公开(公告)号：US11698590B2

公开(公告)日：2023-07-11

申请号：US17709534

申请日：2022-03-31

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hoseok Song ,  Sunghyup Kim ,  Injae Lee ,  Jeonggil Kim

IPC: G03F7/20 ,  G03F7/00 ,  H05G2/00

CPC classification number: G03F7/70175 ,  G03F7/702 ,  G03F7/70033 ,  G03F7/70925 ,  G03F7/70975 ,  H05G2/008

Abstract: A collector mirror for an extreme ultraviolet (EUV) light generator includes a first mirror in a vessel, the vessel being configured to receive a material and a laser beam for generating the EUV light, a second mirror surrounding the first mirror, and a detachable third mirror between the first mirror and the second mirror, the third mirror having an inner diameter that is not smaller than an outer diameter of the first mirror, and an outer diameter that is not larger than an inner diameter of the second mirror.

公开(公告)号：US11454882B2

公开(公告)日：2022-09-27

申请号：US16922328

申请日：2020-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinhwan Lee ,  Jeonggil Kim ,  Sunghyup Kim

IPC: G03F1/64 ,  G03F1/62

Abstract: A pellicle for a reflective mask includes a pellicle body, a pellicle frame below the pellicle body to support the pellicle body, and a pattern structure in at least a part of a surface of the pellicle body, wherein the pattern structure includes a plurality of patterns.

公开(公告)号：US11231656B2

公开(公告)日：2022-01-25

申请号：US16835708

申请日：2020-03-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sunghyup Kim ,  Ho Yu ,  Jeonggil Kim ,  Minseok Choi

IPC: G03F7/20 ,  H05G2/00 ,  G21K1/06

Abstract: A target debris collection device for extreme ultraviolet (EUV) light source apparatus, includes a baffle body extending within an EUV vessel between a collector and an outlet port of the EUV vessel to allow EUV light reflected from the collector to pass through an internal transmissive region thereof, a discharge plate provided in a first end portion of the baffle body adjacent to the collector to collect the target material debris on an inner surface of the baffle body, a guide structure to guide the target material debris collected in the discharge plate to a collection tank, and a first heating member provided in the guide structure to prevent the target material debris from being solidified.