公开(公告)号：US06531776B2

公开(公告)日：2003-03-11

申请号：US09940852

申请日：2001-08-29

Applicant: Ben Min-Jer Lin ,  Sheng-Jen Wang

Inventor： Ben Min-Jer Lin ,  Sheng-Jen Wang

IPC: H01L2940

CPC classification number: H01L21/7682 ,  H01L21/76885 ,  H01L23/5222 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of forming a semiconductor device having reduced interconnect-line parasitic capacitance is provided. The method includes the following steps. First, a substrate is provided and a plurality of interconnect lines are formed on the substrate. A barrier layer is then formed. Next, the barrier layer is hardened and thinned so as to make the barrier layer having a thin-film attribute. Following that, a separation layer is formed by filling the space between and above the interconnect lines with a dielectric. Then, the dielectric is foamed. After that, an insulating layer is formed. Finally, the dielectric is condensed such that air gaps are formed in the separation layer.

公开(公告)号：US07099729B2

公开(公告)日：2006-08-29

申请号：US10708277

申请日：2004-02-20

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

IPC: G06F19/00

CPC classification number: H01L22/20 ,  G05B2219/32191 ,  Y02P90/22

Abstract: A semiconductor process and yield analysis integrated real-time management method comprises inspecting a plurality of semiconductor products with a plurality of items to generate and record a plurality of inspecting results during semiconductor process, classifying the semiconductor products as a plurality of groups with a default rule to generate and record an initial data in a database, indexing a plurality of semiconductor product groups and the corresponding initial data from the database by a default product rule and parameter to calculate a corresponding analysis result, and displaying the analysis result according to the indexed semiconductor product groups and the initial data.

Abstract translation: 集成实时管理方法的半导体工艺和成品率分析包括在半导体处理期间检查多个半导体产品以产生并记录多个检查结果，并将半导体产品作为具有默认规则的多个组进行分类 在数据库中生成和记录初始数据，通过默认产品规则和参数从数据库索引多个半导体产品组和相应的初始数据，以计算相应的分析结果，并根据索引的半导体显示分析结果 产品组和初始数据。

公开(公告)号：US06999897B2

公开(公告)日：2006-02-14

申请号：US10708573

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

IPC: G11C7/00

CPC classification number: G05B19/41875 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系 ，以及每件设备的半导体产品的质量。

公开(公告)号：US06950783B1

公开(公告)日：2005-09-27

申请号：US10708572

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Sheng-Jen Wang

IPC: G06F19/00 ,  G21C17/00

CPC classification number: H01L22/20 ,  G05B19/41875 ,  G06Q30/0283 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment prevention maintenance management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording time and cost of prevention maintenance after each piece of equipment runs prevention maintenance, evaluating the quality of semiconductor products, and analyzing a relationship between the corresponding process parameter, the corresponding equipment parameters, prevention maintenance cost, and semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预防维护管理方法及相关系统。 该方法包括记录每件设备的工艺参数，每台设备的加工记录设备参数，每台设备运行后的预防维护的评估和记录时间和成本预防维护，半导体产品的质量评估和分析 相应的过程参数，相应的设备参数，预防维护成本以及每件设备的半导体产品之间的关系。

公开(公告)号：US20050203715A1

公开(公告)日：2005-09-15

申请号：US10708573

申请日：2004-03-11

Applicant: Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

Inventor： Hung-En Tai ,  Chien-Chung Chen ,  Haw-Jyue Luo ,  Sheng-Jen Wang

IPC: G06F19/00

CPC classification number: G05B19/41875 ,  Y02P90/22

Abstract: A method and related system for semiconductor equipment early warning management. The method includes recording process parameters of each piece of equipment, recording equipment parameters when each piece of equipment is processing, evaluating and recording the quality of semiconductor products and corresponding testing parameters, and analyzing a relationship between the corresponding process parameters, the corresponding equipment parameters, and the quality of semiconductor products of each piece of equipment.

Abstract translation: 一种半导体设备预警管理方法及相关系统。 该方法包括记录每件设备的处理参数，每台设备处理时记录设备参数，评估和记录半导体产品的质量和相应的测试参数，分析相应工艺参数，相应设备参数之间的关系 ，以及每件设备的半导体产品的质量。