公开(公告)号：US20140262040A1

公开(公告)日：2014-09-18

申请号：US13842965

申请日：2013-03-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Jianping Zhao ,  Peter L. G. Ventzek ,  Lee Chen ,  Barton Lane ,  Merritt Funk ,  Radha Sundararajan ,  Iwao Toshihiko ,  Zhiying Chen

IPC: H01J37/32

CPC classification number: H01J37/32256

Abstract: A plasma-tuning rod configured for use with a microwave processing system. The waveguide includes a first dielectric portion having a first outer diameter. A second dielectric portion, with a second outer diameter greater than the first outer diameter surrounds the first dielectric portion, and may be coaxial therewith. In some embodiments of the present invention, a dielectric constant of the first dielectric portion may be equal to or greater than a dielectric constant of the second dielectric portion.

Abstract translation: 一种配置成与微波处理系统一起使用的等离子体调节杆。 波导包括具有第一外径的第一电介质部分。 具有大于第一外径的第二外径的第二电介质部分围绕第一电介质部分，并且可以与其同轴。 在本发明的一些实施例中，第一电介质部分的介电常数可以等于或大于第二电介质部分的介电常数。

公开(公告)号：US20130119854A1

公开(公告)日：2013-05-16

申请号：US13676265

申请日：2012-11-14

Applicant: Tokyo Electron Limited

Inventor： Barton Lane ,  Lee Chen ,  Peter L.G. Ventzek ,  Merritt Funk ,  Jianping Zhao ,  Radha Sundararajan

IPC: H01J1/00

CPC classification number: H01J1/00 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32174 ,  H05H1/46 ,  H05H2001/4652 ,  H05H2001/4675

Abstract: A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase.

Abstract translation: 提供射频（RF）功率耦合系统。 该系统具有被配置为在等离子体处理系统中将RF功率耦合到等离子体的RF电极，多个功率耦合元件被配置为在RF电极上的多个功率耦合位置处电耦合RF功率，以及耦合到多功率耦合的RF功率系统 元件，并且被配置为将RF功率信号耦合到多个功率耦合元件中的每一个。 多个功率耦合元件包括位于RF电极中心的中心元件和位于离RF电极中心偏离中心的外围元件。 第一外围RF功率信号与第二外围RF功率信号同相不同。