Apparatus for removing residue of EUV light source vessel

    公开(公告)号:US11822260B2

    公开(公告)日:2023-11-21

    申请号:US17939293

    申请日:2022-09-07

    CPC classification number: G03F7/70925 G03F7/70033 G03F7/7085 G03F7/70975

    Abstract: An apparatus for removing a residue of an EUV light source vessel including an internal side surface having a curved surface is provided. The apparatus includes a frame portion configured to be disposed on a bottom surface of an EUV light source vessel and a head portion above the frame portion. The head portion is configured to be rotatably moved on a circular trajectory while maintaining a desired (and/or alternatively predetermined) distance from the curved surface of the EUV light source vessel. The head portion may have a heating member configured to emit heat toward the curved surface of the EUV light source vessel. The heating member may have a shape curved in an arc corresponding to a portion of the circular trajectory.

    ELECTRONIC APPARATUS AND CONTROLLING METHOD THEREOF

    公开(公告)号:US20210209374A1

    公开(公告)日:2021-07-08

    申请号:US17140706

    申请日:2021-01-04

    Abstract: A controlling method of an electronic apparatus may include: obtaining image data and metadata regarding the image data, the image data comprising a first image frame and a second image frame that is subsequent to the first image frame; obtaining information regarding a region of interest of the first image frame by inputting the first image frame to a first neural network model; obtaining a similarity between the first image frame and the second image frame based on motion vector information included in the metadata; and detecting whether there is a manipulated area in the second image frame based on the similarity.

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