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公开(公告)号:US20210050264A1
公开(公告)日:2021-02-18
申请号:US16871189
申请日:2020-05-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Donghoon WON , Jaeeun Lee , Yeongkwon Ko , Junyeong Heo
IPC: H01L21/78 , H01L21/268
Abstract: There is provided a method of dicing a semiconductor wafer, which includes providing a semiconductor substrate having a plurality of integrated circuit regions on an active surface of the semiconductor substrate, a dicing regions provided between adjacent integrated circuit regions of the plurality of integrated circuit regions, and a metal shield layer provided on the active surface across at least a portion of the adjacent integrated circuit regions and the dicing region, forming a modified layer by irradiating laser to an inside of the semiconductor substrate along the dicing region, propagating a crack from the modified layer in a direction perpendicular to a major-axial direction of the metal shield layer by polishing an inactive surface opposing the active surface of the semiconductor substrate and forming semiconductor chips by separating the adjacent integrated circuit regions, respectively, based on the crack propagating from the modified layer.
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12.
公开(公告)号:US20240312823A1
公开(公告)日:2024-09-19
申请号:US18371774
申请日:2023-09-22
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yeongkwon Ko , Seunghun Shin , Jihun Jung , Junyeong Heo
IPC: H01L21/683 , H01L21/67 , H01L21/8258
CPC classification number: H01L21/6836 , H01L21/67092 , H01L21/67132 , H01L21/8258 , H01L2221/68336
Abstract: Provide is a method of splitting a semiconductor chip, the method including performing a back-end-of-line (BEOL) process including forming a plurality of chip areas on a semiconductor substrate, forming a splitting area, which separates the plurality of chip areas, on the semiconductor substrate, and forming a wire on a first surface of the semiconductor substrate, forming a cutout auxiliary layer in the splitting area of the first surface of the semiconductor substrate, and performing mechanical machining by bringing a mechanical machining device into contact with the cutout auxiliary layer, wherein the cutout auxiliary layer is adjacent to the plurality of chip areas.
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公开(公告)号:US12094794B2
公开(公告)日:2024-09-17
申请号:US18054295
申请日:2022-11-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yeongkwon Ko , Seunghun Shin , Junyeong Heo
IPC: H01L23/31 , H01L21/48 , H01L21/56 , H01L21/78 , H01L23/00 , H01L23/498 , H01L25/065
CPC classification number: H01L23/3128 , H01L21/4853 , H01L21/486 , H01L21/565 , H01L21/78 , H01L23/49827 , H01L23/49838 , H01L24/16 , H01L25/0657 , H01L2224/16227 , H01L2225/06513 , H01L2225/06541 , H01L2225/06548 , H01L2225/06586
Abstract: Disclosed are semiconductor packages and/or methods of fabricating the same. The semiconductor package comprises a substrate, a semiconductor chip on the substrate, and a molding layer. The semiconductor chip includes a circuit region and an edge region around the circuit region. The molding layer covers a sidewall of the semiconductor chip. The semiconductor chip includes a reforming layer on the edge region. A top surface of the reforming layer is coplanar with a top surface of the molding layer.
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公开(公告)号:US11694963B2
公开(公告)日:2023-07-04
申请号:US17589301
申请日:2022-01-31
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yeongkwon Ko , Jaeeun Lee , Junyeong Heo
IPC: H01L23/538 , H01L25/065
CPC classification number: H01L23/5385 , H01L23/5386 , H01L25/0657
Abstract: A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposing each other, a plurality of semiconductor elements disposed on the first surface in a device region, an insulating protective layer, and a connection pad. The second surface is divided into a first region overlapping the device region, and a second region surrounding the first region. The insulating protective layer is disposed on the second surface of the semiconductor substrate, and includes an edge pattern positioned in the second region. The edge pattern includes a thinner portion having a thickness smaller than a thickness of a center portion of the insulating protective layer positioned in the first region and/or an open region exposing the second surface of the semiconductor substrate. The connection pad is disposed on the center portion of the insulating protective layer and is electrically connected to the semiconductor elements.
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公开(公告)号:US11515226B2
公开(公告)日:2022-11-29
申请号:US17117588
申请日:2020-12-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yeongkwon Ko , Seunghun Shin , Junyeong Heo
IPC: H01L23/31 , H01L25/065 , H01L23/00 , H01L23/498 , H01L21/48 , H01L21/56 , H01L21/78
Abstract: Disclosed are semiconductor packages and/or methods of fabricating the same. The semiconductor package comprises a substrate, a semiconductor chip on the substrate, and a molding layer. The semiconductor chip includes a circuit region and an edge region around the circuit region. The molding layer covers a sidewall of the semiconductor chip. The semiconductor chip includes a reforming layer on the edge region. A top surface of the reforming layer is coplanar with a top surface of the molding layer.
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公开(公告)号:US11239171B2
公开(公告)日:2022-02-01
申请号:US16922163
申请日:2020-07-07
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yeongkwon Ko , Jaeeun Lee , Junyeong Heo
IPC: H01L29/78 , H01L21/02 , H01L21/764 , H01L29/417 , H01L21/762 , H01L27/088 , H01L23/538 , H01L25/065
Abstract: A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposing each other, a plurality of semiconductor elements disposed on the first surface in a device region, an insulating protective layer, and a connection pad. The second surface is divided into a first region overlapping the device region, and a second region surrounding the first region. The insulating protective layer is disposed on the second surface of the semiconductor substrate, and includes an edge pattern positioned in the second region. The edge pattern includes a thinner portion having a thickness smaller than a thickness of a center portion of the insulating protective layer positioned in the first region and/or an open region exposing the second surface of the semiconductor substrate. The connection pad is disposed on the center portion of the insulating protective layer and is electrically connected to the semiconductor elements.
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