专利检索 ap:("Takashi Sekito" OR "Daishi Yokoyama" OR "Takashi Fuke" OR "Yuki Tashiro" OR "Toshiaki Nonaka" OR "Yasuaki Tanaka") AND inv:"Takashi Sekito" 第 2 页

11.

发明授权
Composition for forming fine resist pattern and pattern forming method using same 有权
标题翻译：用于形成精细抗蚀剂图案的组合物和使用其的图案形成方法

公开(公告)号：US09448485B2

公开(公告)日：2016-09-20

申请号：US14344943

申请日：2012-10-10

申请人： Tetsuo Okayasu , Takashi Sekito , Masahiro Ishii

发明人： Tetsuo Okayasu , Takashi Sekito , Masahiro Ishii

IPC分类号： G03F7/40 , H01L21/027 , G03F7/32 , G03F7/11 , G03F7/039 , C08F220/56 , C08F226/02

CPC分类号： G03F7/405 , C08F220/56 , C08F226/02 , G03F7/0392 , G03F7/11 , G03F7/325 , G03F7/40 , H01L21/0273

摘要： [Object] To provide a composition enabling to form a fine negative photoresist pattern free from troubles, such as, surface roughness, bridge defects, and resolution failure; and also to provide a pattern formation method using that composition.[Means to Solve the Problem] A fine pattern-forming composition is used for miniaturizing a resist pattern by fattening said pattern in a process of formation of a negative resist pattern using a chemically amplified resist composition. The fine pattern-forming composition comprises a polymer comprising a repeating unit having a structure of the following formula (A), (B) or (C): and a solvent. This composition is cast on a negative resist pattern obtained by development with an organic solvent developer, and then heated to form a fine pattern.