SEMICONDUCTOR SUBSTRATE AND METHOD OF DICING THE SAME

    公开(公告)号:US20210050264A1

    公开(公告)日:2021-02-18

    申请号:US16871189

    申请日:2020-05-11

    Abstract: There is provided a method of dicing a semiconductor wafer, which includes providing a semiconductor substrate having a plurality of integrated circuit regions on an active surface of the semiconductor substrate, a dicing regions provided between adjacent integrated circuit regions of the plurality of integrated circuit regions, and a metal shield layer provided on the active surface across at least a portion of the adjacent integrated circuit regions and the dicing region, forming a modified layer by irradiating laser to an inside of the semiconductor substrate along the dicing region, propagating a crack from the modified layer in a direction perpendicular to a major-axial direction of the metal shield layer by polishing an inactive surface opposing the active surface of the semiconductor substrate and forming semiconductor chips by separating the adjacent integrated circuit regions, respectively, based on the crack propagating from the modified layer.

    Semiconductor device and semiconductor package including the same

    公开(公告)号:US11694963B2

    公开(公告)日:2023-07-04

    申请号:US17589301

    申请日:2022-01-31

    CPC classification number: H01L23/5385 H01L23/5386 H01L25/0657

    Abstract: A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposing each other, a plurality of semiconductor elements disposed on the first surface in a device region, an insulating protective layer, and a connection pad. The second surface is divided into a first region overlapping the device region, and a second region surrounding the first region. The insulating protective layer is disposed on the second surface of the semiconductor substrate, and includes an edge pattern positioned in the second region. The edge pattern includes a thinner portion having a thickness smaller than a thickness of a center portion of the insulating protective layer positioned in the first region and/or an open region exposing the second surface of the semiconductor substrate. The connection pad is disposed on the center portion of the insulating protective layer and is electrically connected to the semiconductor elements.

    Semiconductor device and semiconductor package including the same

    公开(公告)号:US11239171B2

    公开(公告)日:2022-02-01

    申请号:US16922163

    申请日:2020-07-07

    Abstract: A semiconductor device includes a semiconductor substrate having a first surface and a second surface opposing each other, a plurality of semiconductor elements disposed on the first surface in a device region, an insulating protective layer, and a connection pad. The second surface is divided into a first region overlapping the device region, and a second region surrounding the first region. The insulating protective layer is disposed on the second surface of the semiconductor substrate, and includes an edge pattern positioned in the second region. The edge pattern includes a thinner portion having a thickness smaller than a thickness of a center portion of the insulating protective layer positioned in the first region and/or an open region exposing the second surface of the semiconductor substrate. The connection pad is disposed on the center portion of the insulating protective layer and is electrically connected to the semiconductor elements.

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