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公开(公告)号：US20170005196A1
公开(公告)日：2017-01-05
申请号：US14788522
申请日：2015-06-30
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chih-Fen CHEN , Chui-Ya PENG , Ching YU , Pin-Hen LIN , Yen CHUANG , Yuh-Ta FAN
IPC: H01L29/78 , H01L29/08 , H01L29/66 , H01L29/16 , H01L29/165 , H01L29/06 , H01L29/161
CPC classification number: H01L29/7848 , H01L29/0847 , H01L29/165 , H01L29/665 , H01L29/6659 , H01L29/66636 , H01L29/7834 , H01L29/7835
Abstract: A semiconductor device includes a substrate, a liner, and an epitaxy structure. The substrate has a recess. The liner is disposed in the recess. The liner is denser than the substrate. The epitaxy structure is disposed in the recess. The liner is disposed between the epitaxy structure and the substrate.
Abstract translation: 半导体器件包括衬底，衬垫和外延结构。 基板具有凹部。 衬垫设置在凹部中。 衬垫比衬底更致密。 外延结构设置在凹部中。 衬垫设置在外延结构和衬底之间。
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公开(公告)号：US20240363377A1
公开(公告)日：2024-10-31
申请号：US18767854
申请日：2024-07-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tsui-Wei WANG , Yung-Li TSAI , Chui-Ya PENG
CPC classification number: H01L21/6715 , B08B15/04 , H01L21/02057 , H01L21/67051
Abstract: In an embodiment, a system includes: a wafer support configured to secure a wafer; a nozzle configured to dispense a liquid or a gas on the wafer when the nozzle is in an active state of dispensing; a shutter configured to catch the liquid from the nozzle when the shutter is in a first position below the nozzle; and a shutter actuator configured to: move the shutter to the first position in response to the nozzle not being in an inactive state; move the shutter to a second position away from the first position in response to the nozzle being in the active state.
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公开(公告)号：US20240363373A1
公开(公告)日：2024-10-31
申请号：US18770574
申请日：2024-07-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun HSU , Shu-Yen WANG , Chui-Ya PENG
CPC classification number: H01L21/67057 , H01L21/02057 , H01L21/67034 , H01L21/67248 , H01L21/67253
Abstract: A system and method includes: immersing a wafer in a bath within a cleaning chamber, removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber, determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.
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Patent Agency Ranking
公开(公告)号：US20240178013A1
公开(公告)日：2024-05-30
申请号：US18437139
申请日：2024-02-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun HSU , Shu-Yen WANG , Chui-Ya PENG
CPC classification number: H01L21/67057 , H01L21/02057 , H01L21/67034 , H01L21/67248 , H01L21/67253
Abstract: In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber, removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber, determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.
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公开(公告)号：US20220359237A1
公开(公告)日：2022-11-10
申请号：US17874103
申请日：2022-07-26
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wei-Chun HSU , Shu-Yen WANG , Chui-Ya PENG
Abstract: In an embodiment, a method includes: immersing a wafer in a bath within a cleaning chamber; removing the wafer out of the bath through a solvent and into a gas within the cleaning chamber; determining a parameter value from the gas; and performing remediation within the cleaning chamber in response to determining that the parameter value is beyond a threshold value.
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公开(公告)号：US20220139742A1
公开(公告)日：2022-05-05
申请号：US17576994
申请日：2022-01-16
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Jia-Rong XIAO , Wei-Hsiang HUANG , Sen-Yeo PENG , Chui-Ya PENG
IPC: H01L21/67
Abstract: A system includes a cleaning device and a concentration measuring device. The cleaning device includes a first pipe and a first pump. The first pump is configured to move first liquid in the first pipe. Two terminals of the first pump are respectively coupled to the first pipe. The concentration measuring device includes a tube, a cooler, a concentration meter and a second pump. The tube is coupled to the first pipe, and is configured to retrieve the first liquid. The cooler covers the tube to cool the first liquid. The concentration meter is configured to measure a concentration of the first liquid cooled by the cooler. The second pump is coupled to the tube, and is configured to move the first liquid according to the concentration.
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公开(公告)号：US20200094294A1
公开(公告)日：2020-03-26
申请号：US16510552
申请日：2019-07-12
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Jia-Rong XIAO , Wei-Hsiang HUANG , Sen-Yeo PENG , Chui-Ya PENG
Abstract: A system is disclosed herein. The system includes a tank, a tube, a cooler, and a concentration meter. The tank is configured to contain first liquid. The tube is coupled to the tank and configured to convey the first liquid from the tank. The cooler covers the tube to cool the first liquid conveyed by the tube. The concentration meter is configured to measure a concentration of the first liquid cooled by the cooler.
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公开(公告)号：US20180069120A1
公开(公告)日：2018-03-08
申请号：US15796853
申请日：2017-10-30
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chih-Fen CHEN , Chui-Ya PENG , Ching YU , Pin-Hen LIN , Yen CHUANG , Yuh-Ta FAN
IPC: H01L29/78 , H01L29/66 , H01L29/08 , H01L29/165
CPC classification number: H01L29/7848 , H01L29/0847 , H01L29/165 , H01L29/665 , H01L29/6659 , H01L29/66636 , H01L29/7834 , H01L29/7835
Abstract: A semiconductor device includes a substrate, a liner, and an epitaxy structure. The substrate has a recess. The liner is disposed in the recess. The liner is denser than the substrate. The epitaxy structure is disposed in the recess. The liner is disposed between the epitaxy structure and the substrate.
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