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11.STRUCTURE INCLUDING GALLIUM NITRIDE SUBSTRATE AND METHOD OF MANUFACTURING THE GALLIUM NITRIDE SUBSTRATE 有权
Title translation: 包括氮化镓衬底的结构和制造氮化镓衬底的方法公开(公告)号:US20140110717A1
公开(公告)日:2014-04-24
申请号:US13848281
申请日:2013-03-21
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Xianyu WENXU , Yeon-hee KIM , Chang-youl MOON , Yong-young PARK
CPC classification number: H01L21/0254 , H01L21/02164 , H01L21/02238 , H01L21/02255 , H01L21/02381 , H01L21/0243 , H01L21/0245 , H01L21/02458 , H01L21/02491 , H01L21/02502 , H01L21/02532 , H01L21/02592 , H01L21/0262 , H01L21/02639 , H01L21/02647 , H01L21/02658 , H01L21/02667 , H01L21/30604 , H01L21/3081 , H01L29/2003
Abstract: A structure includes a silicon substrate, a plurality of silicon rods on the silicon substrate, a silicon layer on the plurality of silicon rods, and a GaN substrate on the silicon layer.
Abstract translation: 一种结构包括硅衬底,硅衬底上的多个硅棒,多个硅棒上的硅层,以及硅层上的GaN衬底。