公开(公告)号：US20090120584A1

公开(公告)日：2009-05-14

申请号：US12059820

申请日：2008-03-31

Applicant: Dmitry Lubomirsky ,  Toan Q. Tran ,  Lun Tsuei ,  Manuel A. Hernandez ,  Kirby H. Floyd ,  Ellie Y. Yieh

Inventor： Dmitry Lubomirsky ,  Toan Q. Tran ,  Lun Tsuei ,  Manuel A. Hernandez ,  Kirby H. Floyd ,  Ellie Y. Yieh

IPC: C23F1/08 ,  B05C13/00 ,  B05C15/00 ,  H01L21/677 ,  B05C21/00

CPC classification number: H01L21/6719 ,  H01L21/67017 ,  H01L21/68742 ,  H01L21/68792

Abstract: A semiconductor processing system is described. The system includes a processing chamber having an interior capable of holding an internal chamber pressure below ambient atmospheric pressure. The system also includes a pumping system coupled to the chamber and adapted to remove material from the processing chamber. The system further includes a substrate support pedestal, where the substrate support pedestal is rigidly coupled to a substrate support shaft extending through a wall of the processing chamber. A bracket located outside the processing chamber is provided which is rigidly and sometimes rotatably coupled to the substrate support shaft. A motor coupled to the bracket can be actuated to vertically translate the substrate support pedestal, shaft and bracket from a first position to a second position closer to a processing plate. A piston mounted on an end of the bracket provides a counter-balancing force to a tilting force, where the tilting force is generated by a change in the internal chamber pressure and causes a deflection in the position of the bracket and the substrate support. The counter-balancing force reduces the deflection of the bracket and the substrate support.

Abstract translation: 描述半导体处理系统。 该系统包括具有能够将内部室压力保持在环境大气压力以下的内部的处理室。 该系统还包括耦合到腔室并适于从处理室移除材料的泵送系统。 该系统还包括基板支撑基座，其中基板支撑基座刚性地联接到延伸穿过处理室的壁的基板支撑轴。 提供位于处理室外部的支架，其刚性且有时可旋转地联接到基板支撑轴。 耦合到支架的马达可以被致动以将基板支撑基座，轴和托架从第一位置垂直平移到靠近处理板的第二位置。 安装在支架的端部上的活塞提供与倾斜力的反平衡力，其中倾斜力由内部室压力的变化产生，并且引起支架和基板支撑件的位置的偏转。 反平衡力减小了支架和基板支架的挠曲。

公开(公告)号：US07204888B2

公开(公告)日：2007-04-17

申请号：US10428967

申请日：2003-05-01

Applicant: Toan Q. Tran ,  Daniel S. Herkalo ,  Yen-Kun V. Wang ,  Jin Ho Lee ,  Dong Hyung Lee ,  Jang Seok Oh ,  Won B. Bang

Inventor： Toan Q. Tran ,  Daniel S. Herkalo ,  Yen-Kun V. Wang ,  Jin Ho Lee ,  Dong Hyung Lee ,  Jang Seok Oh ,  Won B. Bang

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01L21/68742

Abstract: Embodiments of the present invention provide an apparatus for constraining and supporting the lift pins to prevent or minimize lateral movement of the lift pins that causes substrate hand-off problems and associated degradation in substrate processing characteristics and results. In one embodiment, a lift pin assembly for manipulating a substrate above a support surface of a substrate support comprises a plurality of lift pins movable between an up position and a down position. The lift pins include top ends and bottom ends. The top ends are configured to be lifted above the support surface of the substrate support to contact a bottom surface of the substrate in the up position. The top ends are configured to be positioned at or below the support surface of the substrate support in the down position. A lift pin connecting member is attached to the plurality of lift pins at attachment locations at or near the bottom ends of the lift pins to maintain fixed relative distances between the lift pins at the attachment locations and to move with the lift pins between the up position and the down position.

Abstract translation: 本发明的实施例提供了一种用于约束和支撑提升销的装置，以防止或最小化提升销的横向移动，这导致基板切换问题以及相关的基板处理特性和结果的退化。 在一个实施例中，用于在衬底支撑件的支撑表面上方操作衬底的提升销组件包括可在上升位置和下降位置之间移动的多个提升销。 提升销包括顶端和底端。 顶端构造成被提升在基板支撑件的支撑表面上方以在上方位置接触基板的底表面。 顶端构造成位于下方位置处的基板支撑件的支撑表面上或下方。 提升销连接构件在提升销的底端处或附近的附接位置处附接到多个提升销，以在附接位置处保持提升销之间的固定的相对距离，并且随着提升销在上部位置之间移动 和下降位置。