公开(公告)号：US20070225607A1

公开(公告)日：2007-09-27

申请号：US11757413

申请日：2007-06-04

申请人： Chung-Yuo Wu ,  Yi-Hong Chou ,  Ta-Jung Su ,  Meng-Tsung Lo

发明人： Chung-Yuo Wu ,  Yi-Hong Chou ,  Ta-Jung Su ,  Meng-Tsung Lo

IPC分类号： A61B8/00

CPC分类号： A61B5/031 ,  A61B8/04 ,  A61B8/0808 ,  A61B8/481

摘要： A method for measuring intracranial pressure in an intracranial area filled with micro-bubbles formed by an injected contrast agent includes: (1) emitting an ultrasound signal having a bandwidth to the intracranial area, (2) receiving an echoed signal from a micro-bubble, (3) performing a spectral analysis on the echoed signal to extract a low-frequency response, which is close to a DC component, (4) calculating a resonant frequency of the micro-bubbles according to the bandwidth and strength of the low-frequency response, the bandwidth of the low-frequency response similar to the bandwidth of the ultrasound signal, (5) calculating a size of the micro-bubble according to the resonant frequency and a property of the contrast agent, and (6) calculating the intracranial pressure.

摘要翻译： 一种用于测量填充有注射造影剂形成的微气泡的颅内区域的颅内压的方法包括：（1）向颅内区域发射具有带宽的超声信号，（2）从微泡接收回波信号 （3）对回波信号进行频谱分析，提取接近直流分量的低频响应，（4）根据低频响应的带宽和强度来计算微气泡的共振频率， 频率响应，低频响应的带宽类似于超声信号的带宽，（5）根据谐振频率和造影剂的性质计算微气泡的尺寸，（6）计算 颅内压

公开(公告)号：US20060241438A1

公开(公告)日：2006-10-26

申请号：US10906709

申请日：2005-03-03

申请人： Chung-Yuo Wu ,  Yi-Hong Chou ,  Ta-Jung Su ,  Meng-Tsung Lo

发明人： Chung-Yuo Wu ,  Yi-Hong Chou ,  Ta-Jung Su ,  Meng-Tsung Lo

IPC分类号： A61B8/00

CPC分类号： A61B5/031 ,  A61B8/04 ,  A61B8/0808 ,  A61B8/481

摘要： A method for measuring intracranial pressure in an intracranial area filled with micro-bubbles formed by an injected contrast agent includes: (1) emitting an ultrasound signal having a bandwidth to the intracranial area, (2) receiving an echoed signal from a micro-bubble, (3) performing a spectral analysis on the echoed signal to extract a low-frequency response, which is close to a DC component, (4) calculating a resonant frequency of the micro-bubbles according to the bandwidth and strength of the low-frequency response, the bandwidth of the low-frequency response similar to the bandwidth of the ultrasound signal, (5) calculating a size of the micro-bubble according to the resonant frequency and a property of the contrast agent, and (6) calculating the intracranial pressure.

摘要翻译： 一种用于测量填充有注射造影剂形成的微气泡的颅内区域的颅内压的方法包括：（1）向颅内区域发射具有带宽的超声信号，（2）从微泡接收回波信号 （3）对回波信号进行频谱分析，提取接近直流分量的低频响应，（4）根据低频响应的带宽和强度来计算微气泡的共振频率， 频率响应，低频响应的带宽类似于超声信号的带宽，（5）根据谐振频率和造影剂的性质计算微气泡的尺寸，（6）计算 颅内压

公开(公告)号：US07704648B2

公开(公告)日：2010-04-27

申请号：US11161311

申请日：2005-07-29

申请人： Ta-Jung Su ,  Shu-Min Wu

发明人： Ta-Jung Su ,  Shu-Min Wu

IPC分类号： G02B5/20 ,  G02F1/1335

CPC分类号： G02B5/204 ,  G02F1/133512 ,  G02F1/133516

摘要： A color filter substrate including a substrate, a black matrix, a plurality of color filter patterns and a common electrode is provided. The substrate has a plurality of pixel regions thereon. The black matrix comprises a plurality of strip patterns, wherein the strip patterns are disposed between the pixel regions to isolate the pixel regions, and each strip pattern has a side portion distant from the substrate and extending to the edge of the adjacent pixel region. Each color filter pattern is disposed in each pixel region. The common electrode is disposed over the substrate and covering the color filter patterns and the black matrix.

