公开(公告)号：US11784070B2

公开(公告)日：2023-10-10

申请号：US16852475

申请日：2020-04-18

Applicant: Tokyo Electron Limited

Inventor： Yasuaki Kikuchi ,  Tatsuya Yamaguchi ,  Kazuteru Obara ,  Ryuji Kusajima

IPC: H01L21/67 ,  C23C16/46 ,  C23C16/34 ,  C23C16/52 ,  H01L21/02 ,  H01L21/673

CPC classification number: H01L21/67248 ,  C23C16/345 ,  C23C16/46 ,  C23C16/52 ,  H01L21/0217 ,  H01L21/0228 ,  H01L21/02269 ,  H01L21/67109 ,  H01L21/67303

Abstract: A heat treatment apparatus includes: an inner tube having a cylindrical shape and configured to accommodate a substrate; an outer tube configured to cover an outside of the inner tube; a heater provided around the outer tube; a gas supply pipe that extends along a longitudinal direction in the inner tube; an opening formed in a side wall of the inner tube facing the gas supply pipe; a temperature sensor provided at a position shifted by a predetermined angle from the opening in a circumferential direction of the inner tube; and a controller that controls the heater based on a detected value of the temperature sensor.

公开(公告)号：US11674224B2

公开(公告)日：2023-06-13

申请号：US16852478

申请日：2020-04-19

Applicant: Tokyo electron limited

Inventor： Yasuaki Kikuchi ,  Tatsuya Yamaguchi ,  Kazuteru Obara ,  Ryuji Kusajima

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/34

CPC classification number: C23C16/45527 ,  C23C16/345 ,  C23C16/4583

Abstract: A film forming method includes: accommodating a substrate in a processing container of a film forming apparatus; supplying an inert gas to the processing container at a flow rate equal to an average flow rate of a plurality of gases to be supplied into the processing container in a film forming process and maintaining a pressure of the processing container to be substantially same as an average pressure of the processing container in the film forming process; and alternately supplying the plurality of gases into the processing container and forming a film on the substrate.

公开(公告)号：US11569098B2

公开(公告)日：2023-01-31

申请号：US16398547

申请日：2019-04-30

Applicant: Tokyo Electron Limited

Inventor： Tatsuya Yamaguchi ,  Yasuaki Kikuchi

IPC: F24D11/00 ,  H01L21/67 ,  F26B23/06

Abstract: A heat treatment apparatus includes: a processing container extended in a vertical direction; and a heater provided to surround the processing container. The heater includes: a first insulator of a cylindrical shape that has a ceiling surface and an opening at a lower end; a heat generator provided along a circumferential direction on an inner circumferential side of the first insulating member; and a second insulator arranged along the circumferential direction of the first insulating member at a position adjacent to the heat generating elements.

公开(公告)号：US20190341281A1

公开(公告)日：2019-11-07

申请号：US16398547

申请日：2019-04-30

Applicant: Tokyo Electron Limited

Inventor： Tatsuya Yamaguchi ,  Yasuaki Kikuchi

IPC: H01L21/67 ,  F26B23/06

Abstract: A heat treatment apparatus includes: a processing container extended in a vertical direction; and a heater provided to surround the processing container. The heater includes: a first insulator of a cylindrical shape that has a ceiling surface and an opening at a lower end; a heat generator provided along a circumferential direction on an inner circumferential side of the first insulating member; and a second insulator arranged along the circumferential direction of the first insulating member at a position adjacent to the heat generating elements.

公开(公告)号：US20180197759A1

公开(公告)日：2018-07-12

申请号：US15864299

申请日：2018-01-08

Applicant: Tokyo Electron Limited

Inventor： Tatsuya Yamaguchi ,  Kazuteru Obara ,  Yasuaki Kikuchi ,  Koji Yoshii

IPC: H01L21/67

CPC classification number: H01L21/67109 ,  H01L21/67248

Abstract: Disclosed is a heat treatment apparatus including: a processing container configured to accommodate a substrate; a furnace body having a heater configured to heat the substrate accommodated in the processing container and provided around the processing container; a blower configured to supply a coolant to a space between the processing container and the furnace body; and a controller having a continuous operation mode in which the blower is continuously energized and an intermittent operation mode in which energization and de-energization of the blower are repeated, and configured to control driving of the blower based on an instruction voltage. The controller drives the blower in the intermittent operation mode when the instruction voltage is higher than 0 V and lower than a predetermined threshold voltage.