SEMICONDUCTOR DEVICE
    3.
    发明申请

    公开(公告)号:US20210375722A1

    公开(公告)日:2021-12-02

    申请号:US17147927

    申请日:2021-01-13

    Abstract: A semiconductor device includes a substrate having a first surface on which an active region is disposed, and a second surface opposite the first surface, a buried conductive line extending in one direction and having a portion buried in the active region, an insulating portion covering the buried conductive line, a contact structure disposed on the insulating portion and connected to the buried conductive line, a through-hole extending from the second surface to the insulating portion and exposing the buried portion of the buried conductive line, an insulating isolation film disposed on a side surface of the buried conductive line and exposing a bottom surface of the buried portion and a side surface adjacent to the bottom surface, a through-via contacting the bottom surface and the adjacent side surface of the buried conductive line, an insulating liner surrounding the through-via.

    Washing machine
    8.
    外观设计

    公开(公告)号:USD1046329S1

    公开(公告)日:2024-10-08

    申请号:US29888934

    申请日:2023-04-06

    Designer: Jinnam Kim Sujin Oh

    Abstract: FIG. 1 is a front perspective view of a washing machine, showing our new design;
    FIG. 2 is a front view thereof;
    FIG. 3 is a rear view thereof;
    FIG. 4 is a left-side view thereof;
    FIG. 5 is a right-side view thereof;
    FIG. 6 is a top view thereof; and,
    FIG. 7 is a bottom view thereof.
    The broken lines in the figures depict portions of a washing machine that form no part of the claimed design.

    SEMICONDUCTOR DEVICE
    9.
    发明申请

    公开(公告)号:US20220336330A1

    公开(公告)日:2022-10-20

    申请号:US17855902

    申请日:2022-07-01

    Abstract: A semiconductor device includes a substrate having a first surface on which an active region is disposed, and a second surface opposite the first surface, a buried conductive line extending in one direction and having a portion buried in the active region, an insulating portion covering the buried conductive line, a contact structure disposed on the insulating portion and connected to the buried conductive line, a through-hole extending from the second surface to the insulating portion and exposing the buried portion of the buried conductive line, an insulating isolation film disposed on a side surface of the buried conductive line and exposing a bottom surface of the buried portion and a side surface adjacent to the bottom surface, a through-via contacting the bottom surface and the adjacent side surface of the buried conductive line, an insulating liner surrounding the through-via.

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