摘要翻译： 提供了包括基板，黑矩阵，多个滤色器图案和公共电极的滤色器基板。 基板上具有多个像素区域。 黑色矩阵包括多个条形图案，其中条形图案设置在像素区域之间以隔离像素区域，并且每个条形图案具有远离基板并延伸到相邻像素区域的边缘的侧部。 每个滤色器图案设置在每个像素区域中。 公共电极设置在衬底上并覆盖滤色器图案和黑色矩阵。

公开(公告)号：US20060241462A1

公开(公告)日：2006-10-26

申请号：US10906969

申请日：2005-03-14

申请人： Yi-Hong Chou ,  Chung-Yuo Wu ,  Ta-Jung Su ,  Meng-Tsung Lo

发明人： Yi-Hong Chou ,  Chung-Yuo Wu ,  Ta-Jung Su ,  Meng-Tsung Lo

IPC分类号： A61B8/00

CPC分类号： A61B8/0808 ,  A61B8/481

摘要： A method of intracranial ultrasound imaging applied in detecting a cranial blood vessel having blood filled with micro-bubbles formed by an injected contrast agent and generating blood vessel images includes: (1) emitting a plurality of ultrasound signals having bandwidths to the cranial blood vessel in sequence, (2) receiving an echoed signal from a micro-bubble, (3) performing a spectral analysis on the echoed signal and extracting a low-frequency response, the bandwidth of the low-frequency response similar to the bandwidth of the ultrasound signal, and (4) calculating a location and a depth of the micro-bubble in the cranium according to the low-frequency response and generating a corresponding blood vessel image.

摘要翻译： 一种应用于颅内超声成像的方法，用于检测具有填充有注射造影剂形成的微气泡并产生血管图像的血液的颅内血管，包括：（1）向颅血管发射具有带宽的多个超声信号 （2）从微气泡接收回波信号，（3）对回波信号进行频谱分析并提取低频响应，低频响应的带宽类似于超声信号的带宽 ，和（4）根据低频响应计算颅骨中微气泡的位置和深度，并产生相应的血管图像。

公开(公告)号：US20090085033A1

公开(公告)日：2009-04-02

申请号：US12061657

申请日：2008-04-03

申请人： Ta-Jung Su ,  Wen-Cheng Lu ,  Meng-Ju Hsieh

发明人： Ta-Jung Su ,  Wen-Cheng Lu ,  Meng-Ju Hsieh

IPC分类号： H01L29/786 ,  H01L21/336 ,  H01L33/00

CPC分类号： H01L29/78609 ,  H01L27/1214 ,  H01L29/66765 ,  H01L29/78696

摘要： A thin film transistor including a gate, a gate insulator layer, a doped semiconductor layer, a channel layer, a source, and a drain is provided. The gate is disposed on a substrate, and the gate insulator layer is disposed on the substrate and covers the gate. The doped semiconductor layer is disposed on the gate insulator layer above the gate. Furthermore, the channel layer is disposed on the doped semiconductor layer. The source and the drain are disposed separately on two sides of the channel layer.

摘要翻译： 提供了包括栅极，栅极绝缘体层，掺杂半导体层，沟道层，源极和漏极的薄膜晶体管。 栅极设置在基板上，并且栅极绝缘体层设置在基板上并覆盖栅极。 掺杂半导体层设置在栅极上方的栅极绝缘体层上。 此外，沟道层设置在掺杂半导体层上。 源极和漏极分别设置在沟道层的两侧。

公开(公告)号：US20080128700A1

公开(公告)日：2008-06-05

申请号：US11960737

申请日：2007-12-20

申请人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

发明人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

IPC分类号： H01L29/04

CPC分类号： G02F1/1362 ,  G02F1/13458

摘要： A method for fabricating a pixel structure is provided. First, a gate, a scan line, and a first terminal are formed on a substrate. A gate insulating layer is formed over the substrate to cover the gate, the scan line, and the first terminal. After defining the semiconductor layer, the gate insulating layer is patterned to exposure the first terminal. A transparent conductive layer is formed over the substrate and a patterned photoresist layer is formed on the transparent conductive layer. The transparent conductive layer is patterned using the patterned photoresist layer as a mask, so as to define a source, a drain, a data line, a pixel electrode, a second terminal, and a contact pad. Because only four photomasks are used to implement the above method for fabricating the pixel structure, the cost of manufacturing can be reduced.

