the semiconductor substrate and contact the top surface of the electrode landing pad, wherein a horizontal width of the top surface of the electrode landing pad is less than a horizontal width of the bottom surface of the electrode landing pad and greater than a horizontal width of a bottom surface of the through-electrode in contact with the top surface of the electrode landing pad.

    Humidifier
    16.
    发明授权

    公开(公告)号:US11466876B2

    公开(公告)日:2022-10-11

    申请号:US17117649

    申请日:2020-12-10

    Abstract: Disclosed herein is a humidifier including an improved structure of a water collection tank. The humidifier includes a main body, a water supply tank provided in an upper portion of the main body, a humidifying fabric arranged in an inside of the main body and disposed below the water supply tank to receive water, a fan configured to move air through the humidifying fabric, a water collection tank configured to collect water from the humidifying fabric, a pump configured to pump water from the water collection tank to the water supply tank, and a humidifier lower cover coupleable to and decoupleable from a lower end of the main body. The water collection tank includes a water collection tank top cover provided in an upper portion of the water collection tank, and a water collection tank lower cover configured to be accessible through the lower end of the main body.

    SEMICONDUCTOR DEVICE
    17.
    发明申请

    公开(公告)号:US20210028112A1

    公开(公告)日:2021-01-28

    申请号:US16863126

    申请日:2020-04-30

    Abstract: A semiconductor device includes a substrate having a first surface and a second surface opposite to each other, and having an active region located on the first surface and defined by a first isolation region; a plurality of active fins arranged on the active region, extending in a first direction, and defined by a second isolation region having a second depth smaller than a first depth of the first isolation region; a buried conductive wiring in a trench adjacent to the plurality of active fins, and extending in a direction of the trench; a filling insulation portion in the trench, and having the buried conductive wiring therein; an interlayer insulation layer on the first and second isolation regions and on the buried conductive wiring; a contact structure penetrating the interlayer insulation layer, and contacting the buried conductive wiring; and a conductive through structure extending through the substrate from the second surface to the trench, and contacting the buried conductive wiring.

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