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11.发明授权公开(公告)号：US06400025B1
公开(公告)日：2002-06-04
申请号：US09280653
申请日：1999-03-29
申请人： Takashi Ishigami , Mituo Kawai , Noriaki Yagi
发明人： Takashi Ishigami , Mituo Kawai , Noriaki Yagi
IPC分类号： H01L2348
CPC分类号： C22B9/228 , C22B34/1295 , C22C14/00 , C23C14/3414 , H01L2924/01019 , H01L2924/01024 , H01L2924/01028 , H01L2924/01074
摘要： The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.
摘要翻译： 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径，具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则，粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法，制备氧含量不大于350ppm，Fe，Ni和Cr含量不高于15ppm的高纯度Ti材料，Na和K含量不大于0.5ppm ，作为材料特性不小于70％的面积的减小，以及不低于16W / m K的热导率。简而言之，高纯度，高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。
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12.发明授权
公开(公告)号：US5204057A
公开(公告)日：1993-04-20
申请号：US924770
申请日：1992-04-09
申请人： Takashi Ishigami , Mituo Kawai , Noriaki Yagi
发明人： Takashi Ishigami , Mituo Kawai , Noriaki Yagi
CPC分类号： C22C14/00 , C22B34/1295 , C22B9/228 , C23C14/3414 , H01L2924/01019 , H01L2924/01024 , H01L2924/01028 , H01L2924/01074
摘要： The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.
摘要翻译： 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径，具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则，粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法，制备氧含量不大于350ppm，Fe，Ni和Cr含量不高于15ppm的高纯度Ti材料，Na和K含量不大于0.5ppm ，作为材料特性不小于70％的面积的减小，以及不低于16W / m K的热导率。简而言之，高纯度，高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。
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公开(公告)号：US5370837A
公开(公告)日：1994-12-06
申请号：US180314
申请日：1994-01-12
申请人： Masanori Kibata , Noboru Kitamori , Shigeki Kajima , Kazunori Yokosu , Mituo Kawai , Hideo Ishihara , Noriaki Yagi
发明人： Masanori Kibata , Noboru Kitamori , Shigeki Kajima , Kazunori Yokosu , Mituo Kawai , Hideo Ishihara , Noriaki Yagi
CPC分类号： C23C30/00 , Y10T428/12833
摘要： A high temperature heat-treating jig characterized by forming a tungsten layer or a tungsten alloy layer on the surface of a heat-resistant base to avoid discoloration and color shading during the heat treatment at a high temperature.
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公开(公告)号：US4842706A
公开(公告)日：1989-06-27
申请号：US162898
申请日：1988-03-02
IPC分类号： C23C14/34
CPC分类号： C23C14/3414
摘要： Disclosed is a sputtering target which comprises a single block composed of one or more of metals prepared by a melting process or an alloy thereof; a combined block of the plural single blocks; or a combined block of the single blocks and silicon blocks; an average size of the crystal grains of the metal or the alloy being between 1 .mu.m and 1 mm.
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公开(公告)号：US5288561A
公开(公告)日：1994-02-22
申请号：US784179
申请日：1991-10-30
申请人： Masanori Kibata , Noboru Kitamori , Shigeki Kajima , Kazunori Yokosu , Mituo Kawai , Hideo Ishihara , Noriaki Yagi
发明人： Masanori Kibata , Noboru Kitamori , Shigeki Kajima , Kazunori Yokosu , Mituo Kawai , Hideo Ishihara , Noriaki Yagi
CPC分类号： C23C30/00 , Y10T428/12833
摘要： A high temperature heat-treating jig characterized by forming a tungsten layer or a tungsten alloy layer on the surface of a heat-resistant base to avoid discoloration and color shading during the heat treatment at a high temperature.
摘要翻译： 一种高温热处理夹具，其特征在于在耐热基材的表面上形成钨层或钨合金层，以避免高温热处理时的变色和着色。
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公开(公告)号：US5530467A
公开(公告)日：1996-06-25
申请号：US689285
申请日：1991-06-19
申请人： Takashi Ishigami , Mituo Kawai , Atsuko Iida
发明人： Takashi Ishigami , Mituo Kawai , Atsuko Iida
CPC分类号： C23C14/3414 , H01C17/12
摘要： A sputtering target comprises an oxide containing niobium, a silicide containing niobium and silicon oxide substantially for the rest. The sputtering target is formed e.g. by reactive sintering a powdery niobium or a powdery niobium alloy containing silicon oxide in the range of 15 to 70 mol % by mole ratio. A film resistor formed by using the sputtering target exhibits high specific resistance, good stabilities of resistance and a film composition and excellent reproducibility and is used as a heat generating resistor in e.g. a thermal printer head.