摘要翻译： 提供了一种用于制造像素结构的方法。 首先，在基板上形成栅极，扫描线和第一端子。 栅极绝缘层形成在衬底上以覆盖栅极，扫描线和第一端子。 在限定半导体层之后，栅极绝缘层被图案化以暴露第一端子。 在衬底上形成透明导电层，并且在透明导电层上形成图案化的光致抗蚀剂层。 使用图案化的光致抗蚀剂层作为掩模来图案化透明导电层，以便限定源极，漏极，数据线，像素电极，第二端子和接触焊盘。 由于仅使用四个光掩模来实现用于制造像素结构的上述方法，所以可以降低制造成本。

公开(公告)号：US07338846B2

公开(公告)日：2008-03-04

申请号：US11306814

申请日：2006-01-12

申请人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

发明人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

IPC分类号： H01L21/84

CPC分类号： G02F1/1362 ,  G02F1/13458

摘要： A method for fabricating a pixel structure is provided. First, a gate, a scan line, and a first terminal are formed on a substrate. A gate insulating layer is formed over the substrate to cover the gate, the scan line, and the first terminal. After defining the semiconductor layer, the gate insulating layer is patterned to exposure the first terminal. A transparent conductive layer is formed over the substrate and a patterned photoresist layer is formed on the transparent conductive layer. The transparent conductive layer is patterned using the patterned photoresist layer as a mask, so as to define a source, a drain, a data line, a pixel electrode, a second terminal, and a contact pad. Because only four photomasks are used to implement the above method for fabricating the pixel structure, the cost of manufacturing can be reduced.

摘要翻译： 提供了一种用于制造像素结构的方法。 首先，在基板上形成栅极，扫描线和第一端子。 栅极绝缘层形成在衬底上以覆盖栅极，扫描线和第一端子。 在限定半导体层之后，栅极绝缘层被图案化以暴露第一端子。 在衬底上形成透明导电层，并且在透明导电层上形成图案化的光致抗蚀剂层。 使用图案化的光致抗蚀剂层作为掩模来图案化透明导电层，以便限定源极，漏极，数据线，像素电极，第二端子和接触焊盘。 由于仅使用四个光掩模来实现用于制造像素结构的上述方法，所以可以降低制造成本。

公开(公告)号：US20070161136A1

公开(公告)日：2007-07-12

申请号：US11306814

申请日：2006-01-12

申请人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

发明人： Ta-Jung Su ,  Yea-Chung Shih ,  Cheng-Fang Su

IPC分类号： H01L21/00

CPC分类号： G02F1/1362 ,  G02F1/13458

摘要： A method for fabricating a pixel structure is provided. First, a gate, a scan line, and a first terminal are formed on a substrate. A gate insulating layer is formed over the substrate to cover the gate, the scan line, and the first terminal. After defining the semiconductor layer, the gate insulating layer is patterned to exposure the first terminal. A transparent conductive layer is formed over the substrate and a patterned photoresist layer is formed on the transparent conductive layer. The transparent conductive layer is patterned using the patterned photoresist layer as a mask, so as to define a source, a drain, a data line, a pixel electrode, a second terminal, and a contact pad. Because only four photomasks are used to implement the above method for fabricating the pixel structure, the cost of manufacturing can be reduced.

摘要翻译： 提供了一种用于制造像素结构的方法。 首先，在基板上形成栅极，扫描线和第一端子。 栅极绝缘层形成在衬底上以覆盖栅极，扫描线和第一端子。 在限定半导体层之后，栅极绝缘层被图案化以暴露第一端子。 在衬底上形成透明导电层，并且在透明导电层上形成图案化的光致抗蚀剂层。 使用图案化的光致抗蚀剂层作为掩模来图案化透明导电层，以便限定源极，漏极，数据线，像素电极，第二端子和接触焊盘。 由于仅使用四个光掩模来实现用于制造像素结构的上述方法，所以可以降低制造成本。