Method of manufacturing liquid crystal display device
    12.
    发明授权
    Method of manufacturing liquid crystal display device 有权
    制造液晶显示装置的方法

    公开(公告)号:US06960484B2

    公开(公告)日:2005-11-01

    申请号:US10733371

    申请日:2003-12-12

    CPC分类号: H01L27/1288 H01L27/1214

    摘要: A method of manufacturing a liquid crystal display device includes steps of forming a gate line, a gate pad and a gate electrode on a first substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the first substrate including the gate line, the gate pad and the gate electrode through a second mask process, forming a pixel electrode and a data pad terminal on the first substrate including the data line, the data pad, the source electrode and the drain electrode through a third mask process, forming a passivation layer on an entire surface of the first substrate including the pixel electrode and the data pad terminal, attaching the first substrate including the passivation layer with a second substrate, wherein a gate pad portion including the gate pad and a data pad portion including the data pad are exposed by the second substrate, providing a liquid crystal material into a gap between the first and second substrates, and removing the passivation layer in the gate and data pad portions exposed by the second substrate.

    摘要翻译: 制造液晶显示装置的方法包括以下步骤:通过第一掩模处理在第一基板上形成栅极线,栅极焊盘和栅电极,形成数据线,数据焊盘,源电极,漏电极 以及通过第二掩模处理在包括栅极线,栅极焊盘和栅电极的第一衬底上的有源层,在包括数据线的第一衬底上形成像素电极和数据焊盘端子,数据焊盘,源极 电极和漏电极,通过第三掩模工艺在包括像素电极和数据焊盘端子的第一衬底的整个表面上形成钝化层,将包括钝化层的第一衬底与第二衬底附接,其中栅极焊盘 包括栅极焊盘的部分和包括数据焊盘的数据焊盘部分被第二基板曝光,将液晶材料提供到第一和第二焊盘之间的间隙中 并且去除由第二基板暴露的栅极和数据焊盘部分中的钝化层。

    Pattern transcription device and method of fabricating cliché for the same
    13.
    发明授权
    Pattern transcription device and method of fabricating cliché for the same 有权
    模式转录装置及其制作方法

    公开(公告)号:US08689688B2

    公开(公告)日:2014-04-08

    申请号:US11944198

    申请日:2007-11-21

    IPC分类号: B41C1/02

    CPC分类号: B41C1/025 B41F1/16

    摘要: A pattern transcription apparatus comprises a cliché including a concave portion, a convex portion and a printing stopper, the printing stopper formed on a bottom surface of the concave portion; and a blanket, on which a resist material layer is coated, rotatable on the cliché, wherein a surface energy density of the blanket is greater than a surface energy density of the printing stopper and is smaller than a surface energy of the cliché.

    摘要翻译: 图案转印装置包括具有凹部,凸部和印刷止挡件的陈腔,印刷止挡件形成在凹部的底面上; 以及毯子,其上涂覆有抗蚀剂材料层,可在桌面上旋转,其中所述毯子的表面能量密度大于所述印刷止挡件的表面能量密度,并且小于所述表层的表面能。

    PATTERN TRANSCRIPTION DEVICE AND METHOD OF FABRICATING CLICHE FOR THE SAME
    14.
    发明申请
    PATTERN TRANSCRIPTION DEVICE AND METHOD OF FABRICATING CLICHE FOR THE SAME 有权
    图案转换装置及其制造方法

    公开(公告)号:US20080178756A1

    公开(公告)日:2008-07-31

    申请号:US11944198

    申请日:2007-11-21

    IPC分类号: B41F7/02 B41C3/02

    CPC分类号: B41C1/025 B41F1/16

    摘要: A pattern transcription apparatus comprises a cliché including a concave portion, a convex portion and a printing stopper, the printing stopper formed on a bottom surface of the concave portion; and a blanket, on which a resist material layer is coated, rotatable on the cliché, wherein a surface energy density of the blanket is greater than a surface energy density of the printing stopper and is smaller than a surface energy of the cliché.

