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公开(公告)号:US09435996B2
公开(公告)日:2016-09-06
申请号:US13965429
申请日:2013-08-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yong-Kwan Kim , Seong-Ha Park , Yong-Chan Keh , Jung-Kee Lee , Joong-Wan Park
CPC classification number: G02B26/008 , F21V9/08 , F21V9/40 , G03B21/204 , G03B21/2066 , G03B33/08
Abstract: An illumination optical system for a beam projector includes: a light source; a color conversion unit having at least one fluorescent substance layer that reflects a light from the light source or converts the light emitted from the light source to a wavelength-converted light; and a dichroic mirror that causes the light emitted from the light source to be incident on the color conversion unit. Lights reflected or emitted by the conversion unit and having different wavelengths are incident on a display panel through the same path. In the illumination optical system, a light emitted from one light source can be processed to produce red, green and blue lights which can be in turn incident on the display panel through the same optical path of the light reflected or emitted by the conversion unit.
Abstract translation: 一种用于射束投影仪的照明光学系统,包括:光源; 具有至少一个反射来自所述光源的光的荧光物质层或将从所述光源发射的光转换为波长转换的光的颜色转换单元; 以及使从光源发出的光入射到颜色转换单元的分色镜。 由转换单元反射或发射并且具有不同波长的光通过相同的路径入射在显示面板上。 在照明光学系统中,可以处理从一个光源发射的光,以产生红色,绿色和蓝色光,该光源可以通过由转换单元反射或发射的光的相同光路入射到显示面板上。
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公开(公告)号:US10665498B2
公开(公告)日:2020-05-26
申请号:US15196273
申请日:2016-06-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Eun-Jung Kim , Bong-Soo Kim , Yong-Kwan Kim , Sung-Hee Han , Yoo-Sang Hwang
IPC: H01L23/48 , H01L23/52 , H01L29/40 , H01L21/768 , H01L23/528 , H01L23/522 , H01L23/532 , H01L27/108
Abstract: A semiconductor device, including an active region defined in a semiconductor substrate; a first contact plug on the semiconductor substrate, the first contact plug being connected to the active region; a bit line on the semiconductor substrate, the bit line being adjacent to the first contact plug; a first air gap spacer between the first contact plug and the bit line; a landing pad on the first contact plug; a blocking insulating layer on the bit line; and an air gap capping layer on the first air gap spacer, the air gap capping layer vertically overlapping the first air gap spacer, the air gap capping layer being between the blocking insulating layer and the landing pad, an upper surface of the blocking insulating layer being at a height equal to or higher than an upper surface of the landing pad.
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公开(公告)号:US09972527B2
公开(公告)日:2018-05-15
申请号:US15263822
申请日:2016-09-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kyung-Eun Kim , Yong-Kwan Kim , Se-Myeong Jang , Yoo-Sang Hwang , Bong-Soo Kim
IPC: H01L21/00 , H01L21/768 , G11C11/408 , G11C11/4091 , H01L23/522 , H01L23/528 , H01L23/532 , H01L27/108 , G11C11/406
CPC classification number: H01L21/7682 , G11C11/40615 , G11C11/4082 , G11C11/4087 , G11C11/4091 , H01L21/76816 , H01L21/76877 , H01L21/76897 , H01L23/5226 , H01L23/528 , H01L23/5329 , H01L27/10885 , H01L28/00
Abstract: A semiconductor device includes a substrate including a plurality of active areas. A conductive pattern is in contact with an active area. First and second conductive line structures face first and second side walls of the conductive pattern. An air spacer is disposed between the first and second side walls. The first and second conductive line structures include a conductive line and a conductive line mask layer. The conductive line mask layer includes a lower portion having a first width and an upper portion having a second width narrower than the first width. The air spacer includes a first air spacer disposed on a side wall of the lower portion of the conductive line mask layer and a second air spacer disposed on a side wall of the upper portion of the conductive line mask layer. The second air spacer is connected with the first air spacer.
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公开(公告)号:US20170154805A1
公开(公告)日:2017-06-01
申请号:US15263822
申请日:2016-09-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: KYUNG-EUN KIM , Yong-Kwan Kim , Se-Myeong Jang , Yoo-Sang Hwang , Bong-Soo Kim
IPC: H01L21/768 , H01L23/522 , G11C11/4091 , H01L23/532 , G11C11/406 , G11C11/408 , H01L27/108 , H01L23/528
CPC classification number: H01L21/7682 , G11C11/40615 , G11C11/4082 , G11C11/4087 , G11C11/4091 , H01L21/76816 , H01L21/76877 , H01L21/76897 , H01L23/5226 , H01L23/528 , H01L23/5329 , H01L27/10885 , H01L28/00
Abstract: A semiconductor device includes a substrate including a plurality of active areas. A conductive pattern is in contact with an active area. First and second conductive line structures face first and second side walls of the conductive pattern. An air spacer is disposed between the first and second side walls. The first and second conductive line structures include a conductive line and a conductive line mask layer. The conductive line mask layer includes a lower portion having a first width and an upper portion having a second width narrower than the first width. The air spacer includes a first air spacer disposed on a side wall of the lower portion of the conductive line mask layer and a second air spacer disposed on a side wall of the upper portion of the conductive line mask layer. The second air spacer is connected with the first air spacer.
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15.
公开(公告)号:US20130083301A1
公开(公告)日:2013-04-04
申请号:US13628577
申请日:2012-09-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Dong-Hi LEE , Jung-Kee Lee , Seong-Ha Park , Yong-Kwan Kim , Young-Kang Cho
IPC: G03B21/28
CPC classification number: G03B21/28
Abstract: A reflection apparatus for a beam projector, and a beam projector including the reflection apparatus are provided. The reflection apparatus reflects and projects incident light from a projection optical system of the beam projector to an external surface, and includes a first mirror for reflecting the incident light from the projection optical system, and a second mirror that receives the light reflected from the first mirror and reflects the received light to the external surface.
Abstract translation: 提供了一种用于射束投影仪的反射装置和包括该反射装置的射束投影仪。 反射装置将入射光从射线投影仪的投影光学系统反射并投影到外表面,并且包括用于反射来自投影光学系统的入射光的第一反射镜和接收从第一 反射并将接收到的光反射到外表面。
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