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公开(公告)号:US20240424627A1
公开(公告)日:2024-12-26
申请号:US18824679
申请日:2024-09-04
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hoseop Choi , Minseop Park , Jubong Lee , Sung Yong Park , Kiju Sohn , Jaeyoung Eom
IPC: B23Q3/155 , B24B53/017 , B24D9/08
Abstract: A conditioning disk replacement apparatus includes; a detacher configured to separate a conditioning disk from to a holder, a transfer part configured to transfer the conditioning disk, and a container configured to store the conditioning disk. The detacher includes a detachment body and a rotary part coupled to the detachment body, the rotary part includes a key protruding outward from the rotary part in a first horizontal direction, and the rotary part is configured to rotate about a central axis extending in the first horizontal direction.
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公开(公告)号:US20170298507A1
公开(公告)日:2017-10-19
申请号:US15398284
申请日:2017-01-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Soyoung Lee , Hyunsu Kim , Kiju Sohn , Kuntack Lee , Jongwon Hong
IPC: C23C16/455 , H01L27/115 , H01L21/768 , H01L21/02
CPC classification number: C23C16/45525 , C23C16/4481 , H01L21/0228 , H01L21/76831 , H01L27/11556 , H01L27/11582
Abstract: A semiconductor fabrication apparatus can include a plurality of reaction containers that can be coupled together to provide a plurality of sequential respective stages in a process of generating a process gas for semiconductor fabrication, where each reaction container can include a respective semiconductor fabrication solid source material in a respective configuration that is different than in others of the reaction containers.
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公开(公告)号:US12211711B2
公开(公告)日:2025-01-28
申请号:US17666796
申请日:2022-02-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Bumjin Jang , Seunghwa Kang , Sungyong Park , Ansook Sul , Kiju Sohn , Wonguk Seo
IPC: H01L21/67 , H01L21/324
Abstract: A baking apparatus, may include a processing chamber including a lower chamber and an upper chamber connected by a ring shutter; a baking plate in the processing chamber adjacent to a region in which the lower chamber and the ring shutter overlap; an active flow controller including a first module and a second module in the lower chamber adjacent to the baking plate; a first auxiliary flow controller on a lower part of the ring shutter, adjacent to the lower chamber; and a second auxiliary flow controller in the upper chamber adjacent to the ring shutter. The active controller may be configured to move based on movement of the first module in a first direction perpendicular to an upper surface of the baking plate. The active flow controller may be configured to control airflow around the second module by movement of the second module.
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公开(公告)号:US12145233B2
公开(公告)日:2024-11-19
申请号:US17745618
申请日:2022-05-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hoseop Choi , Minseop Park , Jubong Lee , Sung Yong Park , Kiju Sohn , Jaeyoung Eom
IPC: B23Q3/155 , B24B53/017 , B24D9/08
Abstract: A conditioning disk replacement apparatus includes; a detacher configured to separate a conditioning disk from to a holder, a transfer part configured to transfer the conditioning disk, and a container configured to store the conditioning disk. The detacher includes a detachment body and a rotary part coupled to the detachment body, the rotary part includes a key protruding outward from the rotary part in a first horizontal direction, and the rotary part is configured to rotate about a central axis extending in the first horizontal direction.
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