Sputtered silicide film
    1.
    发明授权
    Sputtered silicide film 失效
    溅射硅化物膜

    公开(公告)号:US5612571A

    公开(公告)日:1997-03-18

    申请号:US512911

    申请日:1995-08-09

    摘要: According to the present invention, metal silicide grains are coupled with each other in a linked manner so as to provide a metal silicide phase, and Si grains forming a Si phase are dispersed in the gaps of the metal silicide phase discontinuously so as to provide a mixed structure of a sputtering target of high density and containing carbon at a rate less than 100 ppm. Because of the high density and high strength of the target, generation of particles at the time of sputtering can be reduced, and because of the reduced content of carbon, mixing of carbon in a thin film formed by the sputtering can be prevented.

    摘要翻译: 根据本发明,金属硅化物晶粒以连接的方式彼此耦合以提供金属硅化物相,并且形成Si相的Si晶粒不连续地分散在金属硅化物相的间隙中,从而提供 高密度溅射靶的混合结构,并以小于100ppm的速度含有碳。 由于目标的高密度和高强度,可以减少溅射时的颗粒的产生,并且由于碳的含量降低,可以防止通过溅射形成的薄膜中的碳的混合。

    Heat-resisting steel turbine part
    4.
    发明授权
    Heat-resisting steel turbine part 失效
    耐热钢涡轮机部件

    公开(公告)号:US4857120A

    公开(公告)日:1989-08-15

    申请号:US4273

    申请日:1987-01-06

    摘要: A heat-resisting steel contains 0.08 to 0.15 percent by weight of carbon, over 0.2 to 0.6 percent of silicon, 0.3 to 0.8 percent of manganese, 0.6 to 1.2 percent of nickel, 9.5 to 11.0 percent of chromium, 0.7 to 1.5 percent of molybdenum, 0.15 to 0.27 percent of vanadium, 0.10 to 0.27 percent in total of niobium and/or tantalum, 0.03 to 0.08 percent of nitrogen, over 1.1 to 1.3 percent of tungsten, and iron for the remainder. The creep rupture strength of this heat-resisting steel is much higher than that of a prior art 12-Cr heat-resisting steel. A turbine component formed of the heat-resisting steel of the present invention has enough strength for use at a high temperature of 600.degree. to 650.degree. C.

    摘要翻译: 耐热钢含有0.08〜0.15重量%的碳,超过0.2〜0.6%的硅,0.3〜0.8%的锰,0.6〜1.2%的镍,9.5〜11.0%的铬,0.7〜1.5%的钼 ,0.15〜0.27%的钒,0.10〜0.27%的铌和/或钽,0.03〜0.08%的氮,超过1.1%至1.3%的钨,其余为铁。 该耐热钢的蠕变断裂强度比现有技术的12-Cr耐热钢的蠕变断裂强度高得多。 由本发明的耐热钢形成的涡轮部件在600℃〜650℃的高温下具有足够的强度。

    Wear-resistant alloy for an atomic power plant
    5.
    发明授权
    Wear-resistant alloy for an atomic power plant 失效
    原子能发电厂耐磨合金

    公开(公告)号:US4585620A

    公开(公告)日:1986-04-29

    申请号:US386534

    申请日:1982-06-09

    CPC分类号: B23K35/304 C22C19/052

    摘要: There is disclosed a wear-resistant alloy which comprises, in terms of weight ratio, 10 to 45% of chromium, 3 to 15% of niobium, 4 to 20% of molybdenum, 0.01 to 2.0% of boron, and nickel as the remainder.The wear-resistant alloy having a novel composition of the present invention is suitable for face portions of valves used in various plants such as a chemical plant and an atomic power plant, parts of jet pumps and sliding parts for various machines.

    摘要翻译: 公开了一种耐磨合金,其以重量比计含有10〜45%的铬,3〜15%的铌,4〜20%的钼,0.01〜2.0%的硼和作为其余的镍的耐磨合金 。 具有本发明的新型组合物的耐磨合金适用于各种工厂如化工厂和原子能发电厂,喷射泵部件和各种机器的滑动部件中使用的阀门的面部。

    Control rods
    6.
    发明授权
    Control rods 失效
    控制棒

    公开(公告)号:US4400346A

    公开(公告)日:1983-08-23

    申请号:US189329

    申请日:1980-09-22

    IPC分类号: G21C7/10 G21C7/113

    摘要: A control rod to be arranged in a nuclear reactor core comprises a body of a control rod, control rod guide rollers, pins connected to the guide rollers, and fixing members directly welded to the body of the control rod. The pins slidably support the respective guide rollers and the fixing members are engaged with the pins with a small clearance therebetween so as not to transfer welding heat from the fixing member to the pin.