    摘要翻译: 图案转印装置包括具有凹部,凸部和印刷止挡件的陈腔,印刷止挡件形成在凹部的底面上; 以及毯子,其上涂覆有抗蚀剂材料层,可在桌面上旋转,其中所述毯子的表面能量密度大于所述印刷止挡件的表面能量密度并且小于所述表层的表面能。

    Thin film transistor substrate of a horizontal electric field type LCD and fabricating method thereof
    16.
    发明授权
    Thin film transistor substrate of a horizontal electric field type LCD and fabricating method thereof 有权
    水平电场型LCD薄膜晶体管基板及其制造方法

    公开(公告)号:US07599034B2

    公开(公告)日:2009-10-06

    申请号:US11542249

    申请日:2006-10-04

    IPC分类号: G02F1/1343

    摘要: A thin film transistor substrate structure of a horizontal electric field type LCD comprises a plurality of signal lines including a gate, a data, and a common lines disposed on a substrate; the data line intersecting with the gate and common lines, a gate insulating film disposed between the data line and the gate and common lines, a pixel area being defined by the intersection of the data and gate lines; a thin film transistor disposed at the intersection of the data line and gate line; a common and a pixel electrodes both having a portion extended into the pixel area; a protective film disposed over the substrate and the thin film transistor; and at least one pad structure including an upper pad electrode contacting a lower pad electrode within a first contact hole wherein the upper pad electrode is absent from the upper surface of the protective film.

    摘要翻译: 水平电场型LCD的薄膜晶体管衬底结构包括多个信号线,包括设置在衬底上的栅极,数据和公共线; 与栅极和公共线相交的数据线,设置在数据线与栅极和公共线之间的栅极绝缘膜,像素区域由数据与栅极线的交点定义; 设置在数据线与栅极线的交点处的薄膜晶体管; 一个共同的和一个像素电极,两者都具有延伸到像素区域中的一部分; 设置在所述基板和所述薄膜晶体管上的保护膜; 以及至少一个焊盘结构,其包括在第一接触孔内接触下焊盘电极的上焊盘电极,其中上焊盘电极不在保护膜的上表面中。

    Array substrate for liquid crystal display device and method of manufacturing the same
    17.
    发明授权
    Array substrate for liquid crystal display device and method of manufacturing the same 有权
    液晶显示装置用阵列基板及其制造方法

    公开(公告)号:US07489369B2

    公开(公告)日:2009-02-10

    申请号:US11325570

    申请日:2006-01-05

    IPC分类号: G02F1/136 G02F1/1343

    摘要: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.

    摘要翻译: 制造液晶显示装置用阵列基板的方法包括通过第一掩模工艺在基板上形成栅极线,栅极焊盘和栅电极,形成数据线,数据焊盘,源电极,漏极 电极和通过第二掩模处理的包括栅极线,栅极焊盘和栅电极的衬底上的有源层,其中数据线与栅极线交叉以限定像素区域,源电极从数据线延伸, 所述漏电极与所述源电极间隔开,并且所述有源层设置在所述栅电极与所述源漏电极之间,在所述基板的整个表面上形成钝化层,所述整个表面包括所述数据线,所述源电极和所述漏极 电极通过第三掩模工艺,钝化层被蚀刻以暴露像素区域中的衬底,漏电极的一部分,栅极焊盘和数据焊盘,并且形成像素e 栅极焊盘端子和数据焊盘端子,通过在包括钝化层的基板的整个表面上沉积透明导电材料,直接接触漏电极的暴露部分的像素电极,直接接触栅极的栅极焊盘端子 焊盘和数据焊盘端子直接接触数据焊盘。

    Manufacturing method of liquid crystal display device
    18.
    发明授权
    Manufacturing method of liquid crystal display device 有权
    液晶显示装置的制造方法

    公开(公告)号:US07256076B2

    公开(公告)日:2007-08-14

    申请号:US10814186

    申请日:2004-04-01

    IPC分类号: H01L21/00

    摘要: A manufacturing method of a thin film transistor of a liquid crystal display device using 3-mask includes forming a gate electrode over a substrate, consecutively forming a gate insulating layer and an active layer, forming a first photoresist pattern, removing an active layer formed at a source/drain region, ashing the first photoresist pattern to expose a part of an active region, forming a source/drain electrode, forming a passivation layer, forming a second photoresist pattern that exposes a pixel region over the passivation layer; forming a pixel region by using the second photoresist pattern as a mask, side-etching a part of the passivation layer to expose a part of the drain electrode, forming a pixel electrode material over the second photoresist pattern and the pixel region, and simultaneously removing the second photoresist pattern and the pixel electrode material formed thereon to form a pixel electrode.

