Baking apparatus
    2.
    发明授权

    公开(公告)号:US12211711B2

    公开(公告)日:2025-01-28

    申请号:US17666796

    申请日:2022-02-08

    Abstract: A baking apparatus, may include a processing chamber including a lower chamber and an upper chamber connected by a ring shutter; a baking plate in the processing chamber adjacent to a region in which the lower chamber and the ring shutter overlap; an active flow controller including a first module and a second module in the lower chamber adjacent to the baking plate; a first auxiliary flow controller on a lower part of the ring shutter, adjacent to the lower chamber; and a second auxiliary flow controller in the upper chamber adjacent to the ring shutter. The active controller may be configured to move based on movement of the first module in a first direction perpendicular to an upper surface of the baking plate. The active flow controller may be configured to control airflow around the second module by movement of the second module.

    Chemical solution evaporation device and substrate processing device including the same

    公开(公告)号:US11590460B2

    公开(公告)日:2023-02-28

    申请号:US17239644

    申请日:2021-04-25

    Abstract: A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.

    Optical Inspection System
    7.
    发明申请
    Optical Inspection System 有权
    光学检测系统

    公开(公告)号:US20160290933A1

    公开(公告)日:2016-10-06

    申请号:US14955331

    申请日:2015-12-01

    CPC classification number: G01N21/94 G01N21/8806 G01N21/958 G01N2021/9513

    Abstract: Provided is an optical inspection system including a supporting unit, allowing a target object to be loaded thereon, a light source unit configured to emit a laser beam toward the target object, a light condensing unit collecting scattered light that is scattered at the target object when the laser beam is irradiated onto the target object, and a control unit controlling the light source unit and the light condensing unit and analyzing the scattered light to examine whether there are pollutants on the target object. The supporting unit may include a first supporting unit, on which the target object is disposed, and which is formed of a first material, and a second supporting unit, which is disposed under the first supporting unit and is formed of a second material different from the first material.

    Abstract translation: 提供了一种光学检查系统,包括:允许目标物体被装载在其上的支撑单元,被构造成朝向目标物体发射激光束的光源单元,收集在目标物体处散射的散射光的聚光单元, 激光束被照射到目标物体上,控制单元控制光源单元和聚光单元并分析散射光以检查目标物体上是否存在污染物。 所述支撑单元可以包括第一支撑单元,所述目标物体设置在所述第一支撑单元上,并且所述第一支撑单元由第一材料形成,所述第二支撑单元设置在所述第一支撑单元的下方,并且由不同于 第一种材料。

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