    摘要翻译: 设置在核反应堆堆芯中的控制杆包括控制棒的主体,控制杆导向辊,连接到引导辊的销和直接焊接到控制棒的主体的固定构件。 销可滑动地支撑相应的导向辊,并且固定构件与销之间以小间隙与销接合,以便不将焊接热量从固定构件转移到销上。

    Highly purified titanium material, method for preparation of it and sputtering target using it
    7.
    发明授权
    Highly purified titanium material, method for preparation of it and sputtering target using it 失效
    高纯钛材料,其制备方法和溅射靶材

    公开(公告)号:US06210634B1

    公开(公告)日:2001-04-03

    申请号:US09280001

    申请日:1999-03-29

    IPC分类号: C22C1400

    摘要: The crude Ti particles prepared by molten salt electrolysis or Iodide method are classified into each particle diameter according to contents of impurities, and the crude Ti particles having a desired particle diameter are selected from the crude Ti particles classified depending on each particle diameter. Otherwise, the crude Ti particles are acid-treated. Then they are electron-beam-melted. Through the above production process, there is prepared a highly purified Ti material having an oxygen content of not more than 350 ppm, Fe, Ni and Cr contents of not more than 15 ppm each, Na and K contents of not more than 0.5 ppm each, a reduction of area as a material characteristic of not less than 70%, and a thermal conductivity of not less than 16 W/m K. In short, the highly purified Ti material satisfying high purity, good processability and good thermal conductivity can be obtained. A film having more uniform thickness of film and inside structure can be obtained from a sputtering target prepared using the above highly purified Ti material.

    摘要翻译: 通过熔盐电解或碘化法制备的粗Ti粒子根据杂质的含量分为各个粒径,具有所需粒径的粗Ti粒子选自根据各粒径分级的粗Ti粒子。 否则,粗Ti颗粒被酸处理。 然后电子束熔化。 通过上述制造方法,制备氧含量不大于350ppm,Fe,Ni和Cr含量不高于15ppm的高纯度Ti材料,Na和K含量不大于0.5ppm ,作为材料特性不小于70%的面积的减小,以及不低于16W / m K的热导率。简而言之,高纯度,高加工性和良好导热性的高纯度Ti材料可以是 获得。 可以从使用上述高纯度Ti材料制备的溅射靶获得具有更均匀厚度的膜和内部结构的膜。

    Sputtering target, film resistor and thermal printer head
    8.
    发明授权
    Sputtering target, film resistor and thermal printer head 失效
    溅射靶,薄膜电阻和热敏打印头

    公开(公告)号:US5530467A

    公开(公告)日:1996-06-25

    申请号:US689285

    申请日:1991-06-19

    IPC分类号: C23C14/34 H01C17/12 B41J2/335

    CPC分类号: C23C14/3414 H01C17/12

    摘要: A sputtering target comprises an oxide containing niobium, a silicide containing niobium and silicon oxide substantially for the rest. The sputtering target is formed e.g. by reactive sintering a powdery niobium or a powdery niobium alloy containing silicon oxide in the range of 15 to 70 mol % by mole ratio. A film resistor formed by using the sputtering target exhibits high specific resistance, good stabilities of resistance and a film composition and excellent reproducibility and is used as a heat generating resistor in e.g. a thermal printer head.

    摘要翻译: PCT No.PCT / JP91 / 00119 Sec。 371日期1991年6月19日 102(e)1991年6月19日PCT 1991年1月31日PCT PCT。 公开号WO91 / 11328 日期为1991年8月8日。溅射靶包括含有铌的氧化物,含有铌的硅化物和基本上为其余的氧化硅。 溅射靶例如形成。 通过反应性烧结含有氧化硅的粉末状铌或含有氧化硅的粉末状铌合金的比例为15〜70摩尔%。 通过使用溅射靶形成的薄膜电阻器具有高电阻率,良好的电阻稳定性和薄膜组成以及优异的再现性,并且用作例如发热电阻器。 热敏打印头。