    摘要翻译: 使用3掩模的液晶显示装置的薄膜晶体管的制造方法包括在基板上形成栅电极,连续地形成栅极绝缘层和有源层,形成第一光致抗蚀剂图案,除去形成在第 源极/漏极区域,灰化第一光致抗蚀剂图案以暴露有源区的一部分,形成源极/漏极,形成钝化层,形成在钝化层上暴露像素区域的第二光致抗蚀剂图案; 通过使用第二光致抗蚀剂图案作为掩模形成像素区域,侧蚀刻钝化层的一部分以暴露部分漏电极,在第二光致抗蚀剂图案和像素区域上形成像素电极材料,并同时去除 第二光致抗蚀剂图案和形成在其上的像素电极材料以形成像素电极。

    Array substrate for liquid crystal display device and method of manufacturing the same

    公开(公告)号:US20060119779A1

    公开(公告)日:2006-06-08

    申请号:US11325570

    申请日:2006-01-05

    IPC分类号: G02F1/1345

    摘要: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.

    Array substrate for liquid crystal display device and method of manufacturing the same
    20.
    发明授权
    Array substrate for liquid crystal display device and method of manufacturing the same 失效
    液晶显示装置用阵列基板及其制造方法

    公开(公告)号:US07763483B2

    公开(公告)日:2010-07-27

    申请号:US12318654

    申请日:2009-01-05

    IPC分类号: H01L21/00

    摘要: A method of manufacturing an array substrate for a liquid crystal display device includes forming a gate line, a gate pad and a gate electrode on a substrate through a first mask process, forming a data line, a data pad, a source electrode, a drain electrode and an active layer on the substrate including the gate line, the gate pad and the gate electrode through a second mask process, wherein the data line crosses the gate line to define a pixel region, the source electrode is extended from the data line, the drain electrode is spaced apart from the source electrode, and the active layer is disposed between the gate electrode and the source and drain electrodes, forming a passivation layer on an entire surface of the substrate including the data line, the source electrode and the drain electrode through a third mask process, the passivation layer being etched to expose the substrate in the pixel region, a part of the drain electrode, the gate pad and the data pad, and forming a pixel electrode, a gate pad terminal and a data pad terminal by depositing a transparent conductive material on an entire surface of the substrate including the passivation layer, the pixel electrode directly contacting the exposed part of the drain electrode, the gate pad terminal directly contacting the gate pad, and the data pad terminal directly contacting the data pad.

    摘要翻译: 制造液晶显示装置用阵列基板的方法包括通过第一掩模工艺在基板上形成栅极线,栅极焊盘和栅电极,形成数据线,数据焊盘,源电极,漏极 电极和通过第二掩模处理的包括栅极线,栅极焊盘和栅电极的衬底上的有源层,其中数据线与栅极线交叉以限定像素区域,源电极从数据线延伸, 所述漏电极与所述源电极间隔开,并且所述有源层设置在所述栅电极与所述源漏电极之间,在所述基板的整个表面上形成钝化层,所述整个表面包括所述数据线,所述源电极和所述漏极 电极通过第三掩模工艺,钝化层被蚀刻以暴露像素区域中的衬底,漏电极的一部分,栅极焊盘和数据焊盘,并且形成像素e 栅极焊盘端子和数据焊盘端子,通过在包括钝化层的基板的整个表面上沉积透明导电材料,直接接触漏电极的暴露部分的像素电极,直接接触栅极的栅极焊盘端子 焊盘和数据焊盘端子直接接触数据焊盘。