公开(公告)号：US11575957B2

公开(公告)日：2023-02-07

申请号：US17322148

申请日：2021-05-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Junsik Choi ,  Jungrae Kim ,  Jinyong Park ,  Hyunyong Choi ,  Dongwook Han ,  Jina Kwon ,  Hayeon Kil ,  Kyoungmin Kim ,  Youngjin Kim ,  Sungyong Park ,  Siyoung Park ,  Yongwoo Shin ,  Daesik Yoon ,  Eunjoo Cho ,  Jungyon Cho

IPC: H04N21/422 ,  G06F3/14 ,  G06F3/16

Abstract: A display device and a method capable of rotating a display based on a type of a user command are provided. The display device according to the disclosure receives a user command while first content is displayed on the display, the display being configured to operate in a first orientation while displaying the first content, maintains the display to operate in the first orientation when the received user command is a command to control a feature corresponding to the first content, determines, based on a type of a second content, to control the display to operate in the first orientation or a second orientation different from the first orientation when the received user command is a command to display the second content on the display, and controls the motor to rotate the display based on the determined first orientation or the second orientation.

公开(公告)号：US12211711B2

公开(公告)日：2025-01-28

申请号：US17666796

申请日：2022-02-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bumjin Jang ,  Seunghwa Kang ,  Sungyong Park ,  Ansook Sul ,  Kiju Sohn ,  Wonguk Seo

IPC: H01L21/67 ,  H01L21/324

Abstract: A baking apparatus, may include a processing chamber including a lower chamber and an upper chamber connected by a ring shutter; a baking plate in the processing chamber adjacent to a region in which the lower chamber and the ring shutter overlap; an active flow controller including a first module and a second module in the lower chamber adjacent to the baking plate; a first auxiliary flow controller on a lower part of the ring shutter, adjacent to the lower chamber; and a second auxiliary flow controller in the upper chamber adjacent to the ring shutter. The active controller may be configured to move based on movement of the first module in a first direction perpendicular to an upper surface of the baking plate. The active flow controller may be configured to control airflow around the second module by movement of the second module.

公开(公告)号：US20230402299A1

公开(公告)日：2023-12-14

申请号：US18200619

申请日：2023-05-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyojin Park ,  Songyun Kang ,  Sungyong Park ,  Kiseok Lee

IPC: H01L21/67 ,  B08B1/04 ,  B08B1/00

CPC classification number: H01L21/67092 ,  B08B1/04 ,  B08B1/001

Abstract: A wafer cleaning apparatus includes a base, a roller installation table installed on the base, a wafer support unit disposed at the roller installation table and having a support roller for rotatably supporting an edge of a wafer, a pressing roller installed on the roller installation table and above the wafer support unit, and configured to press opposite surfaces of the wafer, and a driving unit providing a force in a direction, crossing a direction of a central axis of the pressing roller, so that a shape of the pressing roller is deformed. The pressing roller deformed by the driving unit applies a first pressure to a central portion of the wafer and a second pressure, different from the first pressure, to an edge portion of the water.