公开(公告)号：US10747128B2

公开(公告)日：2020-08-18

申请号：US15906580

申请日：2018-02-27

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yung-Yao Lee ,  Heng-Hsin Liu ,  Hung-Ming Kuo ,  Jui-Chun Peng

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/67 ,  H01L21/027 ,  H01L21/66

Abstract: In a method executed in an exposure apparatus, a focus control effective region and a focus control exclusion region are set based on an exposure map and a chip area layout within an exposure area. Focus-leveling data are measured over a wafer. A photo resist layer on the wafer is exposed with an exposure light. When a chip area of a plurality of chip areas of the exposure area is located within an effective region of a wafer, the chip area is included in the focus control effective region, and when a part of or all of a chip area of the plurality of chip areas is located on or outside a periphery of the effective region of the wafer, the chip area is included in the focus control exclusion region In the exposing, a focus-leveling is controlled by using the focus-leveling data measured at the focus control effective region.

公开(公告)号：US09826615B2

公开(公告)日：2017-11-21

申请号：US14860866

申请日：2015-09-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jian-Yuan Su ,  Hung-Ming Kuo ,  Kuo-Hung Chao ,  Jui-Chun Peng

IPC: H05G2/00 ,  G03F7/20 ,  G03F7/00 ,  G21K1/06

CPC classification number: H05G2/008 ,  G03F7/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  H05G2/005

Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source having a collector mirror oriented to reduce contamination of fuel droplet debris. In some embodiments, the EUV radiation source has a fuel droplet generator that provides a plurality of fuel droplets to an EUV source vessel. A primary laser is configured to generate a primary laser beam directed towards the plurality of fuel droplets. The primary laser beam has a sufficient energy to ignite a plasma from the plurality of fuel droplets, which emits extreme ultraviolet radiation. A collector mirror, configured to focus the extreme ultraviolet radiation to an exit aperture of the EUV source vessel, which is oriented so that a normal vector extending outward from a vertex of the collector mirror intersects a direction of a gravitation force by an angle that is less than 90°.

公开(公告)号：US20170086283A1

公开(公告)日：2017-03-23

申请号：US14860866

申请日：2015-09-22

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Jian-Yuan Su ,  Hung-Ming Kuo ,  Kuo-Hung Chao ,  Jui-Chun Peng

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  H05G2/005

Abstract: The present disclosure relates to an extreme ultraviolet (EUV) radiation source having a collector mirror oriented to reduce contamination of fuel droplet debris. In some embodiments, the EUV radiation source has a fuel droplet generator that provides a plurality of fuel droplets to an EUV source vessel. A primary laser is configured to generate a primary laser beam directed towards the plurality of fuel droplets. The primary laser beam has a sufficient energy to ignite a plasma from the plurality of fuel droplets, which emits extreme ultraviolet radiation. A collector mirror, configured to focus the extreme ultraviolet radiation to an exit aperture of the EUV source vessel, which is oriented so that a normal vector extending outward from a vertex of the collector mirror intersects a direction of a gravitation force by an angle that is less than 90°.