摘要翻译： PCT No.PCT / JP91 / 00119 Sec。 371日期1991年6月19日 102（e）1991年6月19日PCT 1991年1月31日PCT PCT。 公开号WO91 / 11328 日期为1991年8月8日。溅射靶包括含有铌的氧化物，含有铌的硅化物和基本上为其余的氧化硅。 溅射靶例如形成。 通过反应性烧结含有氧化硅的粉末状铌或含有氧化硅的粉末状铌合金的比例为15〜70摩尔％。 通过使用溅射靶形成的薄膜电阻器具有高电阻率，良好的电阻稳定性和薄膜组成以及优异的再现性，并且用作例如发热电阻器。 热敏打印头。
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公开(公告)号：US4585620A
公开(公告)日：1986-04-29
申请号：US386534
申请日：1982-06-09
申请人： Hisato Kamohara , Tatsuyoshi Aisaka , Mituo Kawai
发明人： Hisato Kamohara , Tatsuyoshi Aisaka , Mituo Kawai
CPC分类号： B23K35/304 , C22C19/052
摘要： There is disclosed a wear-resistant alloy which comprises, in terms of weight ratio, 10 to 45% of chromium, 3 to 15% of niobium, 4 to 20% of molybdenum, 0.01 to 2.0% of boron, and nickel as the remainder.The wear-resistant alloy having a novel composition of the present invention is suitable for face portions of valves used in various plants such as a chemical plant and an atomic power plant, parts of jet pumps and sliding parts for various machines.
摘要翻译： 公开了一种耐磨合金，其以重量比计含有10〜45％的铬，3〜15％的铌，4〜20％的钼，0.01〜2.0％的硼和作为其余的镍的耐磨合金 。 具有本发明的新型组合物的耐磨合金适用于各种工厂如化工厂和原子能发电厂，喷射泵部件和各种机器的滑动部件中使用的阀门的面部。
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公开(公告)号：US4400346A
公开(公告)日：1983-08-23
申请号：US189329
申请日：1980-09-22
申请人： Tatsuyoshi Aisaka , Mituo Kawai , Suteto Hasegawa , Takeo Nawai
发明人： Tatsuyoshi Aisaka , Mituo Kawai , Suteto Hasegawa , Takeo Nawai
CPC分类号： G21C7/113 , G21Y2002/104 , G21Y2004/30 , G21Y2004/301 , Y02E30/39 , Y10S384/901 , Y10T29/4984
摘要： A control rod to be arranged in a nuclear reactor core comprises a body of a control rod, control rod guide rollers, pins connected to the guide rollers, and fixing members directly welded to the body of the control rod. The pins slidably support the respective guide rollers and the fixing members are engaged with the pins with a small clearance therebetween so as not to transfer welding heat from the fixing member to the pin.
摘要翻译： 设置在核反应堆堆芯中的控制杆包括控制棒的主体，控制杆导向辊，连接到引导辊的销和直接焊接到控制棒的主体的固定构件。 销可滑动地支撑相应的导向辊，并且固定构件与销之间以小间隙与销接合，以便不将焊接热量从固定构件转移到销上。
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公开(公告)号：US4963240A
公开(公告)日：1990-10-16
申请号：US174959
申请日：1988-03-29
CPC分类号： C23C14/3414 , C22C27/02
摘要： The present invention is a sputtering target for formation of an alloy film, which comprises 15 to 50 atomic percent of molybdenum or tungsten, the remaining atomic percent of tantalum, and concomitant impurities, which can provide electrical wiring having very low specific resistance as well as excellent workability and stability, whereby high definition and high integration of various elements such as semiconductor devices can be achieved. In consequence, it is fair to say that this invention is industrially very useful.
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公开(公告)号：US4754950A
公开(公告)日：1988-07-05
申请号：US792593
申请日：1985-10-29
申请人： Kaoru Tada , Mituo Kawai , Tetsuo Fujiwara , Noriyuki Chujyo , Masahiko Hasunuma , Yuji Yasuda
发明人： Kaoru Tada , Mituo Kawai , Tetsuo Fujiwara , Noriyuki Chujyo , Masahiko Hasunuma , Yuji Yasuda
CPC分类号： F16K3/12 , C22C19/052 , C22C38/38 , C22C38/44 , F16K25/005 , Y10S376/90 , Y10T428/12937
摘要： There is disclosed a valve comprising one valve seat ring, of a disc or a body, having a surface composed of a Cr-Mn-Fe system or a Cr-Ni-Fe system Fe-based precipitation hardening type alloy, and another valve seat ring thereof having a surface composed of a Cr-Ni system Ni-based alloy having a hardness Hv of 400 or more.The valves of this invention can have excellent wear resistance, cavitation erosion resistance and galling resistance, and since emitting no cobalt, the valves of this invention are suitable for various plants such as chemical plants, particularly nuclear power plants.
摘要翻译： 公开了一种阀，其包括具有由Cr-Mn-Fe体系或Cr-Ni-Fe系Fe基析出硬化型合金构成的表面的盘或体的一个阀座环，以及另一个阀座 其具有由硬度Hv为400以上的Cr-Ni系Ni基合金构成的表面。 本发明的阀具有优异的耐磨性，抗气蚀侵蚀性和耐磨损性，并且由于不排放钴，本发明的阀适用于各种工厂，如化工厂，特别是核电